公开(公告)号：WO2015195388A1

公开(公告)日：2015-12-23

申请号：PCT/US2015/034639

申请日：2015-06-08

Applicant: NUVOSUN, INC.

Inventor： WALL, Arthur, C. ,  KIM, John, K. ,  BYKOV, Eugene ,  KAO, Sam ,  JIANG, Qiongzhong ,  HACHTMANN, Bruce, D.

IPC: C23C8/08 ,  C23C8/02 ,  H01L31/18 ,  H01L31/20

CPC classification number: C23C16/545 ,  C23C8/02 ,  C23C8/08 ,  C23C16/305 ,  C23C16/4485 ,  C23C16/46 ,  C23C16/52 ,  H01L21/02425 ,  H01L21/02491 ,  H01L21/02568 ,  H01L21/02587 ,  H01L21/02614 ,  H01L31/0322 ,  H01L31/03928 ,  Y02E10/541

Abstract: Methods and systems are disclosed for processing a precursor material. The method includes introducing a substrate having a precursor material deposited on a surface of the substrate into a first zone of a vacuum chamber. The precursor material comprises copper, indium, and at least one of gallium, selenium, sulfur, sodium, antimony, boron, aluminum, and silver. The method further includes, within the first zone, heating the precursor material to a target reaction temperature within a range of about 270° C to about 490° C. The method further includes maintaining a selenium vapor in a second zone of the vacuum chamber, and after heating the precursor material to the target reaction temperature, introducing the precursor material and the substrate to the second zone of the vacuum chamber.

Abstract translation: 公开了用于处理前体材料的方法和系统。 该方法包括将具有沉积在基板的表面上的前体材料的基板引入真空室的第一区域。 前体材料包括铜，铟，以及镓，硒，硫，钠，锑，硼，铝和银中的至少一种。 该方法还包括在第一区域内将前体材料加热到约270℃至约490℃的范围内的目标反应温度。该方法还包括将硒蒸汽保持在真空室的第二区域中， 并且在将前体材料加热到目标反应温度之后，将前体材料和基底引入真空室的第二区域。

公开(公告)号：WO2015073156A1

公开(公告)日：2015-05-21

申请号：PCT/US2014/060832

申请日：2014-10-16

Applicant: NUVOSUN, INC.

Inventor： WALL, Arthur, C. ,  KAO, Sam ,  KIM, John, Kwangyong ,  HACHTMANN, Bruce, D. ,  JIANG, Qiongzhong ,  PORTER, Karnig Ross, Baron

IPC: C23C14/24 ,  C23C14/54 ,  C23C14/06

CPC classification number: C23C14/546 ,  C23C14/0623 ,  C23C14/243 ,  C23C14/543

Abstract: Methods and systems are disclosed for monitoring vapor in a vacuum reactor apparatus. An system has (a) a vacuum chamber, (b) a vapor source housed in the vacuum chamber, wherein the vapor source is configured to generate a vapor, (c) a reaction vessel housed in the vacuum chamber and coupled to the vapor source, where the reaction vessel has an outlet to the vacuum chamber, and where the reaction vessel is configured to receive the vapor from the vapor source and to emit a portion of the received vapor into the vacuum chamber through the outlet, and (d) one or more sensors housed in the vacuum chamber, where the one or more sensors are configured to detect the vapor emitted through the outlet.

Abstract translation: 公开了用于监测真空反应器装置中的蒸气的方法和系统。 一种系统具有（a）真空室，（b）容纳在真空室中的蒸气源，其中蒸汽源被配置成产生蒸气，（c）容纳在真空室中的反应容器，并与蒸气源 ，其中反应容器具有到真空室的出口，并且其中反应容器构造成从蒸汽源接收蒸气并且通过出口将一部分接收的蒸气排放到真空室中，并且（d）一个 或更多的传感器，其中所述一个或多个传感器被配置为检测通过所述出口排出的蒸汽。