公开(公告)号：WO2021202611A1

公开(公告)日：2021-10-07

申请号：PCT/US2021/025002

申请日：2021-03-30

Applicant: APPLIED MATERIALS, INC.

Inventor： WIRTH, Paul, Z. ,  AMIR, Ofer ,  KUCHAR, Michael, C.

IPC: H01L21/67 ,  F16K51/02 ,  F15B21/02 ,  F16K3/0254 ,  F16K31/124 ,  F16K37/0041 ,  H01L21/67017 ,  H01L21/67739

Abstract: Disclosed are a slit valve apparatus and a method for controlling a slit valve. The slit valve apparatus includes a slit valve assembly and a servo-control system in communication with the slit valve assembly. The slit valve assembly includes at least one gate able to transition between an open position and a closed position, at least one pneumatic actuator, at least one proportional pneumatic valve including a plurality of controllers, and a continuous position sensor. The servo-control system includes a centralized controller that generates a control signal and adjusts the movement of the at least one gate based on the position trajectory for the gate, a linear position measurement of the gate from the continuous position sensor, and fluid pressure/flow measurements from the plurality of controllers.

公开(公告)号：WO2022031399A1

公开(公告)日：2022-02-10

申请号：PCT/US2021/040668

申请日：2021-07-07

Applicant: APPLIED MATERIALS, INC.

Inventor： MUSTAFA, Muhannad ,  RASHEED, Muhammad M.

IPC: F16K51/02 ,  F16K31/126 ,  F16K31/04 ,  F16K31/53 ,  F16K27/02 ,  F16K25/00 ,  H01L21/67 ,  F16K31/047 ,  F16K7/16 ,  H01L21/67011 ,  H01L21/67739

Abstract: Embodiments described herein relate to a valve for semiconductor processing. The valve includes a valve body having an inlet conduit and an outlet conduit separated by a diaphragm body. The diaphragm body includes a motor, a transmission link coupled to the motor, a rotatable ring surrounding a fixed plate and separated by a dynamic seal, the rotatable ring coupled to the transmission link, and one or more shutter plates movably coupled to the rotatable ring by a respective pivotable fastener, wherein the fixed plate includes an opening and the one or more shutter plates are movable relative to the opening.

公开(公告)号：WO2022207976A1

公开(公告)日：2022-10-06

申请号：PCT/FI2022/050200

申请日：2022-03-29

Applicant: BENEQ OY

Inventor： WESSLIN, Johannes ,  SOININEN, Pekka ,  ANDERSSON, Jonas

IPC: C23C16/455 ,  H01L21/677 ,  H01L21/67 ,  C23C16/45544 ,  H01L21/6719 ,  H01L21/67207 ,  H01L21/67739

Abstract: The invention relates to a loading device (100), arrangement, and method for loading a reaction chamber (200) inside a vacuum chamber (10). The loading device (100) comprises a loading platform (110) arranged to support the reaction chamber (200), the loading platform (110) having a first end (115), a second end (116) and a first direction (A), a first loading member (120) provided to the loading platform (110), and a second loading member (122) provided to the loading platform (110), the first loading member (120) being arranged independently movable in relation to the loading platform (110) and the second loading member (122) in the first direction (A), and the second loading member (122) being arranged independently movable in relation to the loading platform (110) and the first loading member (120) in the first direction (A).

公开(公告)号：WO2022266269A1

公开(公告)日：2022-12-22

申请号：PCT/US2022/033698

申请日：2022-06-15

Applicant: OWN, Christopher, Su-Yan

Inventor： OWN, Christopher, Su-Yan

IPC: H01J37/20 ,  H01J2237/204 ,  H01J2237/2802 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01L21/67739

Abstract: A charged-particle-beam microscope for imaging a sample, the microscope having a stage to hold a sample and an automated sample feeder to repeatedly and automatically exchange the sample from among a plurality of samples. A charged- particle-beam column is provided to direct a charged-particle-beam onto the sample, the charged-particle-beam column. The column includes a charged-particle-beam source to generate an electron beam and charged-particle-beam optics to converge the charged-particle beam onto the sample. A detector is provided to detect charged particles emanating from the sample to generate image data. A controller executes an artificial intelligence algorithm to analyze the image data.

公开(公告)号：WO2022020331A1

公开(公告)日：2022-01-27

申请号：PCT/US2021/042340

申请日：2021-07-20

Applicant: GLOBALWAFERS CO., LTD. ,  PARK, ShinBae

Inventor： KIM, SangJun

IPC: H01L21/67 ,  H01L21/677 ,  B08B13/00 ,  B08B3/04 ,  B24B37/042 ,  B25J15/0616 ,  B65G47/91 ,  H01L21/02024 ,  H01L21/02052 ,  H01L21/67023 ,  H01L21/67057 ,  H01L21/67219 ,  H01L21/67739 ,  H01L21/67766 ,  H01L21/67778 ,  H01L21/68707

Abstract: A semiconductor wafer processing system for processing a set of semiconductor wafers includes a controller, a transfer robot controlled by the controller, a wet bath for containing a cleaning solution, and a cassette positioned in the wet bath for holding the set of wafers. The transfer robot transfers the wafer from a transfer location to the cassette and the controller controls the transfer robot during the transfer.

公开(公告)号：WO2021257889A1

公开(公告)日：2021-12-23

申请号：PCT/US2021/037913

申请日：2021-06-17

Applicant: APPLIED MATERIALS, INC.

Inventor： HRUZEK, Dean C. ,  MERRY, Nir ,  RADKO, Marek ,  REUTER, Paul B. ,  SANSONI, Steven ,  KOSHTI, Sushant S. ,  MAZZOCCO, John Joseph ,  CHACIN, Juan

IPC: H01L21/67 ,  H01L21/673 ,  H01L21/677 ,  H01L21/67017 ,  H01L21/67098 ,  H01L21/6719 ,  H01L21/67739

Abstract: A substrate processing system includes an equipment front end module (EFEM) coupled to a vacuum-based mainframe, the EFEM including multiple interface openings. The system further includes a batch degas chamber attached to the EFEM at an interface opening of the multiple interface openings. The batch degas chamber includes a housing that is sealed to the interface opening of the EFEM. Within the housing is located a cassette configured to hold multiple substrates. A reactor chamber, attached to the housing, is to receive the cassette and perform an active degas process on the multiple substrates. The active degas process removes moisture and contaminants from surfaces of the multiple substrates. An exhaust line is attached to the reactor chamber to provide an exit for the moisture and contaminants.