公开(公告)号：WO2023088646A1

公开(公告)日：2023-05-25

申请号：PCT/EP2022/079861

申请日：2022-10-26

Applicant: ASML NETHERLANDS B.V.

Inventor： JACOBS, Johannes, Henricus, Wilhelmus ,  DIRECKS, Daniel, Jozef, Maria ,  VAN DRENT, William, Peter

IPC: H05G2/00

Abstract: The present invention relates to a valve system for an apparatus for supplying a target material to a radiation source, said target material having a melting temperature above room temperature and being at a pressure of at least 200 bar, wherein the valve system comprises: - a chamber having a circular cross-section, - a circular shaped valve body arranged in the chamber and matching the circular cross-section of the chamber, wherein the chamber comprises a first port and a second port, wherein the valve body is rotatable in a plane parallel to a plane of the circular cross-section about a rotation axis between an open position in which a channel in the valve body provides a flow path between the first and the second port, and a closed position in which the channel in the valve body is disconnected from at least the first port.

公开(公告)号：WO2023089080A1

公开(公告)日：2023-05-25

申请号：PCT/EP2022/082373

申请日：2022-11-18

Applicant: ASML NETHERLANDS B.V.

Inventor： DIRECKS, Daniel, Jozef, Maria ,  VAN DRENT, William, Peter ,  VERHAGEN, Martinus, Cornelis, Maria ,  DRIESSEN, Theodorus, Wilhelmus ,  HEEZIUS, Marcel, Johannes, Theodorus ,  WESTERLAKEN, Jan, Steven, Christiaan ,  JACOBS, Johannes, Henricus, Wilhelmus ,  DERKS, Sander, Catharina, Reinier ,  SAMS, Benjamin, Andrew ,  TREES, Dietmar, Uwe, Herbert ,  WILLEMS, Petrus, Adrianus

IPC: H05G2/00

Abstract: The present invention relates to an apparatus for supplying a liquid target material to a radiation source, comprising a reservoir system including a reservoir configured to be connected to an ejection system and a pressurizing system to pressurize liquid target material in the reservoir, wherein the pressurizing system comprises a device configured to transfer pressure to the liquid target material, wherein the pressurizing system is configured to apply a pressure of at least 700 bar. The invention also relates to a fuel emitter, radiation source, lithographic apparatus and liquid target material supplying method.

公开(公告)号：WO2022223220A1

公开(公告)日：2022-10-27

申请号：PCT/EP2022/057476

申请日：2022-03-22

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE MEERENDONK, Remco ,  DIRECKS, Daniel, Jozef, Maria ,  NAKIBOGLU, Günes ,  WATERSON, Nicholas, Peter ,  KLUGKIST, Joost, André ,  PEKELDER, Sven ,  VAN DER NET, Antonius, Johannus ,  JACOBS, Johannes, Henricus, Wilhelmus ,  OUDES, Jaap ,  JANSSEN, Gerardus, Arnoldus, Hendricus, Franciscus ,  VAN LIPZIG, Jeroen, Peterus, Johannes ,  VAN SANTVOORT, Johannes, Franciscus, Martinus

IPC: G03F7/20 ,  H01L21/67

Abstract: The invention provides a temperature conditioning system using conditioning liquid to condition a temperature of an object, comprising a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.

公开(公告)号：WO2023089082A1

公开(公告)日：2023-05-25

申请号：PCT/EP2022/082376

申请日：2022-11-18

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE VEN, Bastiaan, Lambertus, Wilhelmus, Marinus ,  VAN DRENT, William, Peter ,  REUVERS, Nicolaas, Johannes, Wilhelmus ,  BUIS, Edwin, Johan ,  DIRECKS, Daniel, Jozef, Maria ,  FEIJTS, Maurice, Wilhelmus, Leonardus, Hendricus ,  JACOBS, Johannes, Henricus, Wilhelmus ,  KNAPEN, Bart, Leonardus ,  WESTERLAKEN, Jan, Steven, Christiaan

IPC: H05G2/00

Abstract: The present invention relates to an apparatus for supplying a liquid target material to a radiation source, comprising a first reservoir, a pressurizing system configured to pressurize a hydraulic fluid, and a separating device configured to separate the hydraulic fluid from the liquid target material in the first reservoir and to transfer a pressure from the hydraulic fluid to the liquid target material. The invention also relates to an associated method of supplying liquid target material to a radiation source.

公开(公告)号：WO2020212019A1

公开(公告)日：2020-10-22

申请号：PCT/EP2020/056344

申请日：2020-03-10

Applicant: ASML NETHERLANDS B.V.

Inventor： DERKS, Sander, Catharina, Reinier ,  DIRECKS, Daniel, Jozef, Maria ,  FEIJTS, Maurice, Wilhelmus, Leonardus, Hendricus ,  HOEIJMAKERS, Pieter, Gerardus, Mathijs ,  MOORS, Katja, Cornelia, Joanna, Clasina ,  NAVARRO PAREDES, Violeta ,  VAN DRENT, William, Peter ,  WESTERLAKEN, Jan, Steven, Christiaan

IPC: H05G2/00

Abstract: A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m -1 K -1 .