公开(公告)号：WO2016012193A1

公开(公告)日：2016-01-28

申请号：PCT/EP2015/064500

申请日：2015-06-26

Applicant: ASML NETHERLANDS B.V.

Inventor： POLET, Theodorus, Wilhelmus ,  BASELMANS, Johannes, Jacobus, Matheus ,  BOUMAN, Willem, Jan ,  LEMPENS, Han, Henricus, Aldegonda ,  MODDERMAN, Theodorus, Marinus ,  ROPS, Cornelius, Maria ,  SMEETS, Bart ,  STEFFENS, Koen ,  VAN DER HAM, Ronald

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

Abstract: Lithographic apparatus and device manufacturing methods are disclosed. In one arrangement there is provided an immersion lithographic apparatus comprising a projection system (PS). The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system comprises a first surface (102). The first surface has a non-planar shape. An element (106) is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element comprises a closed loop of continuously integral material in a preformed state and conforming to the non-planar shape of the first surface.

Abstract translation: 公开了平版印刷设备和设备制造方法。 在一种布置中，提供了包括投影系统（PS）的浸没式光刻设备。 投影系统被配置为将图案化的辐射束通过浸没液投影到基板的目标部分上。 投影系统的外表面包括第一表面（102）。 第一表面具有非平面形状。 元件（106）附接到第一表面并且定位成使得至少一部分元件在使用中接触浸没液体。 该元件包括处于预成型状态并与第一表面的非平面形状一致的连续整体材料的闭环。

公开(公告)号：WO2021047911A1

公开(公告)日：2021-03-18

申请号：PCT/EP2020/073867

申请日：2020-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： POLET, Theodorus, Wilhelmus ,  STEFFENS, Koen ,  VAN DER HAM, Ronald ,  PIETERSE, Gerben ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  FAHRNI, Francis

IPC: G03F7/20

Abstract: A fluid handling system for wetting a region of a surface of a substrate irradiated by a radiation beam. The fluid handling system comprises a first device (112) configured to confine a first liquid to a first space (111) between at least a part of the first device and the surface of the substrate. The first device comprising an aperture (10) formed therein for the passage therethrough of the radiation beam (B) to irradiate the region by passing through the first liquid. The first device comprising at least one first liquid supply member (20, 23, 34) configured to provide the first liquid to the first space and at least one extraction member (32) configured to remove liquid from the first space. The fluid handling system further comprises a second device (200) comprising at least one second liquid supply member (201) configured to provide a second liquid to a second space (211) between at least a part of the second device and the surface of the substrate, wherein there is a gap (g) on the surface of the substrate between the second liquid and the first liquid. The fluid handling system is configured to provide the second liquid to the second space without removing any liquid from the second space to form a liquid layer over at least the region, and is configured to provide the first liquid and the second liquid on the surface of the substrate simultaneously.

公开(公告)号：WO2016000903A1

公开(公告)日：2016-01-07

申请号：PCT/EP2015/062525

申请日：2015-06-04

Applicant: ASML NETHERLANDS B.V.

Inventor： PIETERSE, Gerben ,  POLET, Theodorus, Wilhelmus ,  BASELMANS, Johannes, Jacobus, Matheus ,  BOUMAN, Willem, Jan ,  MODDERMAN, Theodorus, Marinus ,  ROPS, Cornelius, Maria ,  SMEETS, Bart ,  STEFFENS, Koen ,  VAN DER HAM, Ronald

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70341

Abstract: An immersion lithographic apparatus comprising: a projection system for projecting a patterned radiation beam through an optically active part of a final lens element of the projection system towards a substrate supported by a substrate table, the final lens element having an exposed bottom surface; a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between the final lens element of the projection system and a surface formed of at least one of the substrate and substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and the optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly with respect to an optical axis of the projection system at least to an edge of the exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.

Abstract translation: 一种浸没式光刻设备，包括：投影系统，用于将图案化的辐射束通过投影系统的最终透镜元件的光学活性部分朝向由衬底台支撑的衬底投射，最终透镜元件具有暴露的底表面; 液体限制结构，被配置为将浸没液体供应并限制在投影系统的最终透镜元件与由至少一个基板和基板台形成的表面之间的浸没空间中; 以及在所述投影系统和所述液体限制结构之间的通道形成器以及所述通道形成器和所述最终透镜元件的光学活性部分之间的通道，所述通道经由具有所述浸没空间的开口与所述浸没空间液体连通并且径向延伸 至少相对于最终透镜元件的暴露的底部表面的边缘而相对于投影系统的光轴向外侧并且被构造和构造使得在使用中通过毛细管作用从浸没空间填充液体。

公开(公告)号：WO2013178438A1

公开(公告)日：2013-12-05

申请号：PCT/EP2013/059437

申请日：2013-05-07

Applicant: ASML NETHERLANDS B.V.

Inventor： LAURENT, Thibault ,  BLOKS, Ruud ,  CORTIE, Rogier ,  HOUBEN, Martijn ,  JACOBS, Johannes ,  LAFARRE, Raymond ,  LEMPENS, Han ,  OVERKAMP, Jim ,  PIETERSE, Gerben ,  POLET, Theodorus ,  SIMONS, Wilhelmus ,  STEFFENS, Koen ,  TROMP, Siegfried ,  VY, Van Vuong

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

Abstract: An object table (WT) to support an object (W), the object table having a support body (100), an object holder (30) to hold an object, an opening (5) adjacent an edge of the object holder, and a channel (16) in fluid communication with the opening via a passageway (14), wherein the channel is defined by a first material which is different to a second material defining the passageway.

Abstract translation: 用于支撑物体（W）的物体台（WT），所述物体台具有支撑体（100），用于保持物体的物体保持器（30），与所述物体保持器的边缘相邻的开口（5），以及 经由通道（14）与所述开口流体连通的通道（16），其中所述通道由与限定所述通道的第二材料不同的第一材料限定。