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Patent Agency Ranking
公开(公告)号：WO2018224251A1
公开(公告)日：2018-12-13
申请号：PCT/EP2018/062557
申请日：2018-05-15
Applicant: STICHTING VU , STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN , UNIVERSITEIT VAN AMSTERDAM , ASML NETHERLANDS B.V.
Inventor： WITTE, Stefan, Michiel , ANTONCECCHI, Alessandro , ZHANG, Hao , EDWARD, Stephen , PLANKEN, Paulus, Clemens, Maria , GOORDEN, Sebastianus, Adrianus , HUISMAN, Simon, Reinald , SETIJA, Irwan, Dani , VLES, David, Ferdinand
IPC: G03F9/00
Abstract: A method for determining a characteristic of a feature in an object, the feature being disposed below a surface of the object is disclosed. The surface of the object is irradiated with a pulsed pump radiation beam so as to produce an acoustic wave in the object. The surface of the object is then irradiated with a measurement radiation beam. A portion of the measurement radiation beam scattered from the surface is received and a characteristic of the feature in the object is determined from at least a portion of the measurement radiation beam scattered from the surface within a measurement time period. A temporal intensity distribution of the pulsed pump radiation beam is selected such that in the measurement time period a signal to background ratio is greater than a signal to background ratio achieved using a single pulse of the pulsed pump radiation beam. The signal to background ratio is a ratio of: (a) signals generated at the surface by reflections of acoustic waves from the feature to (b) background signals generated at the surface by reflections of acoustic waves which have not reflected from the feature.
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公开(公告)号：WO2022228820A1
公开(公告)日：2022-11-03
申请号：PCT/EP2022/058586
申请日：2022-03-31
Applicant: ASML NETHERLANDS B.V.
Inventor： SMORENBURG, Petrus, Wilhelmus , EDWARD, Stephen , DONDERS, Sjoerd, Nicolaas, Lambertus , SCHELLEKENS, Adrianus, Johannes, Hendrikus , O'DWYER, David , NIKIPELOV, Andrey , DE VRIES, Gosse, Charles
Abstract: An assembly comprises a space configured for placing a medium to receive a first radiation for generating a second radiation. In operation, the second radiation propagates coaxially with the first radiation after the medium. The assembly further comprises an optical element after the medium for transmitting or reflecting the first radiation with a surface area. The assembly is configured such that, in operation, a cleaning gas is in contact with the surface area. A reactive medium is generated from at least a part of the cleaning gas by the second radiation for removing a contamination from the surface area.
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公开(公告)号：WO2022174991A1
公开(公告)日：2022-08-25
申请号：PCT/EP2022/050490
申请日：2022-01-12
Applicant: ASML NETHERLANDS B.V.
Inventor： SMORENBURG, Petrus, Wilhelmus , REININK, Johan , REIJNDERS, Marinus, Petrus , NIENHUYS, Han-Kwang , O'DWYER, David , ROOBOL, Sander, Bas , PORTER, Christina, Lynn , EDWARD, Stephen
Abstract: An assembly and method for separating first radiation and second radiation in the far field, wherein the first radiation and the second radiation have non-overlapping wavelengths, The assembly comprises a capillary structure, wherein the first radiation and the second radiation propagate coaxially along at least a portion of the capillary structure, and an optical structure configured to control the spatial distribution of the first radiation outside of the capillary structure, through interference, such that the intensity of the first radiation in the far field is reduced along an optical axis of the second radiation.
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公开(公告)号：WO2023020856A1
公开(公告)日：2023-02-23
申请号：PCT/EP2022/072017
申请日：2022-08-04
Applicant: UNIVERSITEIT VAN AMSTERDAM , STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN , STICHTING VU , ASML NETHERLANDS B.V.
Inventor： DE HAAN, Guido , EDWARD, Stephen , VAN DEN HOOVEN, Thomas Jan , PLANKEN, Paulus, Clemens, Maria , SETIJA, Irwan, Dani
IPC: G03F9/00
Abstract: Disclosed is a method for measuring a target located on a substrate beneath at least one layer. The method comprises exciting said at least one layer with pump radiation comprising at least one pump wavelength, so as to generate an acoustic wave within said at least one layer which reflects of said target thereby generating an acoustic replica of said target at a surface of said substrate and illuminating said acoustic replica with probe radiation comprising at least one probe wavelength and capturing the resultant scattered probe radiation, scattered from the acoustic replica. One or both of said exciting step and said illuminating step comprises generating Surface Plasmon Polaritons (SPPs) on residual topography of said at least one layer resultant from said target.
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公开(公告)号：WO2018137925A1
公开(公告)日：2018-08-02
申请号：PCT/EP2018/050514
申请日：2018-01-10
Applicant: STICHTING VU , UNIVERSITEIT VAN AMSTERDAM , STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN , ASML NETHERLANDS B.V.
Inventor： WITTE, Stefan, Michiel , ANTONCECCHI, Alessandro , EDWARD, Stephen , PLANKEN, Paulus, Clemens, Maria , EIKEMA, Kjeld, Sijbrand, Eduard , GOORDEN, Sebastianus, Adrianus , HUISMAN, Simon, Reinald
Abstract: A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. As increasing numbers of layers, using increasing numbers of specific materials, are deposited on substrates, it becomes increasingly difficult to detect alignment marks accurately, in part due to one or more of the materials used in one or more of the layers being wholly or partially opaque to the radiation used to detect alignment marks. In a first step, the substrate is illuminated with excitation radiation. In a second step, at least one effect associated with a reflected material effect scattered by a buried structure is measured in a suitable fashion. The effect may in an example comprise a physical displacement of the surface of the substrate. In a third step, at least one characteristic of the structure based on the measured effect is derived.
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