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公开(公告)号：WO2019211083A1
公开(公告)日：2019-11-07
申请号：PCT/EP2019/059477
申请日：2019-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： DE GRAAF, Dennis , BEAUDRY, Richard , BIRON, Maxime , JANSSEN, Paul , KATER, Thijs , KORNELSEN, Kevin , KUIJKEN, Michael, Alfred, Josephus , KUNTZEL, Jan, Hendrik, Willem , MARTEL, Stephane , NASALEVICH, Maxim, Aleksandrovich , SALMASO, Guido , VAN ZWOL, Pieter-Jan
Abstract: A wafer comprising a mask on one face and at least one layer on the opposite face, wherein the mask comprises at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle comprising the steps of: providing a wafer comprising a mask on one face and at least one layer on the opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle comprising the steps of: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may comprise a metal nitride layer.
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公开(公告)号：WO2017186486A1
公开(公告)日：2017-11-02
申请号：PCT/EP2017/058721
申请日：2017-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： NASALEVICH, Maxim, Aleksandrovich , ABEGG, Erik, Achilles , BANERJEE, Nirupam , BLAUW, Michiel, Alexander , BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KRUIZINGA, Matthias , LENDERINK, Egbert , MAXIM, Nicolae , NIKIPELOV, Andrey , NOTENBOOM, Arnoud, Willem , PILIEGO, Claudia , PÉTER, Mária , RISPENS, Gijsbert , SCHUH, Nadja , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBURG, Antonius, Willem , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter , ZDRAVKOV, Alexandar, Nikolov
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
Abstract translation: 公开了用于EUV光刻的膜。 在一种布置中，膜包括具有以下顺序的层的堆叠体：包含第一金属的氧化物的第一封盖层; 基层，其包含含有第二金属和选自Si，B，C和N的附加元素的化合物; 以及包含第三金属的氧化物的第二覆盖层，其中第一金属不同于第二金属，第三金属与第一金属相同或不同。
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公开(公告)号：WO2017102379A1
公开(公告)日：2017-06-22
申请号：PCT/EP2016/079594
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN ZWOL, Pieter-Jan , DE GRAAF, Dennis , JANSSEN, Paul , PÉTER, Mária , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
CPC classification number: G03F1/24 , G03F1/62 , G03F7/70916 , G03F7/70983
Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and comprising a stack comprising: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine
Abstract translation: 一种用于EUV光刻的膜，所述膜具有不大于200nm的厚度并且包括叠层，所述叠层包括：至少一个硅层; 以及至少一个由硅化合物和选自由硼，磷，溴组成的组中的元素构成的硅化合物层，
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公开(公告)号：WO2017102378A1
公开(公告)日：2017-06-22
申请号：PCT/EP2016/079584
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KAMALI, Mohammad, Reza , PÉTER, Mária , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
CPC classification number: G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983
Abstract: A membrane assembly (80) for EUV lithography, the membrane assembly comprising: a planar membrane (40); a border (81) configured to hold the membrane; and a frame assembly (50) connected to the border and configured to attach to a patterning device (MA) for EUV lithography; wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.
Abstract translation: 一种用于EUV光刻的薄膜组件（80），所述薄膜组件包括：平面薄膜（40）; 边界（81），配置为保持膜; 和框架组件（50），所述框架组件（50）连接到所述边界并且被配置成附接到用于EUV光刻的图案形成装置（MA）; 其中所述框架组件在垂直于所述膜平面的方向上连接到所述边界，使得在使用中所述框架组件位于所述边界和所述图案形成装置之间。
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公开(公告)号：WO2016124536A2
公开(公告)日：2016-08-11
申请号：PCT/EP2016/052055
申请日：2016-02-01
Applicant: ASML NETHERLANDS B.V.
