公开(公告)号：WO2017036944A1

公开(公告)日：2017-03-09

申请号：PCT/EP2016/070161

申请日：2016-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： HOUWELING, Zomer, Silvester ,  CASIMIRI, Eric, Willem, Felix ,  DRUZHININA, Tamara ,  JANSSEN, Paul ,  KUIJKEN, Michael, Alfred, Josephus ,  LEENDERS, Martinus, Hendrikus, Antonius ,  OOSTERHOFF, Sicco ,  PÉTER, Mária ,  VAN DER ZANDE, Willem, Joan ,  VAN ZWOL, Pieter-Jan ,  VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  VLES, David, Ferdinand ,  VOORTHUIJZEN, Willem-Pieter

IPC: G03F1/62

CPC classification number: G03F1/62

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.

Abstract translation: 一种用于制造用于EUV光刻的膜组件的方法，所述方法包括：提供包括平面基板和至少一个膜层的堆叠，其中所述平面基板包括内部区域和围绕所述内部区域的边界区域; 将所述堆叠定位在支撑件上，使得所述平面基板的内部区域被暴露; 并且使用非液体蚀刻剂选择性地去除所述平面基板的内部区域，使得所述膜组件包括：由所述至少一个膜层形成的膜; 以及保持膜的边界，从平面基板的边界区域形成的边界。

公开(公告)号：WO2017076686A1

公开(公告)日：2017-05-11

申请号：PCT/EP2016/075605

申请日：2016-10-25

Applicant: ASML NETHERLANDS B.V.

Inventor： OOSTERHOFF, Sicco ,  JANSSEN, Paul ,  VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien

IPC: G03F7/20 ,  G03F1/62 ,  G21K1/06 ,  B82Y40/00

CPC classification number: G03F7/70983 ,  B82Y40/00 ,  G03F1/62 ,  G03F7/70916 ,  G03F7/70958 ,  G21K2201/067

Abstract: A method for manufacturing a membrane assembly (80) for EUV lithography, the method comprising: providing a stack (40) comprising a membrane layer (45) between a supporting substrate (41) and an attachment substrate (51), wherein the supporting substrate comprises an inner region and a first border region; processing the stack, including selectively removing the inner region of the supporting substrate, to form a membrane assembly comprising: a membrane (45) formed from at least the membrane layer; and a support (81) holding the membrane, the support formed at least partially from the first border region of the supporting substrate. The attachment substrate can be bonded to the rest of the stack.

Abstract translation: 一种用于制造用于EUV光刻的膜组件（80）的方法，所述方法包括：在支撑基板（41）和附接基板（41）之间提供包括膜层（45）的叠层（40） （51），其中所述支撑衬底包括内部区域和第一边界区域; 处理所述叠层，包括选择性地去除所述支撑衬底的内部区域，以形成膜组件，所述膜组件包括：由至少所述膜层形成的膜（45） 和保持所述膜的支撑件（81），所述支撑件至少部分地从所述支撑基底的所述第一边界区域形成。 附件基材可以粘合到堆叠的其余部分。