CMP PAD DRESSERS
    2.
    发明申请
    CMP PAD DRESSERS 审中-公开
    CMP PAD连接器

    公开(公告)号:WO2009064677A3

    公开(公告)日:2009-08-27

    申请号:PCT/US2008082859

    申请日:2008-11-07

    Applicant: SUNG CHIEN-MIN

    Inventor: SUNG CHIEN-MIN

    CPC classification number: B24B53/017 Y10T428/2457 Y10T428/24612

    Abstract: An abrasive tool (112) includes an assembly of tool precursors (116). At least one of the tool precursors has a continuous polycrystalline diamond, polycrystalline cubic boron nitride, or ceramic material cutting element (18) formed into a blade shape. The abrasive tool can additionally include a setting material (68), which is configured to attach the tool precursors and form a single mass. The selection, arrangement, and setting of the tool precursors can result in an abrasive tool having a predetermined cutting configuration. Methods for forming such an abrasive tool are also disclosed.

    Abstract translation: 研磨工具(112)包括工具前体(116)的组件。 工具前体中的至少一个具有形成为叶片形状的连续多晶金刚石,多晶立方氮化硼或陶瓷材料切割元件(18)。 研磨工具还可以包括固定材料(68),其被配置成附接工具前体并形成单个质量块。 刀具前体的选择,布置和设置可以产生具有预定切割构造的研磨工具。 还公开了用于形成这种研磨工具的方法。

    ABRASIVE COMPOSITE TOOLS HAVING COMPOSITIONAL GRADIENTS AND ASSOCIATED METHODS
    3.
    发明申请
    ABRASIVE COMPOSITE TOOLS HAVING COMPOSITIONAL GRADIENTS AND ASSOCIATED METHODS 审中-公开
    具有组合梯度和相关方法的磨料复合工具

    公开(公告)号:WO2005116146A3

    公开(公告)日:2006-05-04

    申请号:PCT/US2005014892

    申请日:2005-04-29

    Applicant: SUNG CHIEN-MIN

    Inventor: SUNG CHIEN-MIN

    CPC classification number: B24D5/14 B24D7/14

    Abstract: An improved abrasive composite tool having a compositional gradient is disclosed and described. The composite tool can include a first region including abrasive particles, a second region, and a transition region connecting the first and second regions. The transition region can have a compositional gradient from the first region to the second region. The transition region can have compositional gradients among materials such as metals, ceramics, diamond-containing materials, polymers, or composites of such materials. The compositional gradient can include multiple intermediate regions or may transition directly from the first region to the second region. Most often, the transition region can be formed by vapor deposition methods such as PVD and CVD. Advantageously, the transition region can be formed on an abrasive tool to provide improved chemical and/or mechanical erosion resistance.

    Abstract translation: 公开和描述了具有组成梯度的改进的磨料复合工具。 复合工具可以包括包括研磨颗粒的第一区域,第二区域和连接第一和第二区域的过渡区域。 过渡区域可以具有从第一区域到第二区域的组成梯度。 过渡区域可以在诸如金属,陶瓷,含金刚石的材料,聚合物或这些材料的复合材料之类的材料中具有组成梯度。 组成梯度可以包括多个中间区域或者可以直接从第一区域转移到第二区域。 通常,过渡区域可以通过诸如PVD和CVD的气相沉积方法形成。 有利地,过渡区域可以形成在研磨工具上以提供改进的化学和/或机械耐腐蚀性。

    DIAMOND BODIES GROWN ON SIC SUBSTRATES AND ASSOCIATED METHODS
    4.
    发明申请
    DIAMOND BODIES GROWN ON SIC SUBSTRATES AND ASSOCIATED METHODS 审中-公开
    在SIC基底上生长的金刚石和相关方法

    公开(公告)号:WO2010062419A3

    公开(公告)日:2010-07-29

    申请号:PCT/US2009052572

    申请日:2009-08-03

    Applicant: SUNG CHIEN-MIN

    Inventor: SUNG CHIEN-MIN

    Abstract: The present invention provides methods of forming high quality diamond bodies under high pressure, and the diamond bodies produced by such methods. In one aspect, a method is provided for growing a diamond body, including providing a non-particulate silicon carbide (SiC) mass having a pre-designed shape, placing the SiC mass under high pressure in association with a molten catalyst and a carbon source, and maintaining the SiC mass under high pressure to form a substantially monocrystalline diamond body. The diamond body may be formed across substantially all of the SiC mass having surface area exposed to the molten catalyst. As such, the diamond body may conform to the shape of the exposed surface area of the SiC mass.

