公开(公告)号：WO2019115196A1

公开(公告)日：2019-06-20

申请号：PCT/EP2018/082184

申请日：2018-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： LA TORRE, Federico ,  VAN BOKHOVEN, Laurentius, Johannes, Adrianus ,  FONSECA JUNIOR, José, Nilton ,  PIETERSE, Gerben ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  VAN BOXTEL, Frank, Johannes, Jacobus

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/20 ,  G03F7/70875 ,  G03F7/70933

Abstract: Disclosed herein is a lithographic apparatus comprising: a movable stage comprising a support structure configured to support a patterning device; a projection system configured to project a patterned radiation beam onto a target portion of a substrate; and a plate positioned between the movable stage and the projection system; wherein the plate comprises: a first surface that faces the movable stage; a second surface that faces the projection system; an opening through the plate such that the patterned radiation beam passes through the opening, wherein the opening has at least a first side and a second side that extend from the first surface to the second surface; one or more gas outlets in the first side of the opening and one or more gas outlets in the first surface of the plate, wherein the gas outlets are configured such that gas is supplied, via the gas outlets, to a region between the movable stage and the projection system; one or more gas inlets in the second side of the opening, wherein the gas inlets are configured such that gas is extracted from the region between the movable stage and the projection system via the gas inlets; and all of the one or more gas outlets in the first surface of the plate are positioned and configured such that, for each of the one or more gas outlets, a line that is both orthogonal to the first surface and intersects the gas outlet does not intersect the patterning device at any point during the entire range of movement of the patterning device. Advantageously, the overlay errors are lower than that achieved with known techniques.

公开(公告)号：WO2018215140A1

公开(公告)日：2018-11-29

申请号：PCT/EP2018/059830

申请日：2018-04-18

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DAMME, Jean-Philippe, Xavier ,  VAN BOKHOVEN, Laurentius, Johannes, Adrianus ,  VAN GILS, Petrus, Franciscus ,  PIETERSE, Gerben

IPC: G03F7/20

Abstract: The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.

公开(公告)号：WO2021047911A1

公开(公告)日：2021-03-18

申请号：PCT/EP2020/073867

申请日：2020-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： POLET, Theodorus, Wilhelmus ,  STEFFENS, Koen ,  VAN DER HAM, Ronald ,  PIETERSE, Gerben ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  FAHRNI, Francis

IPC: G03F7/20

Abstract: A fluid handling system for wetting a region of a surface of a substrate irradiated by a radiation beam. The fluid handling system comprises a first device (112) configured to confine a first liquid to a first space (111) between at least a part of the first device and the surface of the substrate. The first device comprising an aperture (10) formed therein for the passage therethrough of the radiation beam (B) to irradiate the region by passing through the first liquid. The first device comprising at least one first liquid supply member (20, 23, 34) configured to provide the first liquid to the first space and at least one extraction member (32) configured to remove liquid from the first space. The fluid handling system further comprises a second device (200) comprising at least one second liquid supply member (201) configured to provide a second liquid to a second space (211) between at least a part of the second device and the surface of the substrate, wherein there is a gap (g) on the surface of the substrate between the second liquid and the first liquid. The fluid handling system is configured to provide the second liquid to the second space without removing any liquid from the second space to form a liquid layer over at least the region, and is configured to provide the first liquid and the second liquid on the surface of the substrate simultaneously.

公开(公告)号：WO2017054987A1

公开(公告)日：2017-04-06

申请号：PCT/EP2016/069794

申请日：2016-08-22

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DEN NIEUWELAAR, Norbertus, Josephus, Martinus ,  BLANCO CARBALLO, Victor, Manuel ,  MATTAAR, Thomas, Augustus ,  MELMAN, Johannes, Cornelis, Paulus ,  PIETERSE, Gerben ,  VAN DE VEN, Johannes, Theodorus, Guillielmus, Maria ,  VAN DE VEN, Jan-Piet ,  VAN GILS, Petrus, Franciscus

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70725

Abstract: A route for a substrate support that supports a substrate in an immersion lithographic apparatus is calculated to satisfy the following constraints: after the edge of the substrate first contacts the immersion space, the substrate remains in contact with the immersion space until all target portions are exposed; exposures of target portions are performed whilst the substrate moves in a scan direction; and all movements of the substrate between exposures are, in a plane parallel to its upper surface, either curved or only in one of the scan directions or transverse directions. In order to reduce exposure defects at the edges of the substrate it is avoided to expose the immersion liquid to the ouside of the substrate (W) to be exposed. The transfer routes (R51) are designed to overly the wafer surface.

Abstract translation: 计算用于在浸没式光刻设备中支撑衬底的衬底支撑件的路线，以满足以下限制：在衬底的边缘首先接触浸没空间之后，衬底保持与浸没空间接触，直到所有目标部分暴露 ; 在基板沿扫描方向移动的同时执行目标部分的曝光; 并且在曝光之间的基板的所有运动在平行于其上表面的平面中弯曲或仅在扫描方向或横向之一上。 为了减少基板边缘处的曝光缺陷，避免将浸没液体暴露于待暴露的基板（W）的外侧。 传输路由（R51）被设计为过度的晶片表面。

公开(公告)号：WO2016000903A1

公开(公告)日：2016-01-07

申请号：PCT/EP2015/062525

申请日：2015-06-04

Applicant: ASML NETHERLANDS B.V.

