公开(公告)号：WO2014016056A1

公开(公告)日：2014-01-30

申请号：PCT/EP2013/062630

申请日：2013-06-18

Applicant: ASML NETHERLANDS B.V.

Inventor： CRAMER, Hugo ,  SOCHA, Robert ,  TINNEMANS, Patricius ,  VAESSEN, Jean-Pierre

IPC: G03F7/20

CPC classification number: G01N23/203 ,  G03F7/70058 ,  G03F7/70625 ,  H01J37/26

Abstract: An inspection method determines values of profile parameters of substrate patterns. A baseline substrate with a baseline pattern target (BP) is produced that has a profile described by profile parameters, for example CD (median critical dimension), SWA (side wall angle) and RH (resist height). Scatterometry is used to obtain first and second signals from first and second targets. Values of differential pattern profile parameters are calculated using a Bayesian differential cost function based on a difference between the baseline pupil and the perturbed pupil and dependence of the pupil on pattern profile parameters. For example, the difference is measured between a baseline process and a perturbed process for stability control of a lithographic process. Fed-forward differential stack parameters are also calculated from observations of stack targets on the same substrates as the pattern targets.

Abstract translation: 检查方法确定基板图案的轮廓参数的值。 产生具有基线图案目标（BP）的基准基底，其具有通过轮廓参数描述的轮廓，例如CD（中值临界尺寸），SWA（侧壁角）和RH（抗蚀剂高度）。 散射法用于获得第一和第二个目标的第一和第二信号。 使用贝叶斯差分成本函数，基于基线瞳孔和扰动瞳孔之间的差异以及瞳孔对图形轮廓参数的依赖性来计算微分图案轮廓参数的值。 例如，在基线工艺和用于光刻工艺的稳定性控制的扰动过程之间测量差异。 前馈差分堆栈参数也是通过与模式目标相同的基板上的堆叠目标的观察来计算的。

公开(公告)号：WO2016184664A1

公开(公告)日：2016-11-24

申请号：PCT/EP2016/059655

申请日：2016-04-29

Applicant: ASML NETHERLANDS B.V.

Inventor： ZOU, Yi ,  SU, Jing ,  SOCHA, Robert ,  SPENCE, Christopher, Alan ,  HSU, Duan-Fu, Stephen

IPC: G03F7/20 ,  G06F17/50

CPC classification number: G03F7/70433 ,  G03F7/70466

Abstract: Disclosed herein is a computer-implemented method comprising: obtaining a sub-layout comprising an area that is a performance limiting spot; adjusting colors of patterns in the area; determining whether the area is still performance limiting spot. Another method comprises: decomposing patterns in a design layout into multiple sub-layouts; determining for at least one area in one of the sub- layouts, the likelihood of that a figure of merit is beyond its allowed range; if the likelihood is above a threshold, that one sub-layout has a performance limiting spot. Yet another method disclosed comprises: obtaining a design layout comprising a first group of patterns and a second group of patterns, wherein colors of the first group of patterns are not allowed to change and colors of the second group of patterns are allowed to change; co-optimizing at least the first group of patterns, the second group of patterns and a source of a lithographic apparatus.

Abstract translation: 本文公开了一种计算机实现的方法，包括：获得包括作为性能限制点的区域的子布局; 调整该区域的图案颜色; 确定该区域是否仍然是性能限制点。 另一种方法包括：将设计布局中的图案分解为多个子布局; 确定一个子布局中的至少一个区域，品质因数超出其允许范围的可能性; 如果可能性高于阈值，则该子布局具有性能限制点。 公开的另一种方法包括：获得包括第一组图案和第二组图案的设计布局，其中第一组图案的颜色不允许改变，并且允许第二组图案的颜色改变; 共同优化至少第一组图案，第二组图案和光刻设备的来源。