公开(公告)号：WO2022223220A1

公开(公告)日：2022-10-27

申请号：PCT/EP2022/057476

申请日：2022-03-22

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE MEERENDONK, Remco ,  DIRECKS, Daniel, Jozef, Maria ,  NAKIBOGLU, Günes ,  WATERSON, Nicholas, Peter ,  KLUGKIST, Joost, André ,  PEKELDER, Sven ,  VAN DER NET, Antonius, Johannus ,  JACOBS, Johannes, Henricus, Wilhelmus ,  OUDES, Jaap ,  JANSSEN, Gerardus, Arnoldus, Hendricus, Franciscus ,  VAN LIPZIG, Jeroen, Peterus, Johannes ,  VAN SANTVOORT, Johannes, Franciscus, Martinus

IPC: G03F7/20 ,  H01L21/67

Abstract: The invention provides a temperature conditioning system using conditioning liquid to condition a temperature of an object, comprising a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.

公开(公告)号：WO2018234061A1

公开(公告)日：2018-12-27

申请号：PCT/EP2018/065113

申请日：2018-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： PATEL, Hrishikesh ,  MA, Yue ,  NAKIBOGLU, Günes ,  RIJPMA, Albert, Pieter ,  VAN DER NET, Antonius, Johannus ,  VERHEES, Rens, Henricus ,  YANG, Zongquan

IPC: G03F7/20 ,  H05G2/00

Abstract: A radiation source (SO) comprising: • a fuel supply device (3) configured to supply fuel; • an excitation device (1) configured to excite the fuel into a plasma (7); • a collector (5) configured to collect radiation emitted by the plasma and to direct the radiation to a beam exit; • a debris mitigation system (20) configured to collect debris generated by the plasma, the debris mitigation system having a component (3, 9B, 21, 22, 23, 24, 27, 28, 29) having a conduit (301) passing therethrough; and • a temperature control system (300) configured to selectively increase or decrease the temperature of the component by selectively heating or cooling a thermal transfer fluid circulating through the conduit.

公开(公告)号：WO2022100955A1

公开(公告)日：2022-05-19

申请号：PCT/EP2021/078531

申请日：2021-10-14

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER NET, Antonius, Johannus ,  VERHAGEN, Martinus, Cornelis, Maria ,  JACOBS, Johannes, Henricus, Wilhelmus ,  VAN BOKHOVEN, Laurentius, Johannes, Adrianus ,  VAN LIPZIG, Jeroen, Peterus, Johannes

IPC: G03F7/20 ,  G02B7/18

Abstract: There is provided a conditioning system for a lithographic apparatus, said conditioning system being configured to condition one or more optical elements of the lithographic apparatus, wherein the conditioning system is configured to have a sub-atmospheric pressure at the one or more optical elements. Also provided are a lithographic apparatus comprising such a conditioning system, the use of such a conditioning system, a method of conditioning a system, as well as a lithographic method comprising a sub-atmospheric pressure cooling system