公开(公告)号：WO2006044690A3

公开(公告)日：2006-08-10

申请号：PCT/US2005037063

申请日：2005-10-14

Applicant: MOLECULAR IMPRINTS INC

Inventor： XU FRANK Y ,  CHUN JUN SUNG ,  WATTS MICHAEL P C

IPC: G03C1/76 ,  C08F2/46 ,  C08J7/18

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  H01L21/76817 ,  H01L21/7682 ,  H01L2221/1047 ,  Y10T428/24545 ,  Y10T428/24612

Abstract: In a substantially planar circuit, the conductors are separated by an inorganic material with a dielectric constant of less than about 3.0. The dielectric layers are formed in a process that includes defining trenches and/or vias for the conductors by imprinting an initially planar layer of a radiation curable composition. The imprinting die is preferably UV transparent such that the composition is UV cured while the imprint die is in place. The curable composition includes an organic modified silicate compound and a second decomposable organic component, the latter forming nanometer scale pores as the organic compounds are subsequently decomposed to provide a polysilicate matrix. The pores reduce the effective dielectric constant from that of otherwise dense silicon dioxide.

Abstract translation: 在基本上平面的电路中，导体被介电常数小于约3.0的无机材料隔开。 介电层在包括通过压印可辐射固化组合物的最初平面层而限定导体的沟槽和/或通孔的工艺中形成。 压印模具优选是UV透明的，使得当压印模具就位时组合物被UV固化。 可固化组合物包含有机改性硅酸盐化合物和第二可分解有机组分，后者形成纳米级孔隙，随着有机化合物随后分解以提供聚硅酸盐基质。 孔隙使有效介电常数与其他致密二氧化硅的有效介电常数减小。