Inventor： BROUNS, Derk, Servatius, Gertruda , DE GRAAF, Dennis , DE KRUIF, Robertus, Cornelis, Martinus , JANSSEN, Paul , KRUIZINGA, Matthias , NOTENBOOM, Arnoud, Willem , SMITH, Daniel, Andrew , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien , WILEY, James, Norman
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
Abstract translation: 一种方法，包括以下步骤：接收包括掩模和由防护薄膜框架保持的可去除EUV透明防护薄膜组件的掩模组件，使用检查工具从掩模中去除防护薄膜框架和EUV透明防护薄膜，以检查掩模上的掩模图案， 随后将由防护薄膜组件框架保持的EUV透明防护薄膜组件附接到掩模。 该方法还可以包括以下步骤：在从掩模移除防护薄膜组件框架和EUV透明防护薄膜组件之后，将掩模框架固定在保护由检查工具的检查梁基本透明的材料形成的替代防护薄膜组件 ; 并且在使用检查工具检查掩模上的掩模图案之后，将由替代的防护薄膜框架保持的替代防护薄膜组件从掩模中取出，以便将由防护膜框架保持的EUV透明防护薄膜组件附着到掩模上。
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Patent Agency Ranking
公开(公告)号：WO2016079051A2
公开(公告)日：2016-05-26
申请号：PCT/EP2015/076687
申请日：2015-11-16
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： KRUIZINGA, Matthias , JANSEN, Maarten, Mathijs, Marinus , AZEREDO LIMA, Jorge, Manuel , BOGAART, Erik, Willem , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , BRULS, Richard, Joseph , DEKKERS, Jeroen , JANSSEN, Paul , KAMALI, Mohammad, Reza , KRAMER, Ronald, Harm, Gunther , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LIPSON, Matthew , LOOPSTRA, Erik, Roelof , LYONS, Joseph, H. , ROUX, Stephen , VAN DEN BOSCH, Gerrit , VAN DEN HEIJKANT, Sander , VAN DER GRAAF, Sandra , VAN DER MEULEN, Frits , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
IPC: G03F1/62
CPC classification number: G03F7/70983 , G03F1/64 , G03F7/70825
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Abstract translation: 一种适用于光刻工艺的掩模组件，所述掩模组件包括图案形成装置; 以及防护薄膜组件框架，其被配置为支撑防护薄膜组件并且用安装件安装在所述图案形成装置上; 其中所述安装件被配置为相对于所述图案形成装置悬挂所述防护薄膜框架，使得所述防护薄膜框架和所述图案形成装置之间存在间隙; 并且其中所述安装件在所述图案形成装置和所述防护膜框架之间提供可释放地接合的附接。
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7.发明申请A METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY FOR EUV LITHOGRAPHY, A MEMBRANE ASSEMBLY, A LITHOGRAPHIC APPARATUS, AND A DEVICE MANUFACTURING METHOD 审中-公开一种用于EUV光刻的膜组件的制造方法，膜组件，光刻设备和设备制造方法
公开(公告)号：WO2017102383A1
公开(公告)日：2017-06-22
申请号：PCT/EP2016/079606
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , ZDRAVKOV, Alexandar, Nikolov
CPC classification number: G03F7/70983 , G03F1/62 , G03F1/64 , G03F7/70033 , G03F7/70916
Abstract: Methods of manufacturing a membrane assembly are disclosed. In one arrangement, a stack comprises a planar substrate and at least one membrane layer. The planar substrate comprises an inner region, a border region around the inner region, a bridge region around the border region and an edge region around the bridge region. The inner region and a first portion of the bridge region are selectively removed. The membrane assembly after removal comprises: a membrane formed from the at least one membrane layer, a border holding the membrane, the border formed from the border region of the planar substrate, an edge section around the border, the edge section formed from the edge region of the planar substrate, a bridge between the border and the edge section, the bridge formed from the at least one membrane layer and a second portion of the bridge region of the planar substrate. The method further comprises separating the edge section from the border by cutting or breaking the bridge.
