公开(公告)号：WO2022174991A1

公开(公告)日：2022-08-25

申请号：PCT/EP2022/050490

申请日：2022-01-12

Applicant: ASML NETHERLANDS B.V.

Inventor： SMORENBURG, Petrus, Wilhelmus ,  REININK, Johan ,  REIJNDERS, Marinus, Petrus ,  NIENHUYS, Han-Kwang ,  O'DWYER, David ,  ROOBOL, Sander, Bas ,  PORTER, Christina, Lynn ,  EDWARD, Stephen

IPC: G02B6/26 ,  H01S3/00 ,  H01S3/032 ,  H01S4/00 ,  G02F1/35 ,  G21K1/10 ,  H05G2/00

Abstract: An assembly and method for separating first radiation and second radiation in the far field, wherein the first radiation and the second radiation have non-overlapping wavelengths, The assembly comprises a capillary structure, wherein the first radiation and the second radiation propagate coaxially along at least a portion of the capillary structure, and an optical structure configured to control the spatial distribution of the first radiation outside of the capillary structure, through interference, such that the intensity of the first radiation in the far field is reduced along an optical axis of the second radiation.

公开(公告)号：WO2023066685A1

公开(公告)日：2023-04-27

申请号：PCT/EP2022/077941

申请日：2022-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： DONMEZ NOYAN, Inci ,  VAN DER WOORD, Ties, Wouter ,  REININK, Johan ,  VAN DE GOOR, Tim, Willem, Johan ,  KLEIN, Alexander, Ludwig ,  HOUWELING, Zomer, Silvester ,  VERMEULEN, Paul, Alexander ,  GIESBERS, Adrianus, Johannes, Maria ,  KLOOTWIJK, Johan, Hendrik ,  BERGERS, Lambertus, Idris, Johannes, Catharina

IPC: G03F1/62

Abstract: There is provided a pellicle membrane comprising a population of metal silicide crystals in a silicon- based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also provided is a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also described is the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.

公开(公告)号：WO2021089319A1

公开(公告)日：2021-05-14

申请号：PCT/EP2020/079514

申请日：2020-10-20

Applicant: ASML NETHERLANDS B.V.

Inventor： REININK, Johan ,  COTTAAR, Jeroen ,  DONDERS, Sjoerd, Nicolaas, Lambertus ,  VAN DER POST, Sietse, Thijmen

IPC: G03F7/20 ,  G01B11/27 ,  G01N21/956

Abstract: Apparatus and method for measuring one or more parameters of a substrate (300) using source radiation emitted from a radiation source (100) and directed onto the substrate. The apparatus comprises at least one reflecting element (710a) and at least one detector (720, 721). The at least one reflecting element is configured to receive a reflected radiation resulting from reflection of the source radiation from the substrate and further reflect the reflected radiation into a further reflected radiation. The at least one detector is configured for measurement of the further reflected radiation for determination of at least an alignment of the source radiation and/or the substrate