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    NANOIMPRINT LITHOGRAPHY FORMATION OF FUNCTIONAL NANOPARTICLES USING DUAL RELEASE LAYERS
    1.
    发明申请
    NANOIMPRINT LITHOGRAPHY FORMATION OF FUNCTIONAL NANOPARTICLES USING DUAL RELEASE LAYERS 审中-公开
    纳米颗粒的双层印刷纳米微粒光刻形成

    公开(公告)号：WO2012061753A3

    公开(公告)日：2012-11-01

    申请号：PCT/US2011059402

    申请日：2011-11-04

    Applicant: MOLECULAR IMPRINTS INC ,  UNIV TEXAS

    Inventor： SINGH VIKRAMJIT ,  XU FRANK Y ,  SREENIVASAN SIDLGATA V

    IPC: B82B3/00 ,  B82B1/00 ,  B82Y40/00

    CPC classification number: G03F7/0002 ,  A61K9/51 ,  A61K9/5192 ,  B82Y5/00 ,  B82Y10/00 ,  B82Y15/00 ,  B82Y40/00 ,  Y10S977/701 ,  Y10S977/712 ,  Y10S977/713

    Abstract: Functional nanoparticles may be formed using at least one nanoimprint lithography step. In one embodiment, sacrificial material may be patterned on a multilayer substrate including one or more functional layers between removable layers using an imprint lithography process. At least one of the functional layers includes a functional material such as a pharmaceutical composition or imaging agent. The pattern may be further etched into the multilayer substrate. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Removing the removable layers releases the pillars from the patterned structure to form functional nanoparticles such as drug or imaging agent carriers.

    Abstract translation: 可以使用至少一个纳米压印光刻步骤形成功能纳米颗粒。 在一个实施例中，牺牲材料可以使用压印光刻工艺在包括可移除层之间的一个或多个功能层的多层基板上构图。 至少一个功能层包括功能材料，例如药物组合物或成像剂。 图案可以被进一步蚀刻到多层基底中。 然后可去除至少一部分功能材料以提供暴露柱的冠部表面。 移除可移除层将柱从图案化结构释放以形成功能性纳米粒子，例如药物或显像剂载体。

    NANOIMPRINT LITHOGRAPHY PROCESSES FOR FORMING NANOPARTICLES
    3.
    发明申请
    NANOIMPRINT LITHOGRAPHY PROCESSES FOR FORMING NANOPARTICLES 审中-公开
    用于形成纳米颗粒的纳米薄膜层析法

    公开(公告)号：WO2011094672A3

    公开(公告)日：2011-10-27

    申请号：PCT/US2011023145

    申请日：2011-01-31

    Applicant: MOLECULAR IMPRINTS INC

    Inventor： XU FRANK Y ,  SREENIVASAN SIDLGATA V

    IPC: G03F7/00

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: A nanoimprint lithography method for forming nanoparticles includes patterning sacrificial material on a multilayer substrate. In some cases, the pattern is transferred to or into a removable layer of the multilayer substrate, and functional material is disposed on the removable layer of the multilayer substrate and solidified. At least a portion of the functional material is then removed to expose protrusions of the removable layer, and pillars of the functional material are released from the removable layer to yield nanoparticles. In other cases, the multilayer substrate includes the functional material, and the pattern is transferred to or into a removable layer of the multilayer substrate. The sacrificial layer is removed, and pillars of the functional material are released from the removable layer to yield nanoparticles.

    Abstract translation: 用于形成纳米颗粒的纳米压印光刻方法包括在多层衬底上图案化牺牲材料。 在一些情况下，将图案转移到多层基板的可移除层或其中，并且将功能材料设置在多层基板的可移除层上并固化。 然后去除功能材料的至少一部分以暴露可移除层的突起，并且功能材料的柱从可除去的层释放以产生纳米颗粒。 在其他情况下，多层基板包括功能材料，并且图案被转移到多层基板的可移除层中或其中。 去除牺牲层，并且功能材料的柱从可除去的层中释放出来以产生纳米颗粒。

    MICRO-CONFORMAL TEMPLATES FOR NANOIMPRINT LITHOGRAPHY
    5.
    发明申请
    MICRO-CONFORMAL TEMPLATES FOR NANOIMPRINT LITHOGRAPHY 审中-公开
    用于纳米压印的微合金模板

    公开(公告)号：WO2011094317A3

    公开(公告)日：2011-09-29

    申请号：PCT/US2011022583

    申请日：2011-01-26

    Applicant: MOLECULAR IMPRINTS INC

    Inventor： MILLER MICHAEL N ,  XU FRANK Y ,  STACEY NICHOLAS A

    IPC: G03F7/00

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: A micro-conformal nanoimprint lithography template includes a backing layer and a nanopatterned layer adhered to the backing layer. The elastic modulus of the backing layer exceeds the elastic modulus of the nanopatterned layer. The micro-conformal nanoimprint lithography template can be used to form a patterned layer from an imprint resist on a substrate, the substrate having a micron-scale defect, such that an excluded distance from an exterior surface of the micron-scale defect to the patterned layer formed by the nanoimprint lithography template is less than a height of the defect. The nanoimprint lithography template can be used to form multiple imprints with no reduction in feature fidelity.