Abstract translation: 公开了制造膜组件的方法。 在一种布置中，堆叠包括平面基底和至少一个膜层。 平面衬底包括内部区域，围绕内部区域的边界区域，围绕边界区域的桥接区域和围绕桥接区域的边缘区域。 桥区的内部区域和第一部分被选择性地去除。 去除之后的膜组件包括：由至少一个膜层形成的膜，保持膜的边界，由平面基底的边界区域形成的边界，围绕边界的边缘部分，边缘部分由边缘形成 平面衬底的区域，边界和边缘部分之间的桥，桥由至少一个膜层和平面衬底的桥区的第二部分形成。 该方法还包括通过切割或打破桥来将边缘部分与边界分开。
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公开(公告)号：WO2017036944A1
公开(公告)日：2017-03-09
申请号：PCT/EP2016/070161
申请日：2016-08-26
Applicant: ASML NETHERLANDS B.V.
Inventor： HOUWELING, Zomer, Silvester , CASIMIRI, Eric, Willem, Felix , DRUZHININA, Tamara , JANSSEN, Paul , KUIJKEN, Michael, Alfred, Josephus , LEENDERS, Martinus, Hendrikus, Antonius , OOSTERHOFF, Sicco , PÉTER, Mária , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
IPC: G03F1/62
CPC classification number: G03F1/62
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
Abstract translation: 一种用于制造用于EUV光刻的膜组件的方法，所述方法包括：提供包括平面基板和至少一个膜层的堆叠，其中所述平面基板包括内部区域和围绕所述内部区域的边界区域; 将所述堆叠定位在支撑件上，使得所述平面基板的内部区域被暴露; 并且使用非液体蚀刻剂选择性地去除所述平面基板的内部区域，使得所述膜组件包括：由所述至少一个膜层形成的膜; 以及保持膜的边界，从平面基板的边界区域形成的边界。
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9.发明申请LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND METHOD OF CLAMPING AN OBJECT 审中-公开平面设备，装置制造方法和夹紧对象的方法
公开(公告)号：WO2016192785A1
公开(公告)日：2016-12-08
申请号：PCT/EP2015/062351
申请日：2015-06-03
Applicant: ASML NETHERLANDS B.V.
Inventor： JANSSEN, Paul , BRULS, Richard , VAN GILS, Petrus
IPC: G03F7/20 , H01L21/683
CPC classification number: G03F7/70866 , G03F7/70708 , G03F7/70783 , H01L21/6831
Abstract: A lithographic apparatus comprises a first object holder (WT) and a second object holder. The first object holder is arranged for holding an object (W) at a holder-facing surface. The object has the holder-facing surface. The second object holder is arranged for holding the object at the holder-facing surface. The lithographic apparatus is arranged to deform a contaminating particle (50) at the holder-facing surface more when the object is held at the second object holder than when the object is held at the first object holder.
Abstract translation: 光刻设备包括第一物体保持器（WT）和第二物体保持器。 第一物体保持器布置成用于将物体（W）保持在面向保持器的表面上。 该物体具有支架朝向的表面。 第二物体保持器布置成用于将物体保持在面向保持器的表面上。 光刻设备被布置成当物体保持在第二物体保持器时比在物体被保持在第一物体保持器处时更多地使保持器朝向的表面上的污染颗粒（50）变形。
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公开(公告)号：WO2018228933A3
公开(公告)日：2018-12-20
申请号：PCT/EP2018/065127
申请日：2018-06-08
Applicant: ASML NETHERLANDS B.V.
Inventor： VLES, David, Ferdinand , ANDE, Chaitanya Krishna , DE GROOT, Antonius, Franciscus, Johannes , GIESBERS, Adrianus, Johannes, Maria , JANSSEN, Johannes, Joseph , JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , MEIJER, Marcel, Peter , MEIJERINK, Wouter, Rogier , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , OLSMAN, Raymond , PATEL, Hrishikesh , PÉTER, Mária , VAN DEN BOSCH, Gerrit , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Alexandar, Nikolov
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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