公开(公告)号：WO2016058822A1

公开(公告)日：2016-04-21

申请号：PCT/EP2015/072376

申请日：2015-09-29

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN ZWOL, Pieter-Jan ,  KUZNETSOV, Alexey, Sergeevich ,  OSORIO OLIVEROS, Edgar ,  STEVENS, Lucas

IPC: G21K1/06 ,  G03F7/20

CPC classification number: G21K1/062 ,  G03F7/70316 ,  G03F7/70916 ,  G03F7/70933 ,  G03F7/70958

Abstract: A multilayer optics is configured for reflection of radiation having a wavelength λ, the multilayer optics comprising a multilayer stack (300) of alternating layer pairs, wherein each pair thereof comprises a first/second layer of thickness d1/d2, wherein a periodic length p=d1+d2 of each pair of alternating layers satisfies: m λ = 2 p sinΘ, wherein m = 1, 2, 3, etc. is an integer representing the order of the Bragg diffraction peak and Θ is the angle between an incident radiation and a scattering plane of the multilayer optics; a protective region (310) comprising pairs of alternating protective layers, each pair thereof comprising a first/second protective layer of thickness ds1/ds2, wherein a periodic length ps=ds1+ds2 of each pair of alternating protective layers satisfies: m λ = 2 ps sinΘ and ps = p N, wherein N is an integer equal or larger than 2. The multilayer mirror may optionally be provided with a capping layer (320). There is further disclosed an apparatus for extreme ultraviolet lithography comprising: a vacuum container comprising an optical element having an optically active surface, a gas supply system comprising a source of an anti-blistering gaseous mixture, an exhauster configured to exhaust gas in said vacuum container; wherein the gas supply system is arranged to provide the anti-blistering gaseous mixture at the optically active surface of the optical element, and wherein the anti-blistering gaseous mixture comprises an oxygen containing gas compound at a partial pressure ranging from 5e-8 to 1e-4 mbar.

Abstract translation: 多层光学器件被配置用于反射具有波长λ的辐射，所述多层光学器件包括交替层对的多层堆叠（300），其中每对包括厚度为d1 / d2的第一/第二层，其中周期长度p 每对交替层的= d1 + d2满足：mλ= 2 psinθ，其中m = 1,2,3等是表示布拉格衍射峰的顺序的整数，Θ是入射辐射 和多层光学器件的散射面; 包括交替保护层对的保护区域（310），每对保护层包括厚度为ds1 / ds2的第一/第二保护层，其中每对交替保护层的周期长度ps = ds1 + ds2满足：mλ= 2pssinΘ和ps = p N，其中N是等于或大于2的整数。多层反射镜可以可选地设置有覆盖层（320）。 还公开了一种用于极紫外光刻的装置，包括：真空容器，其包括具有光学活性表面的光学元件，气体供应系统，其包括防起泡气体混合物源，排气器，其构造成在所述真空容器 ; 其中所述气体供应系统被布置成在所述光学元件的光学活性表面处提供所述防起泡气体混合物，并且其中所述防起泡气体混合物包含分压为5e-8至1e的含氧气体化合物 -4毫巴

公开(公告)号：WO2011147628A1

公开(公告)日：2011-12-01

申请号：PCT/EP2011/055360

申请日：2011-04-06

Applicant: ASML NETHERLANDS B.V. ,  TIMOSHKOV, Vadim ,  YAKUNIN, Andrei ,  OSORIO OLIVEROS, Edgar ,  VAN SCHOOT, Jan Bernard Plechelmus ,  KEMPEN, Antonius Theodorus Wilhelmus

Inventor： TIMOSHKOV, Vadim ,  YAKUNIN, Andrei ,  OSORIO OLIVEROS, Edgar ,  VAN SCHOOT, Jan Bernard Plechelmus ,  KEMPEN, Antonius Theodorus Wilhelmus

IPC: G03F7/20 ,  C23C14/14 ,  G21K1/06

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  C23C14/48 ,  C23C14/586 ,  G21K1/062

Abstract: There is provided a multilayer mirror (80) comprising a layer of a first material (84) and a layer of silicon (82). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon.

Abstract translation: 提供了包括第一材料（84）和硅层（82）的层的多层反射镜（80）。 第一材料层和硅层形成一叠层。 硅层的暴露区域包括被设置为改善暴露的硅区域的鲁棒性的修改。

公开(公告)号：WO2014072149A3

公开(公告)日：2014-05-15

申请号：PCT/EP2013/071141

申请日：2013-10-10

Applicant: ASML NETHERLANDS B.V.

Inventor： LOOPSTRA, Erik ,  YAKUNIN, Andrei ,  BANINE, Vadim ,  NIKIPELOV, Andrey ,  OSORIO OLIVEROS, Edgar ,  STRUYCKEN, Alexander ,  VAN DRIEËNHUIZEN, Bert ,  VAN SCHOOT, Jan

IPC: G03F7/20 ,  H05G2/00 ,  G21K1/06 ,  G02B27/09 ,  H01S3/10 ,  H01S3/067 ,  H01S3/23 ,  H04J14/00

Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous- wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma.

公开(公告)号：WO2013174656A2

公开(公告)日：2013-11-28

申请号：PCT/EP2013/059617

申请日：2013-05-08

Applicant: ASML NETHERLANDS B.V.

Inventor： OSORIO OLIVEROS, Edgar

IPC: G03F7/20 ,  G03F1/24 ,  G21K1/06

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  B82Y30/00 ,  G02B5/085 ,  G02B5/0891 ,  G02B27/0006 ,  G03F1/24 ,  G03F1/62 ,  G03F7/7015 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067 ,  Y10S977/734

Abstract: A reflector comprising a reflecting surface or structure provided with a cap layer formed from Silicene or a Silicene derivative. The reflector may be provided in a lithographic apparatus.

Abstract translation: 一种反射器，包括设置有由硅或硅烷衍生物形成的盖层的反射表面或结构。 反射器可以设置在光刻设备中。