SYSTEMS AND METHODS FOR TREATING A METAL SUBSTRATE

    公开(公告)号:WO2019152556A1

    公开(公告)日:2019-08-08

    申请号:PCT/US2019/015911

    申请日:2019-01-30

    发明人: MORRIS, Eric L.

    IPC分类号: C23C22/80 C23C22/83 C23C22/56

    摘要: Disclosed herein is a first composition comprising a trivalent chromium cation and an aqueous carrier. Also disclosed herein is a second composition comprising a permanganate anion and an aqueous carrier. Also disclosed herein is a system for treating a metal substrate comprising a first composition comprising a trivalent chromium cation and an aqueous carrier and optionally a second composition comprising a permanganate anion and an aqueous carrier. Also disclosed herein is a method of treating a metal substrate comprising contacting at least a portion of the substrate surface with a first composition comprising a trivalent chromium cation and an aqueous carrier and optionally contacting at least a portion of the substrate surface with a second composition comprising a permanganate anion and an aqueous carrier.

    WAREWASHING COMPOSITION FOR USE IN AUTOMATIC DISHWASHING MACHINES, AND METHOD FOR USING
    4.
    发明申请
    WAREWASHING COMPOSITION FOR USE IN AUTOMATIC DISHWASHING MACHINES, AND METHOD FOR USING 审中-公开
    用于自动洗碗机的洗涤组合物及其使用方法

    公开(公告)号:WO2008137769A1

    公开(公告)日:2008-11-13

    申请号:PCT/US2008/062542

    申请日:2008-05-02

    IPC分类号: C11D3/08 C11D1/00

    摘要: A warewashing composition includes a cleaning agent having a detersive amount of a surfactant, an alkaline source in an amount effective to provide a use composition having a pH of at least about 8 when the use composition is measured at a solids concentration of about 0.5 wt%, and a corrosion inhibitor in an amount sufficient for reducing corrosion of glass when the warewashing composition is combined with water of dilution at a dilution ratio of at least about 20:1 water of dilution to detergent composition to form a use composition. The corrosion inhibitor includes a salt of calcium, magnesium, or a mixture of calcium and magnesium. The salt has a water solubility of less than about 0.5 wt% in water at about 20°C and atmospheric pressure so that the salt precipitates to form a protective layer on a substrate in contact with the use composition.

    摘要翻译: 器皿洗涤组合物包括具有去污剂量的表面活性剂的清洁剂,碱性源,其量有效地提供当使用组合物以约0.5重量%的固体浓度测量时具有至少约8的pH值的使用组合物 以及当将洗涤组合物与至少约20:1的稀释水稀释比稀释的稀释水与洗涤剂组合物混合以形成使用组合物时,其量足以减少玻璃腐蚀的腐蚀抑制剂。 腐蚀抑制剂包括钙,镁或钙和镁的混合物的盐。 盐在约20℃和大气压下在水中具有小于约0.5重量%的水溶解度,使得盐沉淀以在与使用组合物接触的基材上形成保护层。

    洗浄剤組成物
    5.
    发明申请
    洗浄剤組成物 审中-公开
    清洁组合物

    公开(公告)号:WO2007116669A1

    公开(公告)日:2007-10-18

    申请号:PCT/JP2007/056158

    申请日:2007-03-26

    IPC分类号: C11D3/37 B08B3/08 C23G5/036

    摘要:   本発明は、金属質又はガラス質基材が少なくとも表面に構成される、記録媒体用基板、フォトマスク用基板、又はフラットパネルディスプレイ用基板の洗浄に用いる洗浄剤組成物であって、 (I)以下の(i)~(iii)を少なくとも満たす共重合化合物、 (i)アクリル酸由来の構成単位A1が、全構成単位中の20モル%以上である、 (ii)アクリル酸由来の構成単位A1と2-アクリルアミド-2-メチルプロパンスルホン酸由来の構成単位A2の合計含有量が、全構成単位中の90モル%以上である、 (iii)全構成単位中の構成単位A1と構成単位A2との含有量比[構成単位A1(モル%)/構成単位A2(モル%)]が、91/9~95/5である を含有する洗浄剤組成物に関する。

