公开(公告)号：WO0190820A9

公开(公告)日：2002-10-10

申请号：PCT/US0116308

申请日：2001-05-22

Applicant: SILICON VALLEY GROUP

Inventor： GOVIL PRADEEP KUMAR ,  IVALDI JORGE S

IPC: B23Q3/08 ,  G03F7/20 ,  H01L21/027 ,  H01L21/683

CPC classification number: G03F7/70216 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70783

Abstract: A flexible chuck (100) for supporting a substrate during lithographic processing is described. This flexible chuck includes an electrode layer (116), a piezoelectric layer (110) disposed on the electrode layer, and a substrate support layer (111) disposed above the piezoelectric layer. By providing electrical signals to the piezoelectric layer through the electrode layer, the support layer can be flexed, thereby changing surface topography on a substrate disposed on the flexible chuck. The contact layer can include projections, each of the projections corresponding to a respective electrode within the electrode layer. Furthermore, the substrate support layer can be formed of a conductive material and thus serve as the ground layer. Alternatively, separate substrate support and ground layers can be provided. The flexible chuck in accordance with the instant invention can be a vacuum chuck. Also described is a method of monitoring topographic changes in a flexible chuck in accordance with the instant invention.

Abstract translation: 描述了用于在光刻处理期间支撑衬底的柔性卡盘（100）。 该柔性卡盘包括电极层（116），设置在电极层上的压电层（110）和设置在压电层上方的基板支撑层（111）。 通过通过电极层向压电层提供电信号，支撑层可以弯曲，从而改变设置在柔性卡盘上的基板上的表面形貌。 接触层可以包括突起，每个突起对应于电极层内的相应电极。 此外，基板支撑层可以由导电材料形成，因此用作接地层。 或者，可以提供单独的衬底支撑和接地层。 根据本发明的柔性卡盘可以是真空卡盘。 还描述了根据本发明监测柔性卡盘中的地形变化的方法。

公开(公告)号：WO0190819A3

公开(公告)日：2002-03-21

申请号：PCT/US0115655

申请日：2001-05-16

Applicant: SILICON VALLEY GROUP

Inventor： GOVIL PRADEEP KUMAR ,  TSACOYEANES JAMES

IPC: G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027

CPC classification number: G03F7/70625 ,  G03F7/70141 ,  G03F7/703 ,  G03F7/70641 ,  G03F7/707 ,  G03F9/7026

Abstract: Particular types of distortion within a lithographic system may be characterized by linewidth control parameters. Linewidth control parameters of any given line or feature within a printed pattern vary as a result of optical capabilities of the lithography apparatus used, particular characteristics of the reticle, focus setting, light dose fluctuations, etc. The instant invention uses focus offset coefficients to change the focus at points within a slot to compensate for the linewidth control parameter variations introduced by the factors contributing to such variations. Additionally, different focuses can be set dynamically along the scan for a particular slot point. A set, or sets, of focus offset coefficients is generated for a particular lithography apparatus, depending on the number of line width control parameters for which correction is desired.

Abstract translation: 光刻系统中的特定类型的失真可以通过线宽控制参数来表征。 作为所使用的光刻设备的光学能力，掩模版的特定特征，聚焦设置，光剂量波动等的结果，印刷图案中的任何给定线或特征的线宽控制参数变化。本发明使用聚焦偏移系数来改变 在时隙内的点处的焦点以补偿由这些变化造成的因素引起的线宽控制参数变化。 另外，可以沿着特定时隙点的扫描动态设置不同的焦点。 根据需要进行校正的线宽度控制参数的数量，针对特定光刻设备产生聚焦偏移系数的集合或集合。