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公开(公告)号：WO2017036944A1
公开(公告)日：2017-03-09
申请号：PCT/EP2016/070161
申请日：2016-08-26
Applicant: ASML NETHERLANDS B.V.
Inventor： HOUWELING, Zomer, Silvester , CASIMIRI, Eric, Willem, Felix , DRUZHININA, Tamara , JANSSEN, Paul , KUIJKEN, Michael, Alfred, Josephus , LEENDERS, Martinus, Hendrikus, Antonius , OOSTERHOFF, Sicco , PÉTER, Mária , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
IPC: G03F1/62
CPC classification number: G03F1/62
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
Abstract translation: 一种用于制造用于EUV光刻的膜组件的方法，所述方法包括：提供包括平面基板和至少一个膜层的堆叠，其中所述平面基板包括内部区域和围绕所述内部区域的边界区域; 将所述堆叠定位在支撑件上，使得所述平面基板的内部区域被暴露; 并且使用非液体蚀刻剂选择性地去除所述平面基板的内部区域，使得所述膜组件包括：由所述至少一个膜层形成的膜; 以及保持膜的边界，从平面基板的边界区域形成的边界。
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公开(公告)号：WO2017102378A1
公开(公告)日：2017-06-22
申请号：PCT/EP2016/079584
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KAMALI, Mohammad, Reza , PÉTER, Mária , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
CPC classification number: G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983
Abstract: A membrane assembly (80) for EUV lithography, the membrane assembly comprising: a planar membrane (40); a border (81) configured to hold the membrane; and a frame assembly (50) connected to the border and configured to attach to a patterning device (MA) for EUV lithography; wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.
Abstract translation: 一种用于EUV光刻的薄膜组件（80），所述薄膜组件包括：平面薄膜（40）; 边界（81），配置为保持膜; 和框架组件（50），所述框架组件（50）连接到所述边界并且被配置成附接到用于EUV光刻的图案形成装置（MA）; 其中所述框架组件在垂直于所述膜平面的方向上连接到所述边界，使得在使用中所述框架组件位于所述边界和所述图案形成装置之间。
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公开(公告)号：WO2017198418A1
公开(公告)日：2017-11-23
申请号：PCT/EP2017/059475
申请日：2017-04-21
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/004
CPC classification number: G03F7/0044 , G03F7/0043 , G03F7/038 , G03F7/039 , G03F7/16 , G03F7/2004 , G03F7/2037 , G03F7/32 , H01L21/0274
Abstract: A resist composition comprising a) metal-containing nanoparticles and/or nanoclusters, and b) ligands and or organic linkers, wherein one or both of a) or b) are multivalent. A resist composition wherein: i) the resist composition is a negative resist and the nanoparticles and/or nanoclusters cluster upon crosslinking of the ligands and/or organic linkers following exposure to electromagnetic radiation or an electron beam; or ii) the resist composition is a negative resist and the ligands and/or organic linkers are crosslinked and the crosslinking bonds are broken upon exposure to electromagnetic radiation or an electron beam allowing the nanoparticles and/or nanoclusters to cluster together; or the resist composition is a positive resist and the ligands and/or organic linkers are crosslinked and the crosslinking bonds are broken upon exposure to electromagnetic radiation or an electron beam.
Abstract translation: 抗蚀剂组合物，其包含a）含金属纳米颗粒和/或纳米团簇，和b）配体和/或有机连接剂，其中a）或b）中的一者或两者是多价的。 一种抗蚀剂组合物，其中：i）抗蚀剂组合物是负性抗蚀剂，并且在暴露于电磁辐射或电子束之后，配体和/或有机连接体交联后，纳米颗粒和/或纳米簇聚集; 或ii）所述抗蚀剂组合物是负性抗蚀剂，并且所述配体和/或有机连接体交联，并且在暴露于允许所述纳米颗粒和/或纳米团簇聚集在一起的电磁辐射或电子束时所述交联键断裂; 或抗蚀剂组合物是正性抗蚀剂，并且配体和/或有机连接体交联，并且在暴露于电磁辐射或电子束时交联键断裂。
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公开(公告)号：WO2017186486A1
公开(公告)日：2017-11-02
申请号：PCT/EP2017/058721
申请日：2017-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： NASALEVICH, Maxim, Aleksandrovich , ABEGG, Erik, Achilles , BANERJEE, Nirupam , BLAUW, Michiel, Alexander , BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KRUIZINGA, Matthias , LENDERINK, Egbert , MAXIM, Nicolae , NIKIPELOV, Andrey , NOTENBOOM, Arnoud, Willem , PILIEGO, Claudia , PÉTER, Mária , RISPENS, Gijsbert , SCHUH, Nadja , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBURG, Antonius, Willem , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter , ZDRAVKOV, Alexandar, Nikolov
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
Abstract translation: 公开了用于EUV光刻的膜。 在一种布置中，膜包括具有以下顺序的层的堆叠体：包含第一金属的氧化物的第一封盖层; 基层，其包含含有第二金属和选自Si，B，C和N的附加元素的化合物; 以及包含第三金属的氧化物的第二覆盖层，其中第一金属不同于第二金属，第三金属与第一金属相同或不同。
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公开(公告)号：WO2017102379A1
公开(公告)日：2017-06-22
申请号：PCT/EP2016/079594
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN ZWOL, Pieter-Jan , DE GRAAF, Dennis , JANSSEN, Paul , PÉTER, Mária , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
CPC classification number: G03F1/24 , G03F1/62 , G03F7/70916 , G03F7/70983
Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and comprising a stack comprising: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine
Abstract translation: 一种用于EUV光刻的膜，所述膜具有不大于200nm的厚度并且包括叠层，所述叠层包括：至少一个硅层; 以及至少一个由硅化合物和选自由硼，磷，溴组成的组中的元素构成的硅化合物层，
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Patent Agency Ranking6.发明申请
公开(公告)号：WO2017067813A2
公开(公告)日：2017-04-27
申请号：PCT/EP2016/074280
申请日：2016-10-11
Applicant: ASML NETHERLANDS B.V.
