摘要:
A printing stencil (50) and a method for its preparation is provided. The printing stencil includes a porous stencil carrier layer (52), preferably of a non-woven tissue, which is impregnated with a solid or liquid radiation curable material (54). The printing stencil may further comprise a mask (56) laid upon or integral to the stencil layer for defining areas transparent and areas non transparent to curing radiation. The method for the preparation of the printing stencil, comprises the step of selectively irradiating the stencil layer with curing radiation, thereby forming ink permeable and ink impermeable areas, the ink permeable areas consisting of uncured material and the ink impermeable areas consisting of cured material.
摘要:
Siebdruckform, aufweisend: - einen Siebdruckschablonenträger, welcher als Folie ausgebildet ist, die mit ersten Ausnehmungen versehen ist, die so ausgebildet sind, dass sie von einer Oberseite zur Unterseite der Folie reichen, und - eine Siebdruckschablone, welche als nichtmetallische Maskierschicht ausgebildet ist, welche mit der Unterseite des Siebdruckschablonenträgers fest verbunden ist, wobei die Maskierschicht mit zweiten Ausnehmungen versehen ist, welche mindestens teilweise mit den ersten Ausnehmungen des Siebdruckschablonenträgers so in Überdeckung liegen, dass ein Druckmedium durch die ersten Ausnehmungen des Siebdruckschablonenträgers von dessen Oberseite in Richtung zur Unterseite und durch die zweiten Ausnehmungen der Maskierschicht hindurch auf ein darunter platzierbares Substrat passieren kann.
摘要:
Screen printing methods, processes, apparatuses, and techniques using nanoporous polymeric membranes, and electrical components, such as traces, transistors, circuits, assemblies, and the like additively printed utilizing nanoporous membranes, hi one embodiment, the invention includes creating a nanoporous membrane through a chemical process. The membrane is patterned and pores are etched according to a desired pattern. The membrane may then be used to pattern conductive traces on a substrate according to a screen printing or other suitable printing technique.
摘要:
The present invention is directed to stencils for high-throughput, high-resolution etching of substrates and processes of making and using the same.
摘要:
The invention relates to a base material (10) for preparing a stencil (30) for screen printing, wherein the base material (10) comprises a screen (12) comprising a network of dykes (20) delimiting openings (22), a photoresist material covering at least one side of the screen (12) as a layer (14), a levelling film (16) contacting the photoresist material at said side, and a mask layer (18) on top of the levelling film (16), the mask layer (18) comprising a laser ablatable material that is opaque to the light used for exposing the photoresist material.
摘要:
The present invention is directed to stencils for high-throughput, high-resolution etching of substrates and processes of making and using the same.
摘要:
Screen printing methods, processes, apparatuses, and techniques using nanoporous polymeric membranes, and electrical components, such as traces, transistors, circuits, assemblies, and the like additively printed utilizing nanoporous membranes, hi one embodiment, the invention includes creating a nanoporous membrane through a chemical process. The membrane is patterned and pores are etched according to a desired pattern. The membrane may then be used to pattern conductive traces on a substrate according to a screen printing or other suitable printing technique.
摘要:
The present invention is directed to stencils for high-throughput, high-resolution etching of substrates and processes of making and using the same.