公开(公告)号：WO2019170503A1

公开(公告)日：2019-09-12

申请号：PCT/EP2019/054924

申请日：2019-02-28

Applicant: ASML NETHERLANDS B.V.

Inventor： MA, Yue ,  KEMPEN, Antonius, Theodorus, Wilhelmus ,  HUMMLER, Klaus, Martin ,  MOORS, Johannes, Hubertus, Josephina ,  ROMMERS, Jeroen, Hubert ,  VAN DE WIEL, Hubertus, Johannes ,  LAFORGE, Andrew, David ,  BRIZUELA, Fernando ,  WIEGGERS, Rob, Carlo ,  GOMES, Umesh, Prasad ,  NEDANOVSKA, Elena ,  KORKMAZ, Celal ,  KIM, Alexander, Downn ,  DUARTE RODRIGUES NUNES, Rui, Miguel ,  VAN DIJCK, Hendrikus, Alphonsus, Ludovicus ,  VAN DRENT, William, Peter ,  JONKERS, Peter, Gerardus ,  ZHU, Qiushi ,  YAGHOOBI, Parham ,  WESTERLAKEN, Jan, Steven, Christiaan ,  LEENDERS, Martinus, Hendrikus, Antonius ,  ERSHOV, Alexander, Igorevich ,  FOMENKOV, Igor, Vladimirovich ,  LIU, Fei ,  JACOBS, Johannes, Henricus, Wilhelmus ,  KUZNETSOV, Alexey, Sergeevich

IPC: G03F7/20 ,  G02B5/08 ,  G21K1/06 ,  H05G2/00 ,  G02B1/14

Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber (26) containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.

公开(公告)号：WO2021008856A1

公开(公告)日：2021-01-21

申请号：PCT/EP2020/067986

申请日：2020-06-26

Applicant: ASML NETHERLANDS B.V.

Inventor： MA, Yue ,  VAN DE KERKHOF, Marcus, Adrianus ,  ZHU, Qiushi ,  HUMMLER, Klaus, Martin ,  MAYER, Peter, Matthew ,  HOFFMANN, Kay ,  LAFORGE, Andrew, David ,  FOMENKOV, Igor, Vladimirovich ,  BROWN, Daniel, John, William

IPC: G03F7/20 ,  G02B5/08 ,  G02B5/20 ,  G03F1/62 ,  G21K1/06

Abstract: Provided is an optical element for a lithographic apparatus. The optical element includes a capping layer that includes oxygen vacancies therein. The oxygen vacancies prevent attack of the capping layer by preventing hydrogen and other species from penetrating the capping layer and underlying layers. The capping layer provides a low hydrogen recombination rate enabling hydrogen to clean the surface of the optical element. The capping layer may include an alloyed metal, a mixed metal oxide or a doped metal oxide and it may be a ruthenium capping layer that includes one or more dopants therein.