公开(公告)号：WO2020078721A1

公开(公告)日：2020-04-23

申请号：PCT/EP2019/076667

申请日：2019-10-02

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN ZWOL, Pieter-Jan ,  BALTUSSEN, Sander ,  DE GRAAF, Dennis ,  FRANKEN, Johannes, Christiaan, Leonardus ,  GIESBERS, Adrianus, Johannes, Maria ,  KLEIN, Alexander, Ludwig ,  KLOOTWIJK, Johan, Hendrik ,  KNAPEN, Peter, Simon, Antonius ,  KURGANOVA, Evgenia ,  KUZNETSOV, Alexey, Sergeevich ,  NOTENBOOM, Arnoud, Willem ,  VALEFI, Mahdiar ,  VAN DE KERKHOF, Marcus, Adrianus ,  VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes ,  VAN DER WOORD, Ties, Wouter ,  WONDERGEM, Hendrikus, Jan ,  ZDRAVKOV, Aleksandar, Nikolov

IPC: G03F1/00 ,  G03F1/62 ,  G03F1/64 ,  G03F7/20

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising: at least one membrane layer supported by a planar substrate, wherein the planar substrate comprises an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate, wherein the step of selectively removing the inner region of the planar substrate comprises using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer; such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border comprising the border region of the planar substrate and the first sacrificial layer situated between the border and the membrane layer.

公开(公告)号：WO2021104791A1

公开(公告)日：2021-06-03

申请号：PCT/EP2020/080408

申请日：2020-10-29

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN HAL, Paulus, Albertus ,  MILLO, Diego ,  ZDRAVKOV, Aleksandar, Nikolov ,  VAN DE KERKHOF, Marcus, Adrianus

IPC: G03F7/20 ,  H01L21/687

Abstract: The present invention relates to methods for improving the resistance of lithography substrate holders to corrosion. The present invention also relates to systems comprising lithography substrate holders with improved corrosion resistance, and to methods of fabricating devices, e.g. integrated circuits, using such systems. The present invention also relates to substrates with backsides configured to preferentially corrode when used in lithography. The present invention has particular use in connection with lithographic apparatus for fabricating devices, for example integrated circuits.

公开(公告)号：WO2017097502A1

公开(公告)日：2017-06-15

申请号：PCT/EP2016/076352

申请日：2016-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN SOMMEREN, Daan, Daniel, Johannes, Antonius ,  BALTIS, Coen, Hubertus, Matheus ,  BUDDENBERG, Harold, Sebastiaan ,  GATTOBIGIO, Giovanni, Luca ,  MELMAN, Johannes, Cornelis, Paulus ,  NAKIBOGLU, Günes ,  POLET, Theodorus, Wilhelmus ,  STALS, Walter, Theodorus, Matheus ,  VAN DE VIJVER, Yuri, Johannes, Gabriël ,  VAN LIESHOUT, Josephus, Peter ,  VIEYRA SALAS, Jorge, Alberto ,  ZDRAVKOV, Aleksandar, Nikolov

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70716

Abstract: A substrate table (WT) configured to support a substrate (W) for exposure in an immersion lithographic apparatus, the substrate table comprising: a support body (30) having a support surface (31) configured to support the substrate; and a cover ring (130) fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface (60); wherein at least a portion (61) of the upper surface is configured so as to alter the stability of a meniscus (17) of immersion liquid when moving along the upper surface towards the substrate.

Abstract translation: 一种衬底台（WT），其被配置为支撑用于在浸没式光刻设备中曝光的衬底（W），所述衬底台包括：具有支撑表面（31）的支撑体（30），所述支撑体（30） 支撑基材; 以及盖环（130），其相对于所述支撑体固定并且构造成在平面图中包围支撑在所述支撑表面上的所述基板，其中所述盖环具有上表面（60）; 其中所述上表面的至少一部分（61）被构造成当沿着所述上表面朝向所述衬底移动时改变浸没液体的弯液面（17）的稳定性。