公开(公告)号：WO2022223220A1

公开(公告)日：2022-10-27

申请号：PCT/EP2022/057476

申请日：2022-03-22

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE MEERENDONK, Remco ,  DIRECKS, Daniel, Jozef, Maria ,  NAKIBOGLU, Günes ,  WATERSON, Nicholas, Peter ,  KLUGKIST, Joost, André ,  PEKELDER, Sven ,  VAN DER NET, Antonius, Johannus ,  JACOBS, Johannes, Henricus, Wilhelmus ,  OUDES, Jaap ,  JANSSEN, Gerardus, Arnoldus, Hendricus, Franciscus ,  VAN LIPZIG, Jeroen, Peterus, Johannes ,  VAN SANTVOORT, Johannes, Franciscus, Martinus

IPC: G03F7/20 ,  H01L21/67

Abstract: The invention provides a temperature conditioning system using conditioning liquid to condition a temperature of an object, comprising a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.

公开(公告)号：WO2011036248A1

公开(公告)日：2011-03-31

申请号：PCT/EP2010/064140

申请日：2010-09-24

Applicant: ASML NETHERLANDS B.V. ,  LOOPSTRA, Erik ,  BANINE, Vadim ,  SWINKELS, Gerardus ,  PEKELDER, Sven ,  LABETSKI, Dzmitry ,  STAMM, Uwe ,  CYMER, INC. ,  PARTLO, William N.

Inventor： LOOPSTRA, Erik ,  BANINE, Vadim ,  SWINKELS, Gerardus ,  PEKELDER, Sven ,  LABETSKI, Dzmitry ,  STAMM, Uwe ,  PARTLO, William N.

IPC: G03F7/20 ,  C01B3/50 ,  G21K1/06

CPC classification number: G03F7/70933 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70808 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70925 ,  H05G2/003 ,  H05G2/005

Abstract: An EUV lithographic apparatus (100) comprises a source collector apparatus (SO) in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma (210) emitting the radiation. The source collector apparatus (SO) includes a chamber (310) in fluid communication with a guide way (320) external to the chamber (310). A pump (BPS) for circulating buffer gas is part of the guide way (320), and provides a closed loop buffer gas flow (222). The gas flowing through the guide way (302) traverses a gas decomposer (TD1) wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path (222).

Abstract translation: EUV光刻设备（100）包括源极收集器（SO），其中通过激发燃料产生极紫外辐射以提供发射辐射的等离子体（210）。 源收集器装置（SO）包括与室（310）外部的引导方式（320）流体连通的室（310）。 用于循环缓冲气体的泵（BPS）是引导方式（320）的一部分，并且提供闭环缓冲气体流（222）。 流过引导方式（302）的气体穿过其中分解燃料和缓冲气体材料的化合物的气体分解器（TD1），使得分解的缓冲气体材料可以反馈回闭环流动路径（222）。