Inventor： PIETERSE, Gerben ,  POLET, Theodorus, Wilhelmus ,  BASELMANS, Johannes, Jacobus, Matheus ,  BOUMAN, Willem, Jan ,  MODDERMAN, Theodorus, Marinus ,  ROPS, Cornelius, Maria ,  SMEETS, Bart ,  STEFFENS, Koen ,  VAN DER HAM, Ronald

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70341

Abstract: An immersion lithographic apparatus comprising: a projection system for projecting a patterned radiation beam through an optically active part of a final lens element of the projection system towards a substrate supported by a substrate table, the final lens element having an exposed bottom surface; a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between the final lens element of the projection system and a surface formed of at least one of the substrate and substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and the optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly with respect to an optical axis of the projection system at least to an edge of the exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.

Abstract translation: 一种浸没式光刻设备，包括：投影系统，用于将图案化的辐射束通过投影系统的最终透镜元件的光学活性部分朝向由衬底台支撑的衬底投射，最终透镜元件具有暴露的底表面; 液体限制结构，被配置为将浸没液体供应并限制在投影系统的最终透镜元件与由至少一个基板和基板台形成的表面之间的浸没空间中; 以及在所述投影系统和所述液体限制结构之间的通道形成器以及所述通道形成器和所述最终透镜元件的光学活性部分之间的通道，所述通道经由具有所述浸没空间的开口与所述浸没空间液体连通并且径向延伸 至少相对于最终透镜元件的暴露的底部表面的边缘而相对于投影系统的光轴向外侧并且被构造和构造使得在使用中通过毛细管作用从浸没空间填充液体。

公开(公告)号：WO2016000883A1

公开(公告)日：2016-01-07

申请号：PCT/EP2015/062055

申请日：2015-06-01

Applicant: ASML NETHERLANDS B.V.

Inventor： GATTOBIGIO, Giovanni, Luca ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  OLIESLAGERS, Ruud ,  PIETERSE, Gerben ,  ROPS, Cornelius, Maria ,  VAN BOKHOVEN, Laurentius, Johannes, Adrianus

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70341 ,  G03F7/709

Abstract: A lithographic apparatus comprising a projection system for projecting a patterned radiation beam onto a substrate and a fluid confinement structure configured to confine immersion fluid in a localized region between a final element of the projection system and a surface of the substrate. The lithographic apparatus is configured to have a space bounded on one side by a surface of at least one of the projection system and a component of the lithographic apparatus at least partially surrounding the final element of the projection system and on the other side by a surface of the fluid confinement structure. The apparatus is configured to maximize the humidity of the gas within the space.

Abstract translation: 一种光刻设备，包括用于将图案化的辐射束投影到衬底上的投影系统和被配置为将浸没流体限制在投影系统的最终元件与衬底的表面之间的局部区域中的流体限制结构。 光刻设备被配置为具有在一侧的边界，所述空间由至少一个投影系统和光刻设备的部件的表面至少部分地围绕投影系统的最终元件，另一侧由表面 的流体限制结构。 该装置被配置为使空间内的气体的湿度最大化。

公开(公告)号：WO2015193036A1

公开(公告)日：2015-12-23

申请号：PCT/EP2015/060427

申请日：2015-05-12

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN BEUZEKOM, Aart, Adrianus ,  ALBERTI, Jozef, Augustinus, Maria ,  SEGERS, Hubert, Marie ,  VAN DER HAM, Ronald ,  FAHRNI, Francis ,  OLIESLAGERS, Ruud ,  PIETERSE, Gerben ,  ROPS, Cornelius, Maria ,  VAN DEN EIJNDEN, Pepijn ,  VAN DONGEN, Paul ,  WILLEMS, Bas

IPC: G03F7/20

CPC classification number: G03F7/7075 ,  G03F7/70341 ,  G03F7/70991

Abstract: A lithographic apparatus comprises a substrate table, post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is for handling the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a wafer handler.

Abstract translation: 光刻设备包括基板台，曝光后处理模块，基板处理机器人和干燥台。 衬底台被配置为支撑用于曝光过程的衬底。 后曝光处理模块用于处理基板曝光后。 衬底处理机器人被配置为沿着衬底卸载路径将衬底从衬底台转移到后曝光处理模块中。 干燥站构造成主动地从基板的表面移除液体。 干燥站位于基板卸载路径中。 干燥站位于曝光后处理模块中。 后曝光处理模块可以是晶片处理器。

公开(公告)号：WO2013178438A1

公开(公告)日：2013-12-05

申请号：PCT/EP2013/059437

申请日：2013-05-07

Applicant: ASML NETHERLANDS B.V.

Inventor： LAURENT, Thibault ,  BLOKS, Ruud ,  CORTIE, Rogier ,  HOUBEN, Martijn ,  JACOBS, Johannes ,  LAFARRE, Raymond ,  LEMPENS, Han ,  OVERKAMP, Jim ,  PIETERSE, Gerben ,  POLET, Theodorus ,  SIMONS, Wilhelmus ,  STEFFENS, Koen ,  TROMP, Siegfried ,  VY, Van Vuong

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

Abstract: An object table (WT) to support an object (W), the object table having a support body (100), an object holder (30) to hold an object, an opening (5) adjacent an edge of the object holder, and a channel (16) in fluid communication with the opening via a passageway (14), wherein the channel is defined by a first material which is different to a second material defining the passageway.

Abstract translation: 用于支撑物体（W）的物体台（WT），所述物体台具有支撑体（100），用于保持物体的物体保持器（30），与所述物体保持器的边缘相邻的开口（5），以及 经由通道（14）与所述开口流体连通的通道（16），其中所述通道由与限定所述通道的第二材料不同的第一材料限定。