公开(公告)号：WO2018148448A1

公开(公告)日：2018-08-16

申请号：PCT/US2018/017475

申请日：2018-02-08

Applicant: OEM GROUP, LLC

Inventor： FORGEY, Christian K. ,  NELSON, Mark ,  TRUFANOV, Alexander

IPC: B05B1/02 ,  B05B1/04 ,  B05B1/12 ,  B05B1/14 ,  B05B1/16 ,  B05B1/20 ,  B05B1/30 ,  B05B9/00 ,  B05B15/00 ,  B05B15/65 ,  B05B15/658 ,  B05B15/68

Abstract: Various embodiments for an adjustable flow nozzle system having a manifold with a plurality of adjustable flow nozzles in which the flow rate of each adjustable flow nozzle may be individually adjusted are described herein.

公开(公告)号：WO2022051125A1

公开(公告)日：2022-03-10

申请号：PCT/US2021/047130

申请日：2021-08-23

Applicant: OEM GROUP, LLC

Inventor： LARIVIERE, Marc-Andre ,  RIOS REYES, Juan ,  CHOUDHARY, Nitin ,  LI, Chao ,  TRANG, Brendan V. ,  FORGEY, Christian K. ,  CORRERA, Michael S. ,  SENSEMAN, William

IPC: H01J37/34

Abstract: The present invention provides a magnetron system, comprising a baseplate assembly. The baseplate assembly defining a housing portion and a power feedthrough. A sputtering target is disposed within the housing portion of the baseplate assembly. An electromagnetic assembly is disposed within the housing portion of the baseplate assembly. The electromagnetic assembly comprising a plurality of electromagnet pairs and a plurality of magnet pairs, wherein the plurality of electromagnet pairs and the plurality of magnet pairs are arranged in an alternating order such that at least one electromagnet pair of the plurality of electromagnet pairs is juxtapositioned between two magnet pairs of the plurality of magnet pairs, and at least one magnet pair of the plurality of magnet pairs is juxtapositioned between two electromagnet pairs of the plurality of electromagnet pairs.

公开(公告)号：WO2020159969A1

公开(公告)日：2020-08-06

申请号：PCT/US2020/015384

申请日：2020-01-28

Applicant: OEM GROUP, LLC

Inventor： FORGEY, Christian K. ,  TRUFANOV, Alexander ,  LEVINSON, Joshua A. ,  O'REILLY, Darren O.

IPC: B05B1/30 ,  B05B1/14 ,  B05B1/02 ,  B05B7/02

Abstract: Various embodiments for an adjustable flow nozzle system having a manifold with a plurality of adjustable flow nozzles in which the flow rate of each adjustable flow nozzle may be individually adjusted are described herein.

公开(公告)号：WO2022046356A1

公开(公告)日：2022-03-03

申请号：PCT/US2021/044077

申请日：2021-07-30

Applicant: OEM GROUP, LLC

Inventor： LARIVIERE, Marc-Andre ,  RIOS REYES, Juan ,  CHOUDHARY, Nitin ,  LI, Chao ,  TRANG, Brendan V. ,  FORGEY, Christian K. ,  CORRERA, Michael S.

IPC: H01J37/34 ,  C23C14/35

Abstract: The present invention provides a magnetron system comprising a baseplate assembly that defines a housing portion and a power feedthrough. A magnet assembly and a segmented target assembly are disposed within the housing portion. The segmented target assembly has an inner target segment having a plurality of target tiles. A plurality of electrical contacts are in electrical communication with the power feedthrough, wherein each electrical contact of the plurality of electrical contacts electrically contacts a respective target tile of the plurality of target tiles such that power is delivered from each electrical contact of the plurality of electrical contacts to each respective target tile of the plurality of target tiles.

公开(公告)号：WO2021034968A1

公开(公告)日：2021-02-25

申请号：PCT/US2020/047057

申请日：2020-08-19

Applicant: OEM GROUP, LLC

Inventor： LARIVIERE, Marc A. ,  TRANG, Brendan V. ,  CORRERA, Michael S. ,  FORGEY, Christian K. ,  RIOS REYES, Juan M.

IPC: H01L21/683 ,  H01L21/67

Abstract: Various embodiments of a mechanical assembly for linear and rotational handling of electronic wafer substrates under high vacuum are disclosed herein.