公开(公告)号：WO2022048854A1

公开(公告)日：2022-03-10

申请号：PCT/EP2021/071832

申请日：2021-08-05

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER WOORD, Ties, Wouter ,  KLEIN, Alexander, Ludwig ,  HOUWELING, Zomer, Silvester ,  DONMEZ NOYAN, Inci ,  HILDENBRAND, Volker, Dirk ,  GIESBERS, Adrianus, Johannes, Maria ,  KLOOTWIJK, Johan, Hendrik

IPC: G03F1/62 ,  G03F7/20

Abstract: A pellicle membrane for use in a lithographic apparatus, said pellicle membrane characterised by inplane variation in composition is described. Also described is a method of manufacturing a pellicle membrane, said method including the steps of: a) providing a sacrificial layer on a substrate: b) providing a first material layer on the sacrificial layer; c) providing a photoresist layer on the first material layer; d) patterning the photoresist layer; e) etching the first material layer to form a patterned surface; and f) either i) depositing a layer of a second material on the patterned surface and subsequently lifting off the portion of the second material deposited on the patterned photoresist layer, or ii) removing the remaining photoresist layer, depositing a layer of a second material on the patterned surface, and subsequently planarizing the surface.

公开(公告)号：WO2021144097A1

公开(公告)日：2021-07-22

申请号：PCT/EP2020/086067

申请日：2020-12-15

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER WOORD, Ties, Wouter ,  HILDENBRAND, Volker, Dirk ,  DONMEZ NOYAN, Inci ,  GIESBERS, Adrianus, Johannes, Maria ,  KLEIN, Alexander, Ludwig

IPC: G03F1/62 ,  G03F7/20 ,  G03F7/70191 ,  G03F7/70308

Abstract: A pellicle membrane for a lithographic apparatus, said membrane comprising a matrix including a plurality of inclusions distributed therein is provided. Also provided is a method of manufacturing said pellicle membrane, a lithographic apparatus comprising said pellicle membrane, a pellicle assembly for use in a lithographic apparatus comprising said membrane, as well as the use of the pellicle membrane in a lithographic apparatus or method.

公开(公告)号：WO2021018777A1

公开(公告)日：2021-02-04

申请号：PCT/EP2020/070973

申请日：2020-07-24

Applicant: ASML NETHERLANDS B.V.

Inventor： JANSSEN, Paul ,  BIRON, Maxime ,  DONMEZ NOYAN, Inci ,  FERRE LLIN, Lourdes ,  GIESBERS, Adrianus, Johannes, Maria ,  KLOOTWIJK, Johan, Hendrik ,  KUNTZEL, Jan, Hendrik, Willem ,  NOTENBOOM, Arnoud, Willem ,  ROLLIER, Anne-Sophie ,  VAN DER WOORD, Ties, Wouter ,  VAN ZWOL, Pieter-Jan

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

Abstract: A method of manufacturing a pellicle membrane, the method comprising: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly comprising a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus comprising such pellicles.

公开(公告)号：WO2023066685A1

公开(公告)日：2023-04-27

申请号：PCT/EP2022/077941

申请日：2022-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： DONMEZ NOYAN, Inci ,  VAN DER WOORD, Ties, Wouter ,  REININK, Johan ,  VAN DE GOOR, Tim, Willem, Johan ,  KLEIN, Alexander, Ludwig ,  HOUWELING, Zomer, Silvester ,  VERMEULEN, Paul, Alexander ,  GIESBERS, Adrianus, Johannes, Maria ,  KLOOTWIJK, Johan, Hendrik ,  BERGERS, Lambertus, Idris, Johannes, Catharina

IPC: G03F1/62

Abstract: There is provided a pellicle membrane comprising a population of metal silicide crystals in a silicon- based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also provided is a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also described is the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.

公开(公告)号：WO2023025511A1

公开(公告)日：2023-03-02

申请号：PCT/EP2022/071251

申请日：2022-07-28

Applicant: ASML NETHERLANDS B.V.

Inventor： AGRICOLA, Franciscus, Theodorus ,  FERRE LLIN, Lourdes ,  DE GRAAF, Dennis ,  ANDE, Chaitanya Krishna ,  DONMEZ NOYAN, Inci ,  SI, Fai Tong ,  VAN DER WOORD, Ties, Wouter ,  ROLLIER, Anne-Sophie ,  BIRON, Maxime ,  GIESBERS, Adrianus, Johannes, Maria

IPC: G03F1/62 ,  G03F7/20

Abstract: A pellicle membrane for a lithographic apparatus, wherein the pellicle membrane comprises metal silicide and a reinforcing network. The reinforcing network can be located between metal silicide layers. The reinforcing network can be irregular. The reinforcing network includes windows with a maximum dimension of up to 20 microns. The reinforcing network includes windows having an average size of at least 5 microns.

公开(公告)号：WO2021037662A1

公开(公告)日：2021-03-04

申请号：PCT/EP2020/073323

申请日：2020-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： NIKIPELOV, Andrey ,  BALTUSSEN, Sander ,  BANINE, Vadim, Yevgenyevich ,  DOLGOV, Alexandr ,  DONMEZ NOYAN, Inci ,  HOUWELING, Zomer, Silvester ,  NOTENBOOM, Arnoud, Willem ,  VAN DE KERKHOF, Marcus, Adrianus ,  VAN DER WOORD, Ties, Wouter ,  VERMEULEN, Paul, Alexander ,  VLES, David, Ferdinand ,  VORONINA, Victoria ,  YEGEN, Halil, Gökay

IPC: G03F1/62 ,  G03F7/20 ,  C01B32/158 ,  D01F9/12 ,  D01F11/12

Abstract: A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. Also described is a method of reducing the etch rate of a pellicle membrane, said method comprising providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane as well as an assembly for a lithographic apparatus, said assembly including a biased electrode near or including the pellicle membrane or heating means for pellicle membrane.