    Abstract translation: 本发明提供了在高压下形成高质量金刚石体的方法以及通过这种方法生产的金刚石体。 在一个方面,提供了一种用于生长金刚石体的方法,包括提供具有预先设计的形状的非颗粒状碳化硅(SiC)块,将SiC块在高压下与熔融催化剂和碳源 并在高压下保持SiC质量以形成基本上单晶的金刚石体。 金刚石体可以形成为横跨暴露于熔融催化剂的表面区域的基本上全部的SiC块体。 如此,金刚石体可以符合SiC块的暴露表面区域的形状。

    SUPERHARD CUTTERS AND ASSOCIATED METHODS
    5.
    发明申请
    SUPERHARD CUTTERS AND ASSOCIATED METHODS 审中-公开
    超级切割机及相关方法

    公开(公告)号:WO2006124792A3

    公开(公告)日:2007-08-16

    申请号:PCT/US2006018761

    申请日:2006-05-12

    Applicant: SUNG CHIEN-MIN

    Inventor: SUNG CHIEN-MIN

    CPC classification number: B24B7/228 B24D7/06

    Abstract: A cutting device (10) comprises a base (12) having a working side (14) that is oriented to face a workpiece (19) from which material is to be removed. A plurality of individual cutting elements (16) are arranged on the working side of the base, with each cutting element having a peak that comprises at least one cutting edge (18) that is formed from a polycrystalline superhard material. The peaks of the cutting elements are aligned in a common plane (20).

    Abstract translation: 切割装置(10)包括具有工作侧(14)的基部(12),该工作侧被定向成面向要被去除材料的工件(19)。 多个单独的切割元件(16)布置在基座的工作侧上,每个切割元件具有包括由多晶超硬材料形成的至少一个切割刃(18)的峰。 切割元件的峰在公共平面(20)中对准。

    CHEMICAL MECHANICAL POLISHING PAD DRESSER
    6.
    发明申请
    CHEMICAL MECHANICAL POLISHING PAD DRESSER 审中-公开
    化学机械抛光机

    公开(公告)号:WO2006073924A2

    公开(公告)日:2006-07-13

    申请号:PCT/US2005047024

    申请日:2005-12-23

    Applicant: SUNG CHIEN-MIN

    Inventor: SUNG CHIEN-MIN

    CPC classification number: B24B53/02 B24B1/00 B24B53/10 B24B53/12 B24D3/00

    Abstract: CMP pad dressers and their methods of manufacture are disclosed. One aspect of the present invention provides a CMP pad dresser (20) having improved superabrasive grit retention in a resin layer. The CMP pad includes a resin layer (14), superabrasive grit (12) held in the resin layer (14) such that an exposed portion (26) of each superabrasive grit (12) protrudes from the resin layer (14), and a metal coating layer (16) disposed between each superabrasive grit (12) and the resin layer (14), where the exposed portions (26) are substantially free of the metal coating layer (16). The metal coating layer (16) acts to increase the retention of the superabrasive grit (12) in the resin layer (14) as compared to superabrasive grit (12) absent the metal coating layer (16).

    Abstract translation: 公开了CMP抛光垫修整器及其制造方法。 本发明的一个方面提供了一种在树脂层中具有改进的超磨料砂粒保持性的CMP抛光垫修整器(20)。 CMP垫包括树脂层(14),保持在树脂层(14)中的超研磨砂粒(12),使得每个超研磨砂粒(12)的暴露部分(26)从树脂层(14)突出,并且 设置在每个超研磨砂粒(12)和树脂层(14)之间的金属涂层(16),其中暴露部分(26)基本上不含金属涂层(16)。 与没有金属涂层(16)的超磨料砂粒(12)相比,金属涂层(16)用于增加超研磨砂粒(12)在树脂层(14)中的保留。

    Abrasive composite tools having compositional gradients and associated methods
    7.
    发明申请
    Abrasive composite tools having compositional gradients and associated methods 审中-公开
    具有组成梯度和相关方法的磨料复合工具

    公开(公告)号:WO2005116146B1

    公开(公告)日:2006-06-15

    申请号:PCT/US2005014892

    申请日:2005-04-29

    Applicant: SUNG CHIEN-MIN

    Inventor: SUNG CHIEN-MIN

    CPC classification number: B24D5/14 B24D7/14

    Abstract: An improved abrasive composite tool having a compositional gradient is disclosed and described. The composite tool can include a first region including abrasive particles, a second region, and a transition region connecting the first and second regions. The transition region can have a compositional gradient from the first region to the second region. The transition region can have compositional gradients among materials such as metals, ceramics, diamond-containing materials, polymers, or composites of such materials. The compositional gradient can include multiple intermediate regions or may transition directly from the first region to the second region. Most often, the transition region can be formed by vapor deposition methods such as PVD and CVD. Advantageously, the transition region can be formed on an abrasive tool to provide improved chemical and/or mechanical erosion resistance.

