公开(公告)号：WO2021110317A2

公开(公告)日：2021-06-10

申请号：PCT/EP2020/079455

申请日：2020-10-20

Applicant: ASML NETHERLANDS B.V.

Inventor： LIU, Fei ,  HUANG, Zhuangxiong ,  XIA, Han ,  GOMES, Umesh, Prasad ,  URBANSKI, Lukasz ,  FOMENKOV, Igor, Vladimirovich ,  TAO, Yin

IPC: H01S3/036 ,  H01S3/0014 ,  H01S3/134 ,  H01S3/2232

Abstract: A power amplifier includes a gas laser chamber, a gas laser power source, a catalyst chamber, a feedback apparatus, and a processor. The gas laser chamber is configured to house a flowing gas mixture. The gas laser power source is coupled to the gas laser chamber and is configured to supply energy to the flowing gas mixture to output a laser beam. The catalyst chamber is coupled to the gas laser chamber and includes a catalyst configured to reoxidize dissociated molecules in the flowing gas mixture. The feedback apparatus is coupled to the gas laser chamber and/or the laser beam and is configured to measure a characteristic of the power amplifier. The processor is coupled to the catalyst chamber and the feedback apparatus. The processor is configured to adjust exposure of the flowing gas mixture to the catalyst in the catalyst chamber based on the measured characteristic.

公开(公告)号：WO2022022949A1

公开(公告)日：2022-02-03

申请号：PCT/EP2021/068589

申请日：2021-07-06

Applicant: ASML NETHERLANDS B.V.

Inventor： LIU, Fei ,  LIAN, Jin ,  HUANG, Zhuangxiong ,  DE WINTER, Laurentius, Cornelius ,  STAALS, Frank

IPC: G03F7/20 ,  G03F9/00 ,  G03F1/44

Abstract: Disclosed is a method for focus measurement of a lithographic process. The method comprises receiving a substrate on which a metrology pattern has been printed with a lithographic apparatus with an illumination pupil, illuminating the metrology pattern with a metrology tool to measure a signal based on radiation scattered by the metrology pattern, and determining or monitoring a focus of the lithographic process based on the measured signal. Position of at least part of the metrology pattern is focus dependent. At least part of the metrology pattern has been printed by the lithography apparatus with an angular asymmetric illumination pupil.

公开(公告)号：WO2021074042A1

公开(公告)日：2021-04-22

申请号：PCT/EP2020/078517

申请日：2020-10-09

Applicant: ASML NETHERLANDS B.V.

Inventor： LIU, Fei ,  HUANG, Zhuangxiong ,  DAVYDOVA, Natalia, Viktorovna ,  FOMENKOV, Igor, Vladimirovich ,  KREUWEL, Hermanus ,  HAVERMANS, Peter

IPC: G03F7/20

Abstract: A lithographic apparatus and device manufacturing method in which an amount of out-of-band radiation from an EUV radiation source such as DUV radiation which reaches a substrate is taken into account in a dose controller to provide dose control based on actual effective dose and so to provide better control of the effects of the out-of-band radiation, for example, on resists and imaging, in particular, on the effects on imaging performance due to variations in wavelength-dependent sensitivity of resist depending on the type of resist.

公开(公告)号：WO2020160929A1

公开(公告)日：2020-08-13

申请号：PCT/EP2020/051709

申请日：2020-01-24

Applicant: ASML NETHERLANDS B.V.

Inventor： AUSSEMS, Damien, Uriël, Boaz ,  HUANG, Zhuangxiong ,  O'GORMAN, Colm ,  GOOSSENS, Tim, Cornelis ,  HAVERMANS, Peter ,  OESTERHOLT, Rene ,  LIU, Fei

IPC: H05G2/00 ,  G21K1/10 ,  G03F7/20

Abstract: A radiation system comprises a radiation source (SO) and a plasma generator (16). The radiation source comprises: a housing (9) provided with an exit aperture (8); and a radiation generator operable to generate output radiation in the housing and to direct at least a portion of the output radiation through the exit aperture. The plasma generator is operable to produce a plasma (18) which extends at least partially across the at least a portion of the output radiation directed through the exit aperture.

公开(公告)号：WO2019170503A1

公开(公告)日：2019-09-12

申请号：PCT/EP2019/054924

申请日：2019-02-28

Applicant: ASML NETHERLANDS B.V.

Inventor： MA, Yue ,  KEMPEN, Antonius, Theodorus, Wilhelmus ,  HUMMLER, Klaus, Martin ,  MOORS, Johannes, Hubertus, Josephina ,  ROMMERS, Jeroen, Hubert ,  VAN DE WIEL, Hubertus, Johannes ,  LAFORGE, Andrew, David ,  BRIZUELA, Fernando ,  WIEGGERS, Rob, Carlo ,  GOMES, Umesh, Prasad ,  NEDANOVSKA, Elena ,  KORKMAZ, Celal ,  KIM, Alexander, Downn ,  DUARTE RODRIGUES NUNES, Rui, Miguel ,  VAN DIJCK, Hendrikus, Alphonsus, Ludovicus ,  VAN DRENT, William, Peter ,  JONKERS, Peter, Gerardus ,  ZHU, Qiushi ,  YAGHOOBI, Parham ,  WESTERLAKEN, Jan, Steven, Christiaan ,  LEENDERS, Martinus, Hendrikus, Antonius ,  ERSHOV, Alexander, Igorevich ,  FOMENKOV, Igor, Vladimirovich ,  LIU, Fei ,  JACOBS, Johannes, Henricus, Wilhelmus ,  KUZNETSOV, Alexey, Sergeevich

IPC: G03F7/20 ,  G02B5/08 ,  G21K1/06 ,  H05G2/00 ,  G02B1/14

Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber (26) containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.