公开(公告)号：WO2021004717A1

公开(公告)日：2021-01-14

申请号：PCT/EP2020/065943

申请日：2020-06-09

Applicant: ASML NETHERLANDS B.V.

Inventor： GOKCE, Berkcan ,  GANGULY, Vasishta, Parthasarathy ,  OEMRAWSINGH, Sumant, Sukdew, Ramanujan ,  STRUYCKEN, Alexander, Matthijs

IPC: G03F7/20 ,  B23K26/04 ,  G01J1/42 ,  H01S3/13 ,  H01S3/139 ,  H01S3/223 ,  H05G2/00 ,  G02B3/10 ,  G02C7/06

Abstract: A measurement system for use with a light amplification cavity comprises: an input optical element; an imaging system; and a detector. The input optical element is for receiving an input radiation beam and directing: a first portion of the input radiation beam along a first optical path; and a second portion of the input radiation beam along a second optical path (for example into a light amplification cavity). The imaging system is arranged on the first optical path and configured to form in an image plane: first and second images of the first portion of the input radiation beam, the first and second images being of two different planes along the first optical path. The detector is disposed in the image plane and is operable to detect the first and second images.

公开(公告)号：WO2018108440A1

公开(公告)日：2018-06-21

申请号：PCT/EP2017/079481

申请日：2017-11-16

Applicant: ASML NETHERLANDS B.V.

Inventor： OEMRAWSINGH, Sumant, Sukdew, Ramanujan ,  BLEEKER, Arno, Jan ,  STRUYCKEN, Alexander, Matthijs ,  VAN DER PASCH, Engelbertus, Antonius, Fransiscus ,  VAN DRIEËNHUIZEN, Bert, Pieter

IPC: G03F7/20 ,  G02B26/08

Abstract: An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.

公开(公告)号：WO2016131601A1

公开(公告)日：2016-08-25

申请号：PCT/EP2016/051242

申请日：2016-01-21

Applicant: ASML NETHERLANDS B.V.

Inventor： BLEEKER, Arno, Jan ,  HOFSTRA, Ramon, Mark ,  BUURMAN, Erik, Petrus ,  MOORS, Johannes, Hubertus, Josephina ,  STRUYCKEN, Alexander, Matthijs ,  VOORMA, Harm-Jan ,  OEMRAWSINGH, Sumant, Sukdew, Ramanujan ,  EURLINGS, Markus, Franciscus, Antonius ,  MUYS, Peter, Frans, Maria

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G02B27/141 ,  G03F7/70025 ,  G03F7/70566 ,  H01S3/0064 ,  H01S3/2308 ,  H01S3/2316 ,  H05G2/005 ,  H05G2/008

Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.

Abstract translation: 一种用于光刻工具的激光辐射源，包括用于发射具有第一波长的第一激光束的激光模块和具有第二波长的第二激光束;用于分离第一和第二激光束的光路的光束分离装置， 重新组合光路，射束传送系统将第一和第二激光束引导到燃料靶和光学隔离装置，以便：调整第一激光束的偏振状态，调节第二激光束的偏振状态并阻挡 具有经调整的偏振态的辐射使得第一激光束的反射和第二激光束的反射基本上被阻挡以朝向激光模块传播。

公开(公告)号：WO2010010034A1

公开(公告)日：2010-01-28

申请号：PCT/EP2009/059131

申请日：2009-07-16

Applicant: ASML NETHERLANDS B.V. ,  TEGENBOSCH, Henricus, Gerardus ,  STRUYCKEN, Alexander, Matthijs ,  KLEIJN, Jacob ,  BEERENS, Ruud, Antonius, Catharina, Maria ,  VANDERHALLEN, Ivo

Inventor： TEGENBOSCH, Henricus, Gerardus ,  STRUYCKEN, Alexander, Matthijs ,  KLEIJN, Jacob ,  BEERENS, Ruud, Antonius, Catharina, Maria ,  VANDERHALLEN, Ivo

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70175 ,  G03F7/70783 ,  G03F7/70825

Abstract: A mount configured to mount an optical element (1) in a module (70, 170) for a lithographic apparatus. The mount includes a plurality of resilient members (12) constructed and arranged to circumferentially support the optical element (1). Each resilient member (2) includes a plurality of resilient subsections that (4', 4'', 4''') are configured to engage the optical element (1) around a perimeter thereof. Each resilient subsection is configured to flex independent of another resilient subsection.

Abstract translation: 一种安装件，被配置为将光学元件（1）安装在用于光刻设备的模块（70,170）中。 该安装件包括构造和布置成周向支撑光学元件（1）的多个弹性构件（12）。 每个弹性构件（2）包括多个弹性部分，其中（4'，4“，4”'）被构造成围绕其周边接合光学元件（1）。 每个弹性子部分被配置成独立于另一个弹性子部分。