Inventor： PÉTER, Mária , ABEGG, Erik, Achilles , GIESBERS, Adrianus, Johannes, Maria , KLOOTWIJK, Johan, Hendrik , NASALEVICH, Maxim, Aleksandrovich , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
IPC: G03F7/20
CPC classification number: G03F7/70958 , G03F1/62 , G03F7/70983 , G21K2201/067
Abstract: Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer on a planar surface of a substrate. The substrate comprises a first substrate portion and a second substrate portion. The method further comprises removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
Abstract translation: 公开了制造用于光刻设备的防护薄膜组件的方法。 在一种布置中，该方法包括在衬底的平坦表面上沉积至少一个石墨烯层。 衬底包括第一衬底部分和第二衬底部分。 该方法还包括去除第一衬底部分以从至少一个石墨烯层形成独立式膜。 独立膜由第二基底部分支撑。
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7.发明申请
公开(公告)号：WO2019025082A1
公开(公告)日：2019-02-07
申请号：PCT/EP2018/067052
申请日：2018-06-26
Applicant: ASML NETHERLANDS B.V.
Inventor： KURGANOVA, Evgenia , GIESBERS, Adrianus, Johannes, Maria , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , PÉTER, Mária , VAN ZWOL, Pieter-Jan , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
Abstract: A method of manufacturing a pellicle for a lithographic apparatus, said method comprising: locally heating the pellicle (4) using radiative heating (3), and depositing coating material simultaneously on both sides of the pellicle. Also disclosed are pellicles manufactured according to this method. Further disclosed is the use of a multilayer graphene pellicle with double-sided hexagonal boron nitride coating in a lithographic apparatus.
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公开(公告)号：WO2018228933A3
公开(公告)日：2018-12-20
申请号：PCT/EP2018/065127
申请日：2018-06-08
Applicant: ASML NETHERLANDS B.V.
Inventor： VLES, David, Ferdinand , ANDE, Chaitanya Krishna , DE GROOT, Antonius, Franciscus, Johannes , GIESBERS, Adrianus, Johannes, Maria , JANSSEN, Johannes, Joseph , JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , MEIJER, Marcel, Peter , MEIJERINK, Wouter, Rogier , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , OLSMAN, Raymond , PATEL, Hrishikesh , PÉTER, Mária , VAN DEN BOSCH, Gerrit , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Alexandar, Nikolov
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：WO2018228933A2
公开(公告)日：2018-12-20
申请号：PCT/EP2018/065127
申请日：2018-06-08
Applicant: ASML NETHERLANDS B.V.
Inventor： VLES, David, Ferdinand , ANDE, Chaitanya Krishna , DE GROOT, Antonius, Franciscus, Johannes , GIESBERS, Adrianus, Johannes, Maria , JANSSEN, Johannes, Joseph , JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , MEIJER, Marcel, Peter , MEIJERINK, Wouter, Rogier , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , OLSMAN, Raymond , PATEL, Hrishikesh , PÉTER, Mária , VAN DEN BOSCH, Gerrit , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Alexandar, Nikolov
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：WO2017102380A1
公开(公告)日：2017-06-22
申请号：PCT/EP2016/079599
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： VLES, David, Ferdinand , ABEGG, Erik, Achilles , BENDIKSEN, Aage , BROUNS, Derk, Servatius, Gertruda , GOVIL, Pradeep K. , JANSSEN, Paul , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , PÉTER, Mária , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WILEY, James, Norman
CPC classification number: G03F7/70916 , G03F1/22 , G03F1/62 , G03F7/7085 , G03F7/70983
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
Abstract translation: 适用于光刻设备的图案形成装置的薄膜。 所述薄膜包括至少一个破损区域，所述破坏区域被配置为在光刻设备的正常使用期间优先破坏所述薄膜的其余区域之前破裂。 至少一个破裂区域包括薄膜的与周围薄膜区域相比厚度减小的区域。
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