公开(公告)号：WO2023081106A1

公开(公告)日：2023-05-11

申请号：PCT/US2022/048466

申请日：2022-10-31

Applicant: LAM RESEARCH CORPORATION

Inventor： CMELAK, Bryan Anthony ,  HIESTER, Jacob L. ,  BERTSCH, Kevin ,  SONTI, Sreeram

IPC: H01L21/687 ,  C23C16/458

Abstract: A hard stop for a substrate processing system includes: a first portion including: bosses configured to extend into first apertures in a lower bellows of a pin actuator; second apertures extending through the bosses, respectively, and the first portion; and a second portion including: a first end that is connected to the first portion; and a second end configured to contact a bracket of the pin actuator, the bracket configured to mount the pin actuator to a substrate processing chamber.

公开(公告)号：WO2023022877A1

公开(公告)日：2023-02-23

申请号：PCT/US2022/039100

申请日：2022-08-02

Applicant: LAM RESEARCH CORPORATION

Inventor： HIESTER, Jacob L. ,  BLANK, Richard

IPC: G01B7/14 ,  H01L21/67 ,  C23C16/455 ,  C23C16/458 ,  C23C16/52

Abstract: A sensor disc configured to measure a gap between a first structure and a second structure in a processing chamber of a substrate processing system includes an upper surface, at least one first capacitive sensor arranged on the upper surface of the sensor disc that is configured to generate a first measurement signal indicative of a first distance between the upper surface of the sensor disc and the first structure, a lower surface, and at least one second capacitive sensor arranged on the lower surface of the sensor disc that is configured to generate a second measurement signal indicative of a second distance between the lower surface of the sensor disc and the second structure.

公开(公告)号：WO2022197536A1

公开(公告)日：2022-09-22

申请号：PCT/US2022/019863

申请日：2022-03-11

Applicant: LAM RESEARCH CORPORATION

Inventor： LEESER, Karl Frederick ,  BLANK, Richard ,  HIESTER, Jacob L.

IPC: H01L21/683 ,  H01L21/67 ,  C23C16/455 ,  C23C16/458 ,  H01L21/687 ,  H01J37/32

Abstract: A system comprises a pedestal and a controller. The pedestal is arranged below a showerhead in a processing chamber and includes at least three electrodes to clamp a substrate to the pedestal during processing. The controller is configured to measure a pedestal-to-showerhead gap and at least one of a magnitude and a direction of a relative tilt between the pedestal and the showerhead by sensing impedances between the at least three electrodes and the showerhead.