公开(公告)号：WO2020239373A1

公开(公告)日：2020-12-03

申请号：PCT/EP2020/062463

申请日：2020-05-05

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： LIPSON, Matthew ,  ACHANTA, Satish ,  DAWSON, Benjamin, David ,  SORNA, Matthew, Anthony ,  SIGAL, Iliya ,  UITTERDIJK, Tammo

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.

公开(公告)号：WO2018059836A1

公开(公告)日：2018-04-05

申请号：PCT/EP2017/071179

申请日：2017-08-23

Applicant: ASML NETHERLANDS B.V.

Inventor： ACHANTA, Satish ,  WELTERS, Wilhelmus, Jacobus, Johannes ,  SOETHOUDT, Abraham, Alexander ,  KAMMINGA, Jelmer, Mattheüs ,  LIEDECKE, Christian

IPC: G03F7/16 ,  B05D1/18 ,  C23C16/455 ,  H01L21/687

Abstract: The present invention relates to a substrate (100), a substrate holder (200), a substrate coating apparatus (800, 801), a method for coating the substrate (100) and a method for removing the coating (102). A monomolecular layer (102) is applied to the backside (101) of the substrate or a clamp surface (201) of the substrate holder (200). The friction force between the substrate backside and the substrate is small when the substrate does not experience full clamping force (210). After loading the substrate (100) on the substrate holder (200) full clamping force (210) is exerted in order to fix the substrate. The clamping force causes local removal of the monomolecular layer (102), resulting in an increase of the friction force between the substrate (100) and the substrate holder (200).

Abstract translation: （100），基板保持器（200），基板涂覆设备（800,801），用于涂覆基板（100）的方法和用于去除基板 涂层（102）。 将单分子层（102）施加到衬底的背面（101）或衬底支架（200）的夹持表面（201）。 当衬底没有经历完全夹紧力时，衬底背面和衬底之间的摩擦力很小（210）。 在将衬底（100）装载到衬底保持器（200）上之后，施加完全夹紧力（210）以固定衬底。 夹紧力导致局部去除单分子层（102），导致衬底（100）和衬底支架（200）之间的摩擦力增加。

公开(公告)号：WO2021122065A1

公开(公告)日：2021-06-24

申请号：PCT/EP2020/084671

申请日：2020-12-04

Applicant: ASML NETHERLANDS B.V.

Inventor： BECKERS, Johan, Franciscus, Maria ,  DAVIES, Dylan John David ,  KOEVOETS, Adrianus, Hendrik ,  VAN HAL, Paulus, Albertus ,  SEOANE DE LA CUESTA, Beatriz ,  STEL, Bart, Willem ,  STEVENS, Lucas, Henricus, Johannes ,  TROMP, Siegfried, Alexander ,  ACHANTA, Satish ,  VAN KUILENBURG, Julien

IPC: G03F7/16 ,  G03F7/20 ,  H01L21/687 ,  G03F7/165 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/7095 ,  H01L21/6875 ,  H01L21/68757

Abstract: The present invention relates to methods for reducing wafer load grid and flatness degradation of a substrate holder, such as a wafertable, of a lithographic apparatus. The present invention also relates to systems comprising lithography substrate holders, such as wafertables, with improved resistance to wafer load grid and flatness degradation, and to methods of fabricating devices, e.g. integrated circuits, using such systems. The present invention also relates to substrates, such as wafers, with backsides configured to protect substrate holders, such as wafertables, from wafer load grid and flatness degradation when used in lithography, and to methods of removing hydrophobic coatings from such substrates, such as wafers. The present invention has particular use in connection with lithographic apparatus for fabricating devices, for example integrated circuits.

公开(公告)号：WO2017060028A1

公开(公告)日：2017-04-13

申请号：PCT/EP2016/071139

申请日：2016-09-08

Applicant: ASML NETHERLANDS B.V.

