HIGH REFRACTIVE INDEX PHOTORESIST COMPOSITION

    公开(公告)号:WO2023064023A1

    公开(公告)日:2023-04-20

    申请号:PCT/US2022/039032

    申请日:2022-08-01

    Abstract: A composition contains a photocurable resin that has a weight- average molecular weight of 3000-50000 Daltons, a glass transition temperature of at least 100 degrees Celsius and contains the following siloxane units: 50-80 mole-percent (HSiC>3/2), 10 to 30 mole-percent (R*SiC>3/2), 10 to 40 mole-percent (Ar*SiC>3/2), and 20.0 mole-percent or less of Si-OZ content, where mole-percent values are relative to moles of silicon atoms in the photocurable resin, R* is a photocurable group, Ar* in each occurrence is selected from a group of halogen-substituted aryl groups and polyaryl groups; Z in each occurrence is selected from hydrogen and alkyl groups, and subscripts x and y are independently in each occurrence either one or 2.

    DUAL CURE COMPOSITION
    3.
    发明申请

    公开(公告)号:WO2021150364A1

    公开(公告)日:2021-07-29

    申请号:PCT/US2021/012136

    申请日:2021-01-05

    Abstract: A composition containing: (a) a polysiloxane resin, wherein the polysiloxane resin contains the following siloxane units: [R3SiO1/2], [(OZ)qSiO(4-q)/2] and at least one of [(OZ)t REPSiO(3-t)/2] and [(OZ)d RREPSiO(2-d)/2]; where: each R is independently in each occurrence selected from hydrocarbyls, REP is an epoxy functional hydrocarbyl group, subscript q is in each occurrence a number selected from a range of 0-3, subscript t is in each occurrence a number selected from a range of 0-2, and subscript d is in each occurrence a number selected from a range of 0-1 provided that the average concentration of OZ groups is at least 15 mole-percent relative to moles of silicon atoms in the polysiloxane resin; (b) a photo acid generator; (c) a moisture cure catalyst; and (d) optionally, an epoxy functional diluent.

    POSITIVE TONE PHOTOPATTERNABLE SILICONE
    4.
    发明申请

    公开(公告)号:WO2019209395A1

    公开(公告)日:2019-10-31

    申请号:PCT/US2019/016454

    申请日:2019-02-04

    Abstract: A method for producing a patterned silicone layer; said method comprising steps of: (a) depositing on a substrate a composition comprising: (i) a polysiloxane comprising alkenyl groups, (ii) a silane crosslinker comprising silicon-hydrogen bonds, (iii) a hydrosilylation catalyst, and (iv) a photolatent amine generator, to form an uncured resin; (b) exposing the uncured resin to ultraviolet light or electron beam irradiation through a mask to produce a patterned resin; (c) heating the patterned resin; and (e) removing at least a part of the uncured portion of the patterned resin to produce a final patterned silicone layer.

    METHOD OF PREPARING FILM AND COMPOSITION THEREFOR

    公开(公告)号:WO2022132906A1

    公开(公告)日:2022-06-23

    申请号:PCT/US2021/063527

    申请日:2021-12-15

    Inventor: FU, Peng-Fei

    Abstract: A method of preparing a film comprises applying a composition on a substrate to give an uncured layer. The method further comprises irradiating the uncured layer to give the film. The composition comprises: (a) a polysiloxane resin, (b) a photoinitiator, and optionally (c) a functional diluent. The (a) polysiloxane resin includes acryloxy functionality and average concentration of OZ groups of at least 12 mole-percent relative to moles of silicon atoms in the (a) polysiloxane resin, where Z is independently H or an alkyl group.

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