公开(公告)号：WO2023025511A1

公开(公告)日：2023-03-02

申请号：PCT/EP2022/071251

申请日：2022-07-28

Applicant: ASML NETHERLANDS B.V.

Inventor： AGRICOLA, Franciscus, Theodorus ,  FERRE LLIN, Lourdes ,  DE GRAAF, Dennis ,  ANDE, Chaitanya Krishna ,  DONMEZ NOYAN, Inci ,  SI, Fai Tong ,  VAN DER WOORD, Ties, Wouter ,  ROLLIER, Anne-Sophie ,  BIRON, Maxime ,  GIESBERS, Adrianus, Johannes, Maria

IPC: G03F1/62 ,  G03F7/20

Abstract: A pellicle membrane for a lithographic apparatus, wherein the pellicle membrane comprises metal silicide and a reinforcing network. The reinforcing network can be located between metal silicide layers. The reinforcing network can be irregular. The reinforcing network includes windows with a maximum dimension of up to 20 microns. The reinforcing network includes windows having an average size of at least 5 microns.

公开(公告)号：WO2021018777A1

公开(公告)日：2021-02-04

申请号：PCT/EP2020/070973

申请日：2020-07-24

Applicant: ASML NETHERLANDS B.V.

Inventor： JANSSEN, Paul ,  BIRON, Maxime ,  DONMEZ NOYAN, Inci ,  FERRE LLIN, Lourdes ,  GIESBERS, Adrianus, Johannes, Maria ,  KLOOTWIJK, Johan, Hendrik ,  KUNTZEL, Jan, Hendrik, Willem ,  NOTENBOOM, Arnoud, Willem ,  ROLLIER, Anne-Sophie ,  VAN DER WOORD, Ties, Wouter ,  VAN ZWOL, Pieter-Jan

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

Abstract: A method of manufacturing a pellicle membrane, the method comprising: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly comprising a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus comprising such pellicles.