Inventor： ACHANTA, Satish ,  GUAN, Tiannan ,  LAFARRE, Raymond, Wilhelmus, Louis ,  MALAKHOVSKY, Ilia ,  ROSET, Bas, Johannes, Petrus ,  TROMP, Siegfried, Alexander ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus

IPC: H01L21/687 ,  G03F7/20

CPC classification number: H01L21/68742 ,  G03F7/707 ,  G03F7/70733 ,  H01L21/6875

Abstract: The present invention provides a substrate table to support a substrate, comprising a main body, burls extending from the main body and having first upper ends, and support pins having second upper ends. The first upper ends define a support surface to support the substrate. The support pins are movable between a retracted position and an extended position. The support pins are arranged to support the substrate in the extended position. The support pins are arranged to be switched to a first stiffness mode and a second stiffness mode. In the first stiffness mode, the support pins have a first stiffness in a direction parallel to the support surface. In the second stiffness mode, the support pins have a second stiffness in the direction parallel to the support surface. The first stiffness is different from the second stiffness.

Abstract translation: 本发明提供了一种用于支撑基板的基板台，包括主体，从主体延伸并具有第一上端的凸起，以及具有第二上端的支撑销。 第一上端限定支撑表面以支撑衬底。 支撑销可在缩回位置和伸出位置之间移动。 支撑销布置成将基板支撑在延伸位置。 支撑销布置成切换到第一刚度模式和第二刚度模式。 在第一刚度模式中，支撑销在平行于支撑表面的方向上具有第一刚度。 在第二刚度模式中，支撑销在平行于支撑表面的方向上具有第二刚性。 第一刚度与第二刚度不同。

公开(公告)号：WO2018007498A1

公开(公告)日：2018-01-11

申请号：PCT/EP2017/066890

申请日：2017-07-06

Applicant: STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN ,  UNIVERSITEIT VAN AMSTERDAM ,  STICHTING VU ,  ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： POIESZ, Thomas ,  ACHANTA, Satish ,  AKBAS, Mehmet, Ali ,  ANTONOV, Pavlo ,  BOUWKNEGT, Jeroen ,  FRENKEN, Joost, Wilhelmus, Maria ,  PACITTI, Evelyn, Wallis ,  TEN KATE, Nicolaas ,  TIRRI, Bruce ,  VERHOEVEN, Jan

IPC: G03F7/20 ,  H01L21/687

Abstract: There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material. The layer of carbon based material provides a surface with a lower coefficient of friction than a part of the main body surface outside the plurality of separated regions of carbon based material. The layer of carbon based material covers only part of the distal end surface of at least one of the burls. Alternatively, the layer of carbon based material covers the distal end surface and at least a portion of the burl side surface of at least one of the burls.

Abstract translation: 公开了一种衬底保持器，制造衬底保持器的方法，包括该衬底保持器的光刻设备，以及使用该光刻设备制造器件的方法。 在一种布置中，提供了一种用于光刻设备中的衬底保持器。 衬底支架支撑衬底。 衬底支架包括主体。 主体具有主体表面。 设置从主体表面突出的多个突起。 每个钻头都有一个钻头侧表面和一个远端表面。 每个套管的远端表面与基底接合。 突起的远端表面基本上符合支撑平面并支撑基板。 在碳基材料的多个分离区域中提供一层碳基材料。 碳基材料层提供比多个碳基材料的分离区域外部的主体表面的一部分具有更低摩擦系数的表面。 碳基材料层仅覆盖至少一个突起的远端表面的一部分。 或者，碳基材料层覆盖至少一个突起的末端表面和至少一部分突起侧表面。

公开(公告)号：WO2014154428A2

公开(公告)日：2014-10-02

申请号：PCT/EP2014/053700

申请日：2014-02-26

Applicant: ASML NETHERLANDS B.V.

Inventor： LAFARRE, Raymond ,  ACHANTA, Satish ,  FILIPPI, Matteo ,  KARADE, Yogesh ,  NELLISSEN, Antonius ,  VAN DER WILK, Ronald ,  VAN DOREMALEN, Hendrikus, Christoffel, Maria ,  WELTERS, Wilhelmus

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70708

Abstract: A method of manufacturing an object holder for use in a lithographic apparatus, the object holder comprising one or more electrically functional components, the method comprising: using a composite structure comprising a carrier sheet different from a main body of the object holder and a layered structure comprising one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.