    Abstract translation: 微型共形纳米压印光刻模板包括背衬层和粘附到背衬层的纳米图案化层。 背衬层的弹性模量超过纳米图案层的弹性模量。 微型共形纳米压印光刻模板可以用于从基底上的抗蚀刻剂形成图案化层，该衬底具有微米级缺陷，使得从微米级缺陷的外表面到图案化的排除距离 由纳米压印光刻模板形成的层小于缺陷的高度。 纳米压印光刻模板可以用于形成多个压印，而不会降低特征保真度。

    PATTERNING OF NON-CONVEX SHAPED NANOSTRUCTURES
    6.
    发明申请
    PATTERNING OF NON-CONVEX SHAPED NANOSTRUCTURES 审中-公开
    非凸形纳米结构的图案化

    公开(公告)号：WO2012061816A3

    公开(公告)日：2012-12-13

    申请号：PCT/US2011059604

    申请日：2011-11-07

    Applicant: MOLECULAR IMPRINTS INC ,  UNIV TEXAS

    Inventor： SREENIVASAN SIDLGATA V ,  SINGH VIKRAMJIT ,  XU FRANK Y ,  CHOI BYUNG-JIN

    IPC: B29C33/42 ,  B82B1/00 ,  B82B3/00 ,  B82Y40/00

    CPC classification number: B29C59/022 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L29/0673

    Abstract: Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex cross-sections, are described. The approach may be used to directly pattern substrates and/or create imprint lithography templates or molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates, such as into a functional or sacrificial resist to form functional nanoparticles.

    Abstract translation: 描述了制造具有几何横截面的纳米级结构的方法，包括凸形或非凸形横截面。 该方法可用于直接图案化基板和/或形成压印光刻模板或模具，其随后可用于将纳米形图案直接复制到其他基板中，例如功能性或牺牲性抗蚀剂中以形成功能性纳米颗粒。

    REDUCTION OF STRESS DURING TEMPLATE SEPARATION FROM SUBSTRATE
    9.
    发明申请
    REDUCTION OF STRESS DURING TEMPLATE SEPARATION FROM SUBSTRATE 审中-公开
    从衬底分离模板期间减少应力

    公开(公告)号：WO2010047769A8

    公开(公告)日：2010-12-09

    申请号：PCT/US2009005692

    申请日：2009-10-20

    Applicant: MOLECULAR IMPRINTS INC

    Inventor： XU FRANK Y ,  SREENIVASAN SIDLGATA V

    IPC: G03F7/00

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: Separation of an imprint lithography template and a patterned layer in an imprint lithography process may result in stress to features of the template and/or features of the patterned layer. Such stress may be reduced by minimizing open areas on the template, including dummy features within the open areas, and/or selective positioning of features on the template.

    Abstract translation: 在压印光刻工艺中分离压印光刻模板和图案层可能导致模板的特征和/或图案化层的特征的应力。 可以通过使模板上的开放区域最小化，包括开放区域内的虚拟特征和/或特征在模板上的选择性定位来减小这种应力。

    NANO-PATTERNED ACTIVE LAYERS FORMED BY NANO-IMPRINT LITHOGRAPHY
    10.
    发明申请
    NANO-PATTERNED ACTIVE LAYERS FORMED BY NANO-IMPRINT LITHOGRAPHY 审中-公开
    纳米印刷光刻技术形成纳米图案的主动层

    公开(公告)号：WO2010044847A4

    公开(公告)日：2010-08-19

    申请号：PCT/US2009005598

    申请日：2009-10-14

    Applicant: MOLECULAR IMPRINTS INC

    Inventor： WAN FEN ,  XU FRANK Y ,  SREENIVASAN SIDLGATA V ,  YANG SHUQIANG

    IPC: H01L51/00

    CPC classification number: H01L51/0003 ,  H01L51/0006 ,  H01L51/0015 ,  H01L2251/105 ,  Y02E10/549

    Abstract: Patterned active layers formed by nano-imprint lithography for use in devices such as photovoltaic cells and hybrid solar cells. One such photovoltaic cell (400) includes a first electrode (406, 408) and a first electrically conductive layer (402, 404) electrically coupled to the first electrode. The first conductive layer (402, 404) has a multiplicity of protrusions (412, 414) and recesses (416, 422) formed by a nano-imprint lithography process. A second electrically conductive layer (402, 404) substantially fills the recesses (416, 422) and covers the protrusions (412, 414) of the first conductive layer (402, 404), and a second electrode (406, 408) is electrically coupled to the second conductive layer (402, 404). A circuit (410) electrically connects the first electrode (406, 408) and the second electrode (406, 408).

    Abstract translation: 通过纳米压印光刻形成的图案化有源层用于诸如光伏电池和混合太阳能电池的设备中。 一个这样的光伏电池（400）包括第一电极（406,408）和电耦合到第一电极的第一导电层（402,404）。 第一导电层（402,404）具有通过纳米压印光刻工艺形成的多个凸起（412,414）和凹陷（416,422）。 第二导电层（402,404）基本上填充凹槽（416,422）并覆盖第一导电层（402,404）的突起（412,414），并且第二电极（406,408）电气地 耦合到第二导电层（402,404）。 电路（410）电连接第一电极（406,408）和第二电极（406,408）。

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