公开(公告)号：WO2020234043A1

公开(公告)日：2020-11-26

申请号：PCT/EP2020/063164

申请日：2020-05-12

Applicant: ASML NETHERLANDS B.V.

Inventor： MOORS, Johannes, Hubertus, Josephina ,  BANINE, Vadim, Yevgenyevich ,  NIKIPELOV, Andrey ,  VAN DE KERKHOF, Marcus, Adrianus ,  YAGHOOBI, Parham

IPC: G02B5/09 ,  G02B5/18 ,  G03F7/20 ,  G21K1/06

Abstract: A mirror comprises a body and a surface defined by the body. The body comprises a plurality of layers. The plurality of layers are arranged to act as a multilayer Bragg reflector for radiation having a first wavelength when radiation having said first wavelength is incident on the surface. A local tangent plane of the surface is inclined at a non-zero angle relative to a local tangent plane of the plurality of layers.

公开(公告)号：WO2019170503A1

公开(公告)日：2019-09-12

申请号：PCT/EP2019/054924

申请日：2019-02-28

Applicant: ASML NETHERLANDS B.V.

Inventor： MA, Yue ,  KEMPEN, Antonius, Theodorus, Wilhelmus ,  HUMMLER, Klaus, Martin ,  MOORS, Johannes, Hubertus, Josephina ,  ROMMERS, Jeroen, Hubert ,  VAN DE WIEL, Hubertus, Johannes ,  LAFORGE, Andrew, David ,  BRIZUELA, Fernando ,  WIEGGERS, Rob, Carlo ,  GOMES, Umesh, Prasad ,  NEDANOVSKA, Elena ,  KORKMAZ, Celal ,  KIM, Alexander, Downn ,  DUARTE RODRIGUES NUNES, Rui, Miguel ,  VAN DIJCK, Hendrikus, Alphonsus, Ludovicus ,  VAN DRENT, William, Peter ,  JONKERS, Peter, Gerardus ,  ZHU, Qiushi ,  YAGHOOBI, Parham ,  WESTERLAKEN, Jan, Steven, Christiaan ,  LEENDERS, Martinus, Hendrikus, Antonius ,  ERSHOV, Alexander, Igorevich ,  FOMENKOV, Igor, Vladimirovich ,  LIU, Fei ,  JACOBS, Johannes, Henricus, Wilhelmus ,  KUZNETSOV, Alexey, Sergeevich

IPC: G03F7/20 ,  G02B5/08 ,  G21K1/06 ,  H05G2/00 ,  G02B1/14

Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber (26) containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.

公开(公告)号：WO2022042993A1

公开(公告)日：2022-03-03

申请号：PCT/EP2021/071266

申请日：2021-07-29

Applicant: ASML NETHERLANDS B.V.

Inventor： BANINE, Vadim, Yevgenyevich ,  VERMEULEN, Paul, Alexander ,  DE MEIJERE, Cornelis, Adrianus ,  MOORS, Johannes, Hubertus, Josephina ,  NIKIPELOV, Andrey ,  SALMASO, Guido ,  VAN DE KERKHOF, Marcus, Adrianus ,  YAGHOOBI, Parham

IPC: G03F7/20 ,  G03F1/62 ,  G03F1/64

Abstract: An apparatus for reducing a partially oxidized reticle and pellicle assembly comprises: a support; a hydrogen supply; and an electron source. The support is for supporting a reticle and pellicle assembly. The hydrogen supply is operable to supply hydrogen in the vicinity of to a pellicle of a reticle and pellicle assembly when supported by the support. The electron source is operable to direct electrons so as to be incident on a pellicle of a reticle and pellicle assembly when supported by the support.

公开(公告)号：WO2021148224A1

公开(公告)日：2021-07-29

申请号：PCT/EP2020/087889

申请日：2020-12-24

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： ALBRIGHT, Ronald, Peter ,  BAL, Kursat ,  BANINE, Vadim, Yevgenyevich ,  BRULS, Richard, Joseph ,  DE VRIES, Sjoerd, Frans ,  FRIJNS, Olav, Waldemar, Vladimir ,  HUANG, Yang-Shan ,  HUANG, Zhuangxiong ,  JACOBS, Johannes, Henricus, Wilhelmus ,  MOORS, Johannes, Hubertus, Josephina ,  NENCHEV, Georgi, Nenchev ,  NIKIPELOV, Andrey ,  RAASVELD, Thomas, Maarten ,  RANJAN, Manish ,  TE SLIGTE, Edwin ,  UMSTADTER, Karl, Robert ,  UZGÖREN, Eray ,  VAN DE KERKHOF, Marcus, Adrianus ,  YAGHOOBI, Parham

IPC: G03F7/20 ,  H05G2/00 ,  G03F7/70033 ,  G03F7/70058 ,  G03F7/70916 ,  H05G2/008

Abstract: An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.