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Patent Agency Ranking
公开(公告)号：WO2020043474A1
公开(公告)日：2020-03-05
申请号：PCT/EP2019/071615
申请日：2019-08-12
Applicant: ASML NETHERLANDS B.V.
Inventor： SPENCE, Christopher, Alan
Abstract: A method of controlling an imaging process uses a qualified optical proximity correction (OPC) model, including obtaining an OPC model that is configured to model the behavior of OPC modifications to a pre-OPC design in a process for forming a pattern on a substrate using a post-OPC design in a patterning process, using the patterning process in a manufacturing environment, collecting process control data in substrates patterned using the patterning process in the manufacturing environment, storing the collected process control data in a database, analyzing, by a hardware computer system, the stored, collected process control data to verify that the OPC model is correcting pattern features within a selected threshold, and for pattern features falling outside the selected threshold, determining a modification to the imaging process to correct imaging errors.
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公开(公告)号：WO2021175570A1
公开(公告)日：2021-09-10
申请号：PCT/EP2021/053569
申请日：2021-02-12
Applicant: ASML NETHERLANDS B.V.
Inventor： TAO, Jun , CAO, Yu , SPENCE, Christopher, Alan
IPC: G03F1/36
Abstract: A method for training a machine learning model to generate a characteristic pattern includes obtaining training data associated with a reference feature in a reference image. The training data includes (i) location data of each portion of the reference feature, and (ii) a presence value indicating whether the portion of the reference feature is located within a reference assist feature generated for the reference feature. The method includes training the machine learning model to predict a presence value based on the actual presence value in the training data. The predicted presence value indicates whether a portion of a feature (e.g., a skeleton point on a skeleton of a contour of the feature) is to be covered by an assist feature set. The training is performed based on the training data such that a metric between a predicted presence value and the presence value is minimized.
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公开(公告)号：WO2022128500A1
公开(公告)日：2022-06-23
申请号：PCT/EP2021/083917
申请日：2021-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： TAO, Jun , CAO, Yu , SPENCE, Christopher, Alan
Abstract: Described herein are a method for determining a mask pattern and a method for training a machine learning model. The method for generating data for a mask pattern associated with a patterning process includes obtaining (i) a first mask image (e.g., CTM) associated with a design pattern, (ii) a contour (e.g., a resist contour) based on the first mask image, (iii) a reference contour (e.g., an ideal resist contour) based on the design pattern; and (iv) a contour difference between the contour and the reference contour. The contour difference and the first mask image are inputted to a model to generate mask image modification data. Based on the first mask image and the mask image modification data, a second mask image is generated for determining a mask pattern to be employed in the patterning process.
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公开(公告)号：WO2022263312A1
公开(公告)日：2022-12-22
申请号：PCT/EP2022/065811
申请日：2022-06-10
Applicant: ASML NETHERLANDS B.V.
Inventor： TAO, Jun , CAO, Yu , SPENCE, Christopher, Alan
Abstract: Described herein is a method of determining assist features for a mask pattern. The method includes obtaining (i) a target pattern comprising a plurality of target features, wherein each of the plurality of target features comprises a plurality of target edges, and (ii) a trained sequence-to- sequence machine leaning (ML) model (e.g., long short term memory, Gated Recurrent Units, etc.) configured to determine sub-resolution assist features (SRAFs) for the target pattern. For a target edge of the plurality of target edges, geometric information (e.g., length, width, distances between features, etc.) of a subset of target features surrounding the target edge is determined. Using the geometric information as input, the ML model generates SRAFs to be placed around the target edge.
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公开(公告)号：WO2016184664A1
公开(公告)日：2016-11-24
申请号：PCT/EP2016/059655
申请日：2016-04-29
Applicant: ASML NETHERLANDS B.V.
Inventor： ZOU, Yi , SU, Jing , SOCHA, Robert , SPENCE, Christopher, Alan , HSU, Duan-Fu, Stephen
CPC classification number: G03F7/70433 , G03F7/70466
Abstract: Disclosed herein is a computer-implemented method comprising: obtaining a sub-layout comprising an area that is a performance limiting spot; adjusting colors of patterns in the area; determining whether the area is still performance limiting spot. Another method comprises: decomposing patterns in a design layout into multiple sub-layouts; determining for at least one area in one of the sub- layouts, the likelihood of that a figure of merit is beyond its allowed range; if the likelihood is above a threshold, that one sub-layout has a performance limiting spot. Yet another method disclosed comprises: obtaining a design layout comprising a first group of patterns and a second group of patterns, wherein colors of the first group of patterns are not allowed to change and colors of the second group of patterns are allowed to change; co-optimizing at least the first group of patterns, the second group of patterns and a source of a lithographic apparatus.
Abstract translation: 本文公开了一种计算机实现的方法，包括：获得包括作为性能限制点的区域的子布局; 调整该区域的图案颜色; 确定该区域是否仍然是性能限制点。 另一种方法包括：将设计布局中的图案分解为多个子布局; 确定一个子布局中的至少一个区域，品质因数超出其允许范围的可能性; 如果可能性高于阈值，则该子布局具有性能限制点。 公开的另一种方法包括：获得包括第一组图案和第二组图案的设计布局，其中第一组图案的颜色不允许改变，并且允许第二组图案的颜色改变; 共同优化至少第一组图案，第二组图案和光刻设备的来源。
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