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Patent Agency Ranking
公开(公告)号：WO2016131601A1
公开(公告)日：2016-08-25
申请号：PCT/EP2016/051242
申请日：2016-01-21
Applicant: ASML NETHERLANDS B.V.
Inventor： BLEEKER, Arno, Jan , HOFSTRA, Ramon, Mark , BUURMAN, Erik, Petrus , MOORS, Johannes, Hubertus, Josephina , STRUYCKEN, Alexander, Matthijs , VOORMA, Harm-Jan , OEMRAWSINGH, Sumant, Sukdew, Ramanujan , EURLINGS, Markus, Franciscus, Antonius , MUYS, Peter, Frans, Maria
CPC classification number: G03F7/70033 , G02B27/141 , G03F7/70025 , G03F7/70566 , H01S3/0064 , H01S3/2308 , H01S3/2316 , H05G2/005 , H05G2/008
Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.
Abstract translation: 一种用于光刻工具的激光辐射源，包括用于发射具有第一波长的第一激光束的激光模块和具有第二波长的第二激光束;用于分离第一和第二激光束的光路的光束分离装置， 重新组合光路，射束传送系统将第一和第二激光束引导到燃料靶和光学隔离装置，以便：调整第一激光束的偏振状态，调节第二激光束的偏振状态并阻挡 具有经调整的偏振态的辐射使得第一激光束的反射和第二激光束的反射基本上被阻挡以朝向激光模块传播。
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公开(公告)号：WO2021204482A1
公开(公告)日：2021-10-14
申请号：PCT/EP2021/055959
申请日：2021-03-10
Applicant: ASML NETHERLANDS B.V.
Inventor： ZHANG, Kevin, Weimin , ROKITSKI, Rostislav , BROWN, Daniel, John, William , PURVIS, Michael, Anthony , HOFSTRA, Ramon, Mark , VOORMA, Harm-Jan
Abstract: A gas mixture control system for an optical amplifier system includes: an input configured to be fluidly connected to the optical amplifier system to receive a gas mixture; an output configured to be fluidly connected to the optical amplifier system to provide a modified gas mixture to the optical amplifier system; and a trap structure between the input and the output. The trap structure is configured to interact with the gas mixture received from the optical amplifier system through the input. The trap structure includes a trap surface across which the gas mixture is passed. The trap surface defines an outer layer having a porosity defined by a roughness parameter R that is at least 100.
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公开(公告)号：WO2018206244A1
公开(公告)日：2018-11-15
申请号：PCT/EP2018/059775
申请日：2018-04-17
Applicant: ASML NETHERLANDS B.V.
Inventor： SWINKELS, Gerardus, Hubertus, Petrus, Maria , HOFSTRA, Ramon, Mark , MOORS, Johannes, Hubertus, Josephina , CLEARY, Paul, William , VAN DRIEËNHUIZEN, Bert, Pieter
CPC classification number: H01S3/2316 , H01S3/0057 , H01S3/0064 , H01S3/0071
Abstract: A seed laser module for a laser produced plasma source, the seed laser module comprising: a pulsed laser source configured to emit source radiation pulses at a pulse repetition rate; a sub-system configured to provide an electric signal; an electro-optic modulator coupled to the sub-system and configured to receive the source radiation pulses and to emit shaped radiation pulses under control of the electric signal; and wherein the electric signal comprises gating pulses at the pulse repetition rate in phase with the source radiation pulses and one or more secondary pulses between successive ones of the gating pulses.
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公开(公告)号：WO2019206637A1
公开(公告)日：2019-10-31
申请号：PCT/EP2019/059105
申请日：2019-04-10
Applicant: ASML NETHERLANDS B.V.
Inventor： HOFSTRA, Ramon, Mark , TYCHKOV, Andrey, Sergeevich , DENEUVILLE, Francois, Charles, Dominique , SWINKELS, Gerardus, Hubertus, Petrus, Maria , RUIJS, Petrus, Adrianus, Theodorus, Maria
Abstract: A system comprises a reflective optical element with a reflective surface that is configured to reflect a radiation beam. The reflective optical element also has a body. The system includes a thermal conditioning mechanism operative to thermally induce a deformation of the body under control of a controller. By means of controllably deforming the body, the shape of the reflective surface can be adjusted in a controlled manner.
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公开(公告)号：WO2015110238A1
公开(公告)日：2015-07-30
申请号：PCT/EP2014/078631
申请日：2014-12-19
Applicant: ASML NETHERLANDS B.V.
Inventor： EURLINGS, Markus, Franciscus, Antonius , KLEEMANS, Niek, Antonius, Jacobus, Maria , VAN DIJSSELDONK, Antonius, Johannes, Josephus , HOFSTRA, Ramon, Mark , NOORDMAN, Oscar, Franciscus, Jozephus , PHAM, Tien Nang , VAN SCHOOT, Jan, Bernard, Plechelmus , WANG, Jiun-Cheng , ZHANG, Kevin, Weimin
CPC classification number: G03F7/70091 , G02B19/0019 , G02B27/0905 , G02B27/0983 , G03F7/70033 , G03F7/70175 , H05G2/005 , H05G2/008
Abstract: A faceted reflector (32, 32") for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.
Abstract translation: 用于接收入射辐射束（2）并将反射的辐射束引导到目标的小平面反射器（32,32“）。小面反射器包括多个小面，多个小面中的每个小面包括反射表面，反射 多个小面的第一子集中的每一个的表面限定第一连续表面的相应部分，并且被布置成在第一方向上反射入射辐射束的相应第一部分以提供反射辐射束的第一部分。 多个小平面的第二子集中的每一个的表面限定第二连续表面的相应部分，并且被布置成在第二方向上反射入射辐射束的相应第二部分以提供反射辐射束的第二部分。
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