Abstract:
A method of preparing an optical connector located within a gap between a first optical assembly and a second optical assembly is provided. The optical connector includes a contrast layer having at least one cured bridge portion and at least one uncured portion formed from a first composition having a first refractive index (Rl 1 ). The method comprises applying a second composition having a second refractive index (Rl 2 ) on the contrast layer to form a second layer and mixing at least a portion of the second layer with the at least one uncured portion of the contrast layer to form at least one intermixed portion having a third refractive index (Rl 3 ), wherein R| 1 > R| 3 > Rl 2 , and then curing the intermixed portion and optional second layer such that each one of the at least one cured bridge portions is surrounded by an intermixed portion and optional second layer.
Abstract translation:提供了一种制备位于第一光学组件和第二光学组件之间的间隙内的光学连接器的方法。 光学连接器包括具有至少一个固化桥接部分和由具有第一折射率(R11)的第一组合物形成的至少一个未固化部分的对比层。 该方法包括在对比层上施加具有第二折射率(R12)的第二组合物以形成第二层,并将第二层的至少一部分与对比层的至少一个未固化部分混合以形成至少一个 混合部分具有第三折射率(R13),其中R 1> R 3> R 21,然后固化混合部分和任选的第二层,使得至少一个固化桥接部分中的每一个被混合部分包围 和可选的第二层。
Abstract:
A method of preparing an article comprises applying a first composition having a first refractive index Rl 1 on a substrate to form a first layer (14). The method further comprises applying a curing condition to a target portion (18) of the first layer, without applying the curing condition to a non-target portion (16), to form a contrast layer including at least one cured portion and at least one uncured portion. In addition, the method comprises applying a second composition having a second refractive index Rl 2 on the contrast layer to form a second layer, wherein a portion of the second layer and the at least one uncured portion of the contrast layer intermix to form at least one intermixed portion having a third refractive index Rl 3 . Rl 1 , Rl 2 , and Rl 3 are different from one another
Abstract:
An adhesive flexible barrier film comprises a substrate and a barrier layer disposed on the substrate. The barrier layer is formed from a barrier composition comprising an organosilicon compound. The adhesive flexible barrier film also comprises an adhesive layer disposed on the barrier layer and formed from an adhesive composition. A method of forming the adhesive flexible barrier film comprises the steps of disposing the barrier composition on the substrate to form the barrier layer, disposing the adhesive composition on the barrier layer to form the adhesive layer, and curing the barrier layer and the adhesive layer. The adhesive flexible barrier film may be utilized in organic electronic devices.
Abstract:
A flexible barrier film has a thickness of from greater than zero to less than 5,000 nanometers and a water vapor transmission rate of no more than 1 x 10 -2 g/m 2 /day at 22 °C and 47% relative humidity. The flexible barrier film is formed from a composition, which comprises a multi-functional acrylate. The composition further comprises the reaction product of an alkoxy-functional organometallic compound and an alkoxy- functional organosilicon compound. A method of forming the flexible barrier film includes the steps of disposing the composition on a substrate and curing the composition to form the flexible barrier film. The flexible barrier film may be utilized in organic electronic devices.
Abstract translation:柔性阻挡膜的厚度大于零至小于5000纳米,水蒸汽透过率在22℃和47%相对湿度下不超过1×10 -2 g / m 2 /天。 柔性阻隔膜由包含多官能丙烯酸酯的组合物形成。 组合物还包含烷氧基官能的有机金属化合物和烷氧基官能的有机硅化合物的反应产物。 形成柔性阻挡膜的方法包括以下步骤:将组合物设置在基材上并固化组合物以形成柔性阻挡膜。 柔性阻挡膜可用于有机电子器件。
Abstract:
A method for preparing an article includes applying a first composition on a substrate to form a first layer, and applying a curing condition to a target portion without applying the curing condition to a non-target portion of the first layer to form a first contrast layer. A second composition is then applied on the first contrast layer to form a second layer, and a curing condition is applied to a target portion without applying the curing condition to a non-target portion of the second layer and first contrast layer to form a second contrast layer. A third composition can optionally be applied and cured on the second contrast layer to form a third contrast layer having a cured and uncured portion in the same manner. The uncured portions of these contrast layers are then selectively removed to prepare the article.
Abstract:
A sealing dielectric layer is applied between a porous dielectric layer and a metal diffusion barrier layer. The sealing dielectric layer closes the pores on the surface and sidewalls of the porous dielectric layer. This invention allows the use of a thin metal diffusion barrier layer without creating pinholes in the metal diffusion barrier layer. The sealing dielectric layer is a CVD deposited film having the composition Si x C y :H z .