公开(公告)号：WO2020173654A1

公开(公告)日：2020-09-03

申请号：PCT/EP2020/052261

申请日：2020-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, ChangAn ,  WANG, Alvin, Jianjiang ,  LIANG, Jiao ,  WANG, Jen-Shiang ,  FENG, Mu

IPC: G03F1/36 ,  G03F7/20 ,  G03F9/00 ,  G03F1/00 ,  G06T7/00 ,  G06T5/50

Abstract: Described herein is a method for determining measurement data of a printed pattern on a substrate. The method involves obtaining (i) raw images (402) of the substrate comprising a printed pattern corresponding to a reference pattern (401), (ii) an averaged image (403) of the raw images, and (iii) a composite contour (404) based on the averaged image. Further, the composite contour is aligned with respect to a reference contour of the reference pattern and raw contours (415) are extracted from raw images based on both the aligned composite contour and the output of die-to-database alignment of the composite contour (419). Further, the method determines a plurality of pattern measurements (425) based on the raw contours and the measurement data corresponding to the printed patterns based on the plurality of the pattern measurements. Further, the method determines a plurality of process variation such as stochastic variation, inter-die variation, intra-die variation and total variation.