公开(公告)号：WO2016150453A1

公开(公告)日：2016-09-29

申请号：PCT/EP2015/000632

申请日：2015-03-24

Applicant: MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E. V.

Inventor： DIRKS, Jan-Henning ,  CHEN, Wenwen ,  SPATZ, Joachim P. ,  BRUNNER, Robert ,  KRAUS, Matthias

IPC: C03C17/34 ,  C08J7/00

CPC classification number: C03C17/34 ,  B82Y20/00 ,  B82Y40/00 ,  C03C17/3435 ,  C03C2217/73 ,  C03C2217/734 ,  C03C2217/77 ,  C03C2217/91 ,  C03C2218/33 ,  C03C2218/34 ,  C08J7/00 ,  C23C16/0245 ,  G02B1/11 ,  G02B1/118 ,  G03F7/0002 ,  G03F7/0005 ,  G03F7/001

Abstract: The present invention relates to a method for creating nanostructures in and on organic or inorganic substrates comprising at least the following steps: a) providing a primary substrate having a predetermined refractive index; b) coating the primary substrate with one or more mediating layers each having a predetermined refractive index different from that of the primary substrate, wherein the sequence of the layers is arranged so that a predetermined gradient of the refractive index is generated between the primary substrate and the uppermost layer of the one or more mediating layers; c) optionally coating the uppermost layer of the one or more mediating layers with an additional top layer; d) depositing a nanostructured etching mask onto the uppermost layer of the composite substrate obtained after steps a)-b) or a) -c); e) generating protruding structures, in particular conical or pillar structures, or recessed structures, in particular holes, in at least the uppermost layer of the composite substrate by means of reactive ion etching. A further aspect of the invention relates to a composite substrate with a nanostructured surface obtainable by said method.

Abstract translation: 本发明涉及一种用于在有机或无机基材中形成纳米结构的方法，该方法至少包括以下步骤：a）提供具有预定折射率的初级基底; b）用一个或多个介质层涂覆初级衬底，每个介质层具有与初级衬底的预定折射率不同的预定折射率，其中层的顺序被布置成使得在初级衬底和第一衬底之间产生预定的折射率梯度 一个或多个中间层的最上层; c）任选地用一个额外的顶层涂覆一个或多个介质层的最上层; d）在步骤a）-b）或a）-c）之后获得的复合衬底的最上层上沉积纳米结构化蚀刻掩模; e）通过反应离子蚀刻在复合衬底的至少最上层中产生突出结构，特别是锥形或柱状结构或凹陷结构，特别是孔。 本发明的另一方面涉及具有可通过所述方法获得的纳米结构表面的复合衬底。