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    ALLOYED ZINC POWDERS FOR ALKALINE BATTERIES WITH HIGH PYKNOMETER DENSITY
    2.
    发明申请
    ALLOYED ZINC POWDERS FOR ALKALINE BATTERIES WITH HIGH PYKNOMETER DENSITY 审中-公开
    高浓度密度碱性电池的合金锌粉

    公开(公告)号：WO2006045470A1

    公开(公告)日：2006-05-04

    申请号：PCT/EP2005/011135

    申请日：2005-10-13

    Applicant: UMICORE ,  STRAUVEN, Yvan ,  HENNINOT, Christophe

    Inventor： STRAUVEN, Yvan ,  HENNINOT, Christophe

    IPC: H01M4/42 ,  H01M4/24 ,  B22F9/10 ,  B22F9/08

    CPC classification number: H01M4/42 ,  B22F9/10 ,  B22F2999/00 ,  C22C1/04 ,  C22C18/00 ,  H01M10/24 ,  B22F2201/00

    Abstract: The invention describes alloyed zinc powders for alkaline batteries. The powders have a high pyknometer density as a consequence of the presence of only a limited quantity of pores. This high pyknometer density results in strongly reduced gassing after partial discharge of the powders. Also, a process for the manufacturing of a zinc alloy powder for alkaline batteries is disclosed, comprising the step of atomising a zinc alloy, characterised in that the atomising process has a flow rate of at least 700 kg/h, and preferably at least 1000, 1100 or even 1650 kg/h. In one embodiment, the atomising process is performed in a controlled atmosphere, wherein the oxygen content is less than 4 % by volume, and preferably between 0.2 and 3.5 %. The atomising process can be a centrifugal atomisation process. In the atomising process, the zinc alloy consists either of: a) 0.005 - 2 % by weight of indium, and 0.005 - 0.2 % by weight of either one of Al and Bi; or b) 0.005 - 2 % by weight of indium, and 0.005 - 0.2 % by weight of Bi, and 0.001 - 0.5 % of either one or both of Al and Ca; or c) 0.005 - 2 % by weight of either one or both of Bi and Al; and 0 - 0.5 % by weight of Pb, the remainder being zinc.

    Abstract translation: 本发明描述了用于碱性电池的合金化锌粉末。 这些粉末由于仅存在有限数量的孔而具有较高的定影密度。 这种高密度计密度导致粉末局部放电后气体强烈降低。 此外，公开了一种用于制造碱性电池用锌合金粉末的方法，包括使锌合金雾化的步骤，其特征在于，所述雾化工艺的流速为至少700kg / h，优选为至少1000 ，1100或甚至1650kg / h。 在一个实施方案中，雾化过程在受控气氛中进行，其中氧含量小于4体积％，优选在0.2和3.5％之间。 雾化过程可以是离心雾化过程。 在雾化过程中，锌合金由以下组成：a）0.005-2重量％的铟和0.005-0.2重量％的Al和Bi中的任一个; 或b）0.005-2重量％的铟和0.005-0.2重量％的Bi和0.001-0.5％的Al和Ca中的一种或两种; 或c）0.005-2重量％的Bi和Al中的任一个或两者; 和0〜0.5重量％的Pb，其余为锌。

    DOPED CERIA ABRASIVES WITH CONTROLLED MORPHOLOGY AND PREPARATION THEREOF
    3.
    发明申请
    DOPED CERIA ABRASIVES WITH CONTROLLED MORPHOLOGY AND PREPARATION THEREOF 审中-公开
    DOPED CERIA具有受控的形态学及其制备

    公开(公告)号：WO2009098017A1

    公开(公告)日：2009-08-13

    申请号：PCT/EP2009/000679

    申请日：2009-02-03

    Applicant: UMICORE ,  DE MESSEMAEKER, Joke ,  PUT, Stijn ,  VANGENECHTEN, Dirk ,  VAN ROMPAEY, Yves ,  NELIS, Daniël ,  STRAUVEN, Yvan ,  VAN TENDELOO, Gustaaf

    Inventor： DE MESSEMAEKER, Joke ,  PUT, Stijn ,  VANGENECHTEN, Dirk ,  VAN ROMPAEY, Yves ,  NELIS, Daniël ,  STRAUVEN, Yvan ,  VAN TENDELOO, Gustaaf

    IPC: C01B17/00 ,  C09K3/14

    CPC classification number: C01F17/0043 ,  B82Y30/00 ,  C01P2002/54 ,  C01P2002/77 ,  C01P2004/64 ,  C01P2006/12 ,  Y10T428/2982

    Abstract: The present invention relates to doped ceria (CeO2) abrasive particles, having an essentially octahedral morphology. Such abrasives are used in water-based slurries for Chemical Mechanical Polishing (CMP) of subrates such as silicon wafers. The invention more particularly concerns yttrium-doped ceria particles having a specific surface area of 10 to 120 m2/g, characterized in that at least 95 wt%, preferably at least 99 wt%, of the particles are mono-crystalline and in that the particles' surfaces consist of more than 70 %, preferably of more than 80 %, of planes parallel to {111} planes. A novel gas phase process for synthesizing this product is also disclosed, comprising the steps of providing a hot gas stream,- and, introducing into said gas stream a cerium-bearing reactant, a dopant-bearing reactant, and an oxygen-bearing reactant,- the temperature of said gas stream being chosen so as to atomize said reactant, the reactant being selected so as to form, upon cooling, doped ceria particles. Abrasive slurries based on the above ceria offer a low level of induced detectivity in the polished substrate, while ensuring a good removal rate.

    Abstract translation: 本发明涉及具有基本八面体形态的掺杂二氧化铈（CeO 2）磨料颗粒。 这种研磨剂用于水性浆料中用于诸如硅晶片的亚速率化学机械抛光（CMP）。 本发明更具体地涉及比表面积为10至120m 2 / g的掺钇二氧化铈颗粒，其特征在于至少95wt％，优选至少99wt％的颗粒是单晶的，并且其中 颗粒表面由大于70％，优选大于80％的平面{111}平面的平面组成。 还公开了一种用于合成该产品的新型气相方法，其包括以下步骤：提供热气流，并且向所述气流中引入含铈反应物，含掺杂剂的反应物和含氧反应物， - 选择所述气流的温度以雾化所述反应物，所述反应物选择为在冷却时形成掺杂的二氧化铈颗粒。 基于上述二氧化铈的磨料浆料在抛光的基材中提供低水平的诱导检测，同时确保良好的去除速率。

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