OPTICAL CRITICAL DIMENSION METROLOGY
    1.
    发明申请
    OPTICAL CRITICAL DIMENSION METROLOGY 审中-公开
    光学关键尺寸计量学

    公开(公告)号:WO2015125149A1

    公开(公告)日:2015-08-27

    申请号:PCT/IL2015/050203

    申请日:2015-02-23

    Abstract: A metrology system is presented for measuring parameters of a structure. The system comprises: an optical system and a control unit. The optical system is configured for detecting light reflection of incident radiation from the structure and generating measured data indicative of angular phase of the detected light components corresponding to reflections of illuminating light components having different angles of incidence. The control unit is configured for receiving and processing the measured data and generating a corresponding phase map indicative of the phase variation along at least two dimensions, and analyzing the phase map using modeled data for determining one or more parameters of the structure.

    Abstract translation: 提出了一种用于测量结构参数的计量系统。 该系统包括:光学系统和控制单元。 光学系统被配置用于检测来自结构的入射辐射的光反射,并产生指示与具有不同入射角的照明光分量的反射相对应的检测到的光分量的角相位的测量数据。 控制单元被配置为接收和处理测量数据并且沿着至少两个维度生成指示相位变化的对应相位图,并且使用用于确定结构的一个或多个参数的建模数据来分析相位图。

    METHOD AND SYSTEM FOR IMPROVING OPTICAL MEASUREMENTS ON SMALL TARGETS
    2.
    发明申请
    METHOD AND SYSTEM FOR IMPROVING OPTICAL MEASUREMENTS ON SMALL TARGETS 审中-公开
    改进小目标光学测量的方法和系统

    公开(公告)号:WO2014174438A1

    公开(公告)日:2014-10-30

    申请号:PCT/IB2014/060906

    申请日:2014-04-22

    CPC classification number: G01N21/8806 G01N21/956 G01N2021/8848

    Abstract: A control system and method are provided for use in managing optical measurements on target structures. The control system comprises: data input utility for receiving input data indicative of a size of a target structure to be measured and input data indicative of illumination and collection channels of an optical measurement system; data processing utility for analyzing the input data, and an interplay of Point Spread Functions (PSFs) of the illumination and collection channels, and determining data indicative of optimal tailoring of apertures to be used in the optical measurement system for optimizing ensquared energy for measurements on the given target structure, the optimal tailoring comprising at least one of the following: an optimal ratio between numerical apertures of the illumination and collection channels; and an optimal orientation offset of physical apertures in the illumination and collection channels.

    Abstract translation: 提供了一种用于管理目标结构上的光学测量的控制系统和方法。 控制系统包括:用于接收指示要测量的目标结构的大小的输入数据的数据输入实用程序和指示光学测量系统的照明和收集通道的输入数据; 用于分析输入数据的数据处理实用程序,以及照明和采集通道的点扩散函数(PSF)的相互作用,以及确定指示在光学测量系统中使用的孔的最佳定制的数据,以优化用于测量的测量能量 给定的目标结构,最佳剪裁包括以下中的至少一个:照明和收集通道的数值孔径之间的最佳比率; 以及照明和收集通道中物理孔径的最佳取向偏移。

    OPTICAL SYSTEM AND METHOD FOR MEASUREMENTS OF SAMPLES
    3.
    发明申请
    OPTICAL SYSTEM AND METHOD FOR MEASUREMENTS OF SAMPLES 审中-公开
    用于测量样品的光学系统和方法

    公开(公告)号:WO2017183017A1

    公开(公告)日:2017-10-26

    申请号:PCT/IL2016/050428

    申请日:2016-04-21

    Abstract: A measurement system is presented for use in metrology measurements on patterned samples. The system comprises: at least one light source device configured to generate broadband light, at least one detection device configured to provide spectral information of detected light, and an optical system. The optical system comprises at least an oblique channel system for directing incident light generated by the light source(s) along an oblique illumination channel onto a measurement plane, on which a sample is to be located, and directing broadband light specularly reflected from the sample along a collection channel to the detection device(s). The optical system further comprises an interferometric unit comprising a beam splitting/combining device and a reference reflector device. The beam splitting/combining device is accommodated in the illumination and collection channels and divides light propagating in the illumination channel into sample and reference light beams propagating in sample and reference paths, and combines reflected reference and sample paths into the collection channel to thereby create a spectral interference pattern on a detection plane.

