公开(公告)号：WO2021032376A1

公开(公告)日：2021-02-25

申请号：PCT/EP2020/070151

申请日：2020-07-16

Applicant: ASML NETHERLANDS B.V.

Inventor： HAUPTMANN, Marc ,  LAMBREGTS, Cornelis, Johannes, Henricus ,  ISMAIL, Amir, Bin ,  RAHMAN, Rizvi ,  BOUSTHEEN, Allwyn ,  PISHKARI, Raheleh ,  MOS, Everhardus, Cornelis ,  VIATKINA, Ekaterina, Mikhailovna ,  WERKMAN, Roy ,  BRINKHOF, Ralph

IPC: G03F7/20

Abstract: A method of controlling a semiconductor manufacturing process, the method comprising: obtaining first metrology data based on measurements performed after a first process step; obtaining second metrology data based on measurements performed after the first process step and at leastone additional process step; estimating a contribution to the process of: a) a control action which is at least partially based on the second metrology data and/or b) the at least one additional process step by using at least partially the second metrology data; and determining a Key Performance Indicator (KPI) or a correction for the first process step using the first metrology data and the estimated contribution.