METROLOGY MEASUREMENT METHOD AND APPARATUS
    3.
    发明申请

    公开(公告)号:WO2022253526A1

    公开(公告)日:2022-12-08

    申请号:PCT/EP2022/062486

    申请日:2022-05-09

    Abstract: Disclosed is a method of measuring a target on a substrate using a metrology tool comprising an illumination source operable to emit an illumination beam for illuminating the target and a metrology sensor for collecting the scattered radiation having been scattered by the target. The method comprises calculating a target angle based on cell dimensions of a unit cell of said target in a first direction and a second direction orthogonal to said first direction; and order numbers of a selected pair of complementary diffraction orders in said first direction and second direction. At least one pair of measurement acquisitions is performed at a first target orientation and a second target orientation with respect to the illumination beam, wherein said target angle for at least one of said at least one pair of measurement acquisitions is an oblique angle.

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