公开(公告)号：WO2021025934A1

公开(公告)日：2021-02-11

申请号：PCT/US2020/044168

申请日：2020-07-30

Applicant: LAM RESEARCH CORPORATION

Inventor： HAN, Hui Ling ,  HUANG, Xinwei ,  PATERSON, Alexander Miller ,  SRIRAMAN, Saravanapriyan ,  ERICKSON, Ann ,  WU, Joanna ,  RAMACHANDRAN, Seetharaman ,  KIMBALL, Christopher ,  PEREZ, Aris

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/683

Abstract: An edge ring system for a substrate processing system includes a top edge ring including an annular body having an inner diameter and an outer diameter. The outer diameter of the top edge ring is smaller than a horizontal opening of a substrate port of the substrate processing system. A first edge ring is arranged below the top edge ring including an annular body having an inner diameter and an outer diameter. The outer diameter of the first edge ring is larger than the substrate port of the substrate processing system. The inner diameter of the first edge ring is smaller than the inner diameter of the top edge ring.