公开(公告)号：WO2022207978A1

公开(公告)日：2022-10-06

申请号：PCT/FI2022/050202

申请日：2022-03-29

Applicant: BENEQ OY

Inventor： WESSLIN, Johannes ,  SOININEN, Pekka ,  ANDERSSON, Jonas

IPC: C23C16/455 ,  C30B25/16

Abstract: The invention relates to an atomic layer deposition apparatus having a reaction chamber (1) arranged inside a vacuum chamber and a fixed gas manifold assembly (3) fixedly provided to the atomic layer deposition apparatus and arranged to supply gases from outside the vacuum chamber to the reaction chamber (1). The reaction chamber (1) is a movable reaction chamber (1) which is arranged movable relative to the vacuum chamber and relative to the fixed gas manifold assembly (3). The atomic layer deposition apparatus further comprises a connection arrangement (4) coupling the movable reaction chamber (1) to the fixed gas manifold assembly (3). The connection arrangement (4) comprises a flexible outer flange assembly (5) surrounding the fixed gas manifold assembly (3), and a first connection surface (6) connecting to a second connection surface (11) of the reaction chamber (1).

公开(公告)号：WO2022207976A1

公开(公告)日：2022-10-06

申请号：PCT/FI2022/050200

申请日：2022-03-29

Applicant: BENEQ OY

Inventor： WESSLIN, Johannes ,  SOININEN, Pekka ,  ANDERSSON, Jonas

IPC: C23C16/455 ,  H01L21/677 ,  H01L21/67 ,  C23C16/45544 ,  H01L21/6719 ,  H01L21/67207 ,  H01L21/67739

Abstract: The invention relates to a loading device (100), arrangement, and method for loading a reaction chamber (200) inside a vacuum chamber (10). The loading device (100) comprises a loading platform (110) arranged to support the reaction chamber (200), the loading platform (110) having a first end (115), a second end (116) and a first direction (A), a first loading member (120) provided to the loading platform (110), and a second loading member (122) provided to the loading platform (110), the first loading member (120) being arranged independently movable in relation to the loading platform (110) and the second loading member (122) in the first direction (A), and the second loading member (122) being arranged independently movable in relation to the loading platform (110) and the first loading member (120) in the first direction (A).

公开(公告)号：WO2022207975A1

公开(公告)日：2022-10-06

申请号：PCT/FI2022/050199

申请日：2022-03-29

Applicant: BENEQ OY

Inventor： WESSLIN, Johannes ,  SOININEN, Pekka ,  ANDERSSON, Jonas

IPC: C23C16/455 ,  H01L21/677 ,  H01L21/67

Abstract: The invention relates to a vacuum chamber (20) and an arrangement for atomic layer deposition. The vacuum chamber (20) comprises a loading wall (21) provided with a loading opening (25), a back wall (22) opposite the loading wall (21), and a first direction (A) extending in a direction between the loading wall (21) and the back wall (22). The vacuum chamber (20) further comprises a first vacuum chamber support rail (30) inside the vacuum chamber (20) and extending in the first direction (A), and a second vacuum chamber support rail (32) inside the vacuum chamber (20) and extending in the first direction (A) and arranged spaced apart from the first vacuum chamber support rail (30). The first vacuum chamber support rail (30) is arranged independently movable in vertical direction, and the second vacuum chamber support rail (30) is arranged independently movable in vertical direction.

公开(公告)号：WO2022207977A1

公开(公告)日：2022-10-06

申请号：PCT/FI2022/050201

申请日：2022-03-29

Applicant: BENEQ OY

Inventor： SOININEN, Pekka ,  WESSLIN, Johannes ,  ANDERSSON, Jonas

IPC: C23C16/455 ,  C23C16/44 ,  C30B25/14

Abstract: The invention relates to a gas feeding cup (1) removably provided in a fixed gas manifold structure (2) of an atomic layer deposition apparatus and comprising a cup bottom (10) comprising gas feeding channels (13) extending through the cup bottom (10) from a cup bottom outer surface (11) to a cup bottom inner surface (12) on the other side of the cup bottom (10); and a cup wall (20) surrounding the cup bottom (10) and extending transverse relative to the cup bottom (10) in a direction away from the cup bottom (10) at the inner surface side of the cup bottom (10) such that a gas feeding space (30) is formed by the cup wall (20) and the cup bottom inner surface (12).

公开(公告)号：WO2022207974A1

公开(公告)日：2022-10-06

申请号：PCT/FI2022/050198

申请日：2022-03-29

Applicant: BENEQ OY

Inventor： ANDERSSON, Jonas ,  WESSLIN, Johannes ,  SOININEN, Pekka

IPC: C23C16/455 ,  H01L21/677

Abstract: The invention relates to an atomic layer deposition reactor and to a method for operating a reactor. The reactor (10) comprises a vacuum chamber (20) having a loading wall (21) provided with a loading opening (25), and a reactor door assembly (400) having a reactor door (300). The reactor door assembly (400) is arranged to move the reactor door (300) between a first door position in which the reactor door (300) is against the loading wall (21) and arranged to close the loading opening (25), and a second door position in which the reactor door (300) is spaced apart from and opposite the loading wall (21). The reactor door assembly (400) is further arranged to move the reactor door (300) between the second door position, and a third door position in which the reactor door (300) is aside from the loading opening (25).