    Abstract translation: 测量系统被提供用于图案化样品的计量测量。 该系统包括:至少一个配置成产生宽带光的光源装置,配置成提供检测到的光的光谱信息的至少一个检测装置,以及光学系统。 该光学系统至少包括倾斜通道系统,用于将由光源产生的入射光沿着倾斜照明通道引导到样品将被定位在其上的测量平面上,并引导从样品镜面反射的宽带光 沿着收集通道到达检测设备。 该光学系统还包括干涉测量单元,该干涉测量单元包括分束/合束装置和参考反射装置。 光束分离/合并装置容纳在照明和收集通道中,并将在照明通道中传播的光分成在样本和参考路径中传播的样本和参考光束,并且将反射的参考和样本路径组合到收集通道中,从而创建 光谱干涉图案在检测平面上。

    OPTICAL SYSTEM AND METHOD FOR MEASURING PARAMETERS OF PATTERNED STRUCTURES IN MICROELECTRONIC DEVICES

    公开(公告)号:WO2018096526A1

    公开(公告)日:2018-05-31

    申请号:PCT/IL2016/051263

    申请日:2016-11-23

    Abstract: An optical system and method are presented for use in measurements on an upper surface of a layered sample when located in a measurement plane. The optical system is configured as a normal-incidence system having an illumination channel and a collection channel, and comprises an objective lens unit and a light propagation affecting device. The objective lens unit is accommodated in the illumination and collection channels, thereby defining a common optical path for propagation of illuminating light from the illumination channel toward an illuminating region in the measurement plane and for propagation of light returned from measurement plane to the collection channel. The light propagation affecting device comprises an apertured structure located in at least one of the illumination and collection channels, and configured to provide angular obscuration of light propagation path for blocking angular segments associated with light propagation from regions outside the illuminated region.

    OPTICAL PHASE MEASUREMENT METHOD AND SYSTEM
    5.
    发明申请
    OPTICAL PHASE MEASUREMENT METHOD AND SYSTEM 审中-公开
    光学相位测量方法与系统

    公开(公告)号:WO2015155779A1

    公开(公告)日:2015-10-15

    申请号:PCT/IL2015/050389

    申请日:2015-04-12

    Abstract: A measurement system for use in measuring parameters of a patterned sample is presented. The system comprises: a broadband light source; an optical system configured as an interferometric system; a detection unit; and a control unit. The interferometric system defines illumination and detection channels having a sample arm and a reference arm comprising a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms; the detection unit comprises a configured and operable for detecting a combined light beam formed by a light beam reflected from said reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by at least two spectral interference signatures. The control unit is configured and operable for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

    Abstract translation: 提出了一种用于测量图案样品参数的测量系统。 该系统包括:宽带光源; 配置为干涉系统的光学系统; 检测单元; 和控制单元。 所述干涉仪系统定义具有采样臂和参考臂的照明和检测通道,所述参考臂包括参考反射器,并且被配置为用于诱导所述样本和参考臂之间的光程差; 检测单元包括被配置和可操作以检测由从所述反射器反射的光束形成的组合光束和从样本支架传播的光束,以及产生指示由至少两个光谱干涉特征形成的光谱干涉图案的测量数据 。 控制单元被配置和操作用于接收测量数据,并将基于模型的处理应用于频谱干涉图案,以确定样本中的图案的一个或多个参数。

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