公开(公告)号：WO2014117791A1

公开(公告)日：2014-08-07

申请号：PCT/EP2013/000300

申请日：2013-02-01

Applicant: CARL ZEISS SMT GMBH

Inventor： GRÄUPNER, Paul ,  GRUNER, Toralf

IPC: G03F7/20

CPC classification number: G03F7/70266 ,  G03F7/70891

Abstract: A scanner type microlithographic projection exposure apparatus comprises a wavefront correction device (42; 142) which is arranged between an object plane (28) and an image plane (30), but outside any pupil plane (36, 38), of a projection objective. The wavefront correction device (42) comprises a solid body (44; 144) having an optical surface (46) on which projection light (PL) is incident during operation of the apparatus (10). The device has a plurality of heating paths (52X, 52Y; 152X, 152Y) along which heat can be individually generated. The heating paths are arranged inside a correction volume of the solid body (44; 144), through which volume projection light passes, with a varying non-zero heating path density. The heating path density is, if seen along at least one line parallel to the scan direction (Y), higher in a center (56) of the correction volume than at a margin thereof (58, 60).

Abstract translation: 扫描仪型微光刻投影曝光装置包括布置在物平面（28）和图像平面（30）之间但在投影物镜的任何光瞳平面（36,38）之外的波前校正装置（42; 142） 。 波前校正装置（42）包括具有光学表面（46）的固体（44; 144），投影光（PL）在装置（10）的操作期间入射。 该装置具有多个可以分别产生热量的加热路径（52X，52Y; 152X，152Y）。 加热路径布置在固体（44; 144）的修正体积内，体积投影光通过该体积投影光，具有变化的非零加热路径密度。 如果沿平行于扫描方向（Y）的至少一条线看到加热通道密度，则在校正体积的中心（56）中比在其边缘（58,60）更高。

公开(公告)号：WO2014012912A1

公开(公告)日：2014-01-23

申请号：PCT/EP2013/064963

申请日：2013-07-16

Applicant: CARL ZEISS SMT GMBH

Inventor： ZIMMERMANN, Jörg ,  STÜTZLE, Ralf ,  GRÄUPNER, Paul ,  CONRADI, Olaf

IPC: G03F7/20 ,  G02B26/08

CPC classification number: G03F7/70141 ,  G02B26/0833 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/702

Abstract: Verfahren zum Einstellen eines Beleuchtungssettings in einer Beleuchtungsoptik (4) mit mindestens einer steuerbaren Korrektureinrichtung (23, 27), welche eine Vielzahl von verstellbaren Korrektur-Elementen zur Beeinflussung der Transmission aufweist, wobei das Beleuchtungssetting zur Anpassung eines vorgegebenen Abbildungs-Parameters im Bereich eines Bildfelds (8) variiert wird.

Abstract translation: 一种用于在照明光学系统（4）具有至少一个可控制的校正装置（23，27）调节的照明设置，具有多个可调节的校正元件的用于影响传输，方法，其中，所述照明设置用于在图像场的区域调整的预定的成像参数 （8）是变化的。

公开(公告)号：WO2012041341A1

公开(公告)日：2012-04-05

申请号：PCT/EP2010/005949

申请日：2010-09-30

Applicant: CARL ZEISS SMT GMBH ,  GRÄUPNER, Paul ,  CONRADI, Olaf ,  ZACZEK, Christoph ,  ULRICH, Wilhelm ,  BEIERL, Helmut ,  GRUNER, Toralf ,  GRÄSCHUS, Volker

Inventor： GRÄUPNER, Paul ,  CONRADI, Olaf ,  ZACZEK, Christoph ,  ULRICH, Wilhelm ,  BEIERL, Helmut ,  GRUNER, Toralf ,  GRÄSCHUS, Volker

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70308

Abstract: A projection exposure system comprises an illumination system (ILL) configured to receive primary radiation with operating wavelength λ generated by a primary radiation source (S) and to form the primary radiation to generate illumination radiation incident on a mask (M) providing a prescribed pattern (PAT) and a projection objective (PO) configured to project an image of the pattern arranged in an object surface (OS) of the projection objective onto a radiation-sensitive substrate (W) arranged in an image surface (IS) of the projection objective at an image-side numerical aperture NA. An angle-selective filter arrangement (FA) is arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle- selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function. The filter function comprises a pass band (PB) with relatively high transmittance of intensity of incident radiation for angles of incidence smaller than a cut-off angle of incidence AOI CUT , and a stop band (SB) with relatively low transmittance of intensity of incident radiation for angles of incidence greater than the cut-off angle of incidence AOI CUT . The condition AOI CUT = arcsin (NA * | β | ) holds, with β being a magnification of an image formation between the field surface at or adjacent to the filter plane and the image surface of the projection objective.

Abstract translation: 投影曝光系统包括被配置为接收工作波长λ的初级辐射的照明系统（ILL） 由主辐射源（S）产生并且形成主辐射以产生入射到提供规定图案（PAT）的掩模（M）上的照射辐射和投影物镜（P），投影物镜（PO）被配置为投影布置在 将投影物镜的物体表面（OS）放置在布置在像侧数值孔径NA处的投影物镜的图像表面（IS）中的辐射敏感衬底（W）上。 角度选择性滤光器布置（FA）布置在投影物镜的场表面或靠近物体表面光学下游的投影光束路径中。 角度选择滤波器装置可以根据角度选择滤波器的功能对入射到滤波器装置上的辐射进行滤波。 滤波器功能包括对入射角小于入射角AOICUT的入射辐射强度具有较高透射率的通带（PB），以及入射辐射强度相对较低透射率的阻带（SB） 对于入射角大于截止入射角AOICUT。 条件AOICUT = arcsin（NA * |ß|）成立，其中ß是在滤波器平面处或与滤光片平面相邻的场表面与投影物镜的图像表面之间的图像形成的放大率。