    Abstract translation: 公开和描述了具有组成梯度的改进的磨料复合工具。 复合工具可以包括包括研磨颗粒的第一区域,第二区域和连接第一和第二区域的过渡区域。 过渡区域可以具有从第一区域到第二区域的组成梯度。 过渡区域可以在诸如金属,陶瓷,含金刚石的材料,聚合物或这些材料的复合材料之类的材料中具有组成梯度。 组成梯度可以包括多个中间区域或者可以直接从第一区域转移到第二区域。 通常,过渡区域可以通过诸如PVD和CVD的气相沉积方法形成。 有利地,过渡区域可以形成在研磨工具上以提供改进的化学和/或机械耐腐蚀性。

    CMP PAD CONDITIONERS WITH MOSAIC ABRASIVE SEGMENTS AND ASSOCIATED METHODS
    8.
    发明申请
    CMP PAD CONDITIONERS WITH MOSAIC ABRASIVE SEGMENTS AND ASSOCIATED METHODS 审中-公开
    具有MOSAIC磨料部分和相关方法的CMP PAD调节器

    公开(公告)号:WO2009043058A2

    公开(公告)日:2009-04-02

    申请号:PCT/US2008078208

    申请日:2008-09-29

    CPC classification number: B24B53/12 B24B53/02

    Abstract: A CMP pad conditioner comprises a plurality of abrasive segments. Each abrasive segment includes a segment blank and an abrasive layer attached to the segment blank, the abrasive layer including a superhard abrasive material, A pad conditioner substrate is also provided. Each of the plurality of abrasive segments is permanently affixed to the pad conditioner substrate in an orientation that enables removal of material from a CMP pad by the abrasive layer as the pad conditioner and the CMP pad are moved relative to one another.

    Abstract translation: CMP垫调节器包括多个磨料段。 每个研磨部分包括段坯料和连接到片坯的磨料层,研磨层包括超硬磨料,还提供了衬垫调节衬底。 多个研磨部分中的每一个永久地固定到衬垫调节器衬底上,其方式是当衬垫调节器和CMP垫相对于彼此移动时,能够通过磨料层从CMP衬垫去除材料。

    LED DEVICES AND ASSOCIATED METHODS
    9.
    发明申请
    LED DEVICES AND ASSOCIATED METHODS 审中-公开
    LED器件和相关方法

    公开(公告)号:WO2008024452A3

    公开(公告)日:2008-05-02

    申请号:PCT/US2007018676

    申请日:2007-08-22

    Applicant: SUNG CHIEN-MIN

    Inventor: SUNG CHIEN-MIN

    CPC classification number: H01L33/641

    Abstract: Methods for cooling semiconductor devices having a light-emitting surface and associated devices are disclosed and described. Such a device (10) may include a light-emitting surface (16) and a diamond layer (14) disposed on at least a portion of the light-emitting surface (16). The diamond layer (14) may be exposed to air in order to accelerate movement of heat away from the light-emitting surface (16) and into the air.

    Abstract translation: 公开并描述了用于冷却具有发光表面的半导体器件和相关器件的方法。 这样的装置(10)可以包括设置在发光表面(16)的至少一部分上的发光表面(16)和金刚石层(14)。 金刚石层(14)可以暴露于空气中以加速热量从发光表面(16)移动到空气中的移动。

    DIAMOND-LIKE CARBON ELECTRONIC DEVICES AND METHODS OF MANUFACTURE
    10.
    发明申请
    DIAMOND-LIKE CARBON ELECTRONIC DEVICES AND METHODS OF MANUFACTURE 审中-公开
    类金刚石碳电子器件及其制造方法

    公开(公告)号:WO2008021482A3

    公开(公告)日:2008-04-10

    申请号:PCT/US2007018232

    申请日:2007-08-14

    Applicant: SUNG CHIEN-MIN

    Inventor: SUNG CHIEN-MIN

    Abstract: Materials, devices, and methods for enhancing performance of electronic devices such as solar cells, fuels cells, LEDs, thermoelectric conversion devices, and other electronic devices are disclosed and described. A diamond-like carbon electronic (26) device can include a conductive diamond-like carbon cathode (34) having specified carbon, hydrogen and sp 2 bonded carbon contents. In some cases, the sp 2 bonded carbon content may be sufficient to provide the conductive diamond-like carbon material with a visible light transmissivity of greater than about 0.70. A charge carrier separation layer (28) can be coupled adjacent and between the diamond-like carbon cathode (34) and an anode (36). The conductive diamond-like carbon material of the present invention can be useful for any other application which can benefit from the use of conductive and transparent electrodes which are also chemically inert, radiation damage resistance, and are simple to manufacture.

    Abstract translation: 公开和描述了用于增强诸如太阳能电池,燃料电池,LED,热电转换装置和其它电子装置的电子装置的性能的材料,装置和方法。 类金刚石碳电子(26)器件可以包括具有特定碳,氢和sp 2键合碳含量的导电类金刚石碳阴极(34)。 在一些情况下,粘结碳含量足以提供具有大于约0.70的可见光透射率的导电类金刚石碳材料。 电荷载体分离层(28)可以被连接在金刚石状碳阴极(34)和阳极(36)之间。 本发明的导电类金刚石碳材料可用于可以受益于使用导电和透明电极的任何其它应用,其也是化学惰性的,耐辐射损伤的,并且制造简单。

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