公开(公告)号：WO2016092700A9

公开(公告)日：2017-05-04

申请号：PCT/JP2014082986

申请日：2014-12-12

申请人： CANON KK

发明人： FUNABASHI NAOKI

IPC分类号： H01L21/027 ,  H01L21/683

CPC分类号： H01L21/265 ,  G03F7/707 ,  G03F7/70783 ,  H01L21/2633

摘要： The objective of the invention is to provide: a substrate holding apparatus that is advantageous in terms of separating a substrate from a seal member in a short time when the substrate is to be unloaded; and a lithography apparatus. The present invention relates to a substrate holding apparatus 10 that holds a substrate 3. The substrate holding apparatus 10 has: a holding member 16 that includes a center portion 40 having suction holes 32 that are formed for the purpose of evacuating a space 42 between the substrate 3 and the holding member, and an outer peripheral portion 41 which surrounds the center portion 40, and which is formed in a position lower than that of the center portion 40; and a seal member 31 with which the holding member 16 is provided, and which defines the space 42. Holes 33 independent from an evacuating system, which is connected to the suction holes 32, are formed in the outer peripheral portion 41 and/or the sealing member 31.

摘要翻译： 本发明的目的在于提供一种基板保持装置，该基板保持装置在基板卸载时能够在短时间内将基板从密封部件分离的方面有利， 和光刻设备。 基板保持装置10具有保持部件16，该保持部件16具有中央部40，该中央部40具有吸引孔32，该吸引孔32为了排出 基板3和保持部件;外周部41，其包围中央部40，形成在比中央部40低的位置; 以及设置有保持部件16的密封部件31，该密封部件31限定空间42.在外周部41和/或外周部41上形成与抽吸孔32连接的独立于抽空系统的孔33。 密封构件31。