Abstract translation: 一种制造用于光刻设备的物体保持器的方法，所述物体保持器包括一个或多个电功能部件，所述方法包括：使用包括与所述物体保持器的主体不同的载体片的复合结构和层状结构 包括一个或多个层并形成在载体片上; 将复合结构连接到主体的表面，使得层状结构位于载体片和主体的表面之间; 并从复合结构中移除载体片，使分层结构连接到主体。

公开(公告)号：WO2021004705A1

公开(公告)日：2021-01-14

申请号：PCT/EP2020/065577

申请日：2020-06-05

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE KERKHOF, Marcus, Adrianus ,  ACHANTA, Satish ,  MOORS, Johannes, Hubertus, Josephina ,  BANINE, Vadim, Yevgenyevich ,  JANSSENS, Stef, Marten, Johan ,  NIKIPELOV, Andrey

IPC: G03F7/20 ,  G03F1/82 ,  G03F7/16 ,  H01L21/67 ,  H01L21/687

Abstract: A lithographic apparatus comprising: a clamping surface for supporting a substrate, wherein a property of the clamping surface is defined by at least one clamping surface parameter, and wherein the property of the clamping surface has been selected to exhibit low wear; a clamping apparatus for actuating a clamping operation between the clamping surface and the substrate, wherein the clamping operation is defined at least in part by at least one interface characteristic between the clamping surface and the substrate; and a processing station, operable to apply an adjustment to a first property of the substrate to optimize at least one interface characteristic of a particular clamping operation in dependence on the clamping surface parameter and at least one substrate surface parameter which defines a second property of the substrate.

公开(公告)号：WO2019154630A1

公开(公告)日：2019-08-15

申请号：PCT/EP2019/051767

申请日：2019-01-24

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： SCHOLTEN, Bert, Dirk ,  ACHANTA, Satish ,  AKCHURIN, Aydar ,  ANTONOV, Pavlo ,  BALTIS, Coen, Hubertus, Matheus ,  BOUWKNEGT, Jeroen ,  FARLE, Ann-Sophie M. ,  MASON, Christopher, John ,  PALERMO, Ralph, Nicholas ,  VAN DE VIJVER, Yuri, Johannes, Gabriël ,  VAN DE WINKEL, Jimmy, Matheus, Wilhelmus

IPC: G03F7/20 ,  B24B37/04 ,  B24B37/14 ,  H01L21/687

Abstract: An improved treatment tool (100) for reconditioning the top surfaces of a plurality of projections (20) of a substrate support (60) in a lithographic tool. The improved treatment tool includes a reconditioning surface which is rough relative to the smoothed top surfaces of the projections and which reconditioning surface has material harder than that of the material of the top surfaces of the projections. There is also provided a reconditioning method, the reconditioning method causing an interaction between the reconditioning surface of the improved treatment tool and the top surfaces of the projections of the substrate support, so as to leave these top surfaces rougher than they were prior to the interaction.

公开(公告)号：WO2019091694A1

公开(公告)日：2019-05-16

申请号：PCT/EP2018/077740

申请日：2018-10-11

Applicant: ASML NETHERLANDS B.V.

Inventor： POIESZ, Thomas ,  ACHANTA, Satish ,  BOUWKNEGT, Jeroen ,  SOETHOUDT, Abraham, Alexander

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/687

Abstract: There is disclosed a substrate holder, a method of manufacturing this substrate holder and a lithographic apparatus comprising this substrate holder. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder is configured to support a lower surface of a substrate. The substrate holder (WT) comprises a main body (40), a plurality of burls and a coating (23). The main body has a substrate-facing face (41). The plurality of burls protrude from the substrate-facing face. Each burl has a distal end configured to engage with the substrate. The distal ends are configured for supporting the substrate. The coating is on the substrate-facing face between the burls. Between the burls the substrate-facing face comprises an arrangement of areas (42,43). Adjacent areas are separated by a step-change in distance below the support plane. Each step-change is greater than a thickness of the coating.