    摘要翻译: 公开了用于清洁记录介质用基板,光掩模基板或平板显示用基板的清洗组合物,至少在其表面设有金属或玻璃基材。 该清洁组合物含有至少满足以下条件(i) - (iii)的共聚合化合物(I)。 (i)由丙烯酸衍生的结构单元A1为总结构单位的20摩尔%以上。 (ii)由丙烯酸衍生的结构单元A1和由2-丙烯酰氨基-2-甲基丙磺酸衍生的结构单元A2的总和不小于总结构单元的90mol%。 (iii)构成单元A1与构成单元A2(结构单元A1(摩尔%)/结构单元A2(摩尔%))之比在总结构单位为91/9〜95/5。

    ALUMINIUMBAND FÜR LITHOGRAPHISCHE DRUCKPLATTENTRÄGER
    6.
    发明申请
    ALUMINIUMBAND FÜR LITHOGRAPHISCHE DRUCKPLATTENTRÄGER 审中-公开
    铝带平版印刷版支持

    公开(公告)号:WO2007045676A1

    公开(公告)日:2007-04-26

    申请号:PCT/EP2006/067573

    申请日:2006-10-19

    IPC分类号: C22C21/00 B41N1/08

    摘要: Die Erfindung betrifft ein Aluminiumband für lithographische Druckplattenträger bestehend aus einer Aluminiumlegierung, ein Verfahren zur Herstellung eines Aluminiumbandes für lithographische Druckplattenträger sowie einen Druckplattenträger. Die Aufgabe, ein Aluminiumband für lithographische Druckplattenträger zur Verfügung zu stellen, aus welchem Druckplattenträger mit einer verbesserten Aufraubarkeit und gleichzeitig verbesserten mechanischen Eigenschaften, insbesondere nach einem Einbrennvorgang, hergestellt werden können, wird dadurch gelöst, dass ein Aluminiumband für lithographischen Druckplattenträger mit einer Aluminiumlegierung die folgende Anteile an Legierungsbestandteilen in Gew.-% aufweist: 0,05 % ≤ Mg ≤ 0,3 % , 0,008% ≤ Mn ≤ 0,3 %, 0,4 % ≤ Fe ≤ 1 %, 0,05 % ≤ Si ≤ 0,5 %, Cu ≤ 0, 04 %, Ti ≤ 0,04 %, unvermeidbare Verunreinigungen einzeln max . 0,01 %, in Summe max. 0,05 % und Rest Al vorgeschlagen wird.

    摘要翻译: 本发明涉及一种铝条用于由铝合金制成,用于制造平版印刷版载体的铝带以及印刷版的支持的方法的平版印刷版的支持。 目的是提供一种用于平版印刷版载体的铝带是可用的,从能够具有改进的粗糙化,并在同一时间改进的机械性能要生产的印刷版用支持,特别是烘烤处理之后,是这样实现的用于平版印刷版用支撑用的铝合金的铝带以下 以重量合金成分的比例.-%,包括:0.05%的Mg = = 0.3%,0.008%的Mn = = 0.3%,0.4%的Fe = = 1%,0.05%的Si = = 0 ,5%以下,Cu = 0,04%以下,Ti = 0.04%,最大单独不可避免的杂质。 0.01%,最多。 提出了0.05%和Al的平衡。

    REMOVING ADHERENT ORGANIC MATERIAL
    8.
    发明申请
    REMOVING ADHERENT ORGANIC MATERIAL 审中-公开
    去除粘性有机物质

    公开(公告)号:WO02081609A3

    公开(公告)日:2003-02-13

    申请号:PCT/US0210345

    申请日:2002-04-04

    申请人: KAY CHEMICAL INC

    摘要: A solution capable of removing adherent organic material from the surface of a solid substrate at room temperature is disclosed. The solution includes a first solvent, preferably water, having dissolved therein: up to 2% alkali metal silicates, a source of alkalinity that is substantially free of alkali metal hydroxide ions, at least one organic solvent, and an amount of hydrotrope effective to render the organic solvent or solvents soluble in the solution, an amino alcohol may be included, at least one surfactant, and a corrosion inhibitor may be included. The solution should have an alkaline pH less than about 12. The solution is used to remove the adherent organic material by soaking the object having such material thereon in such a solution, preferably at room temperature.

    摘要翻译: 公开了一种能够在室温下从固体基材表面去除附着的有机材料的溶液。 该溶液包括溶解于其中的第一溶剂,优选水,其中溶解有:高达2%的碱金属硅酸盐,碱性来源基本上不含碱金属氢氧化物离子,至少一种有机溶剂和一定量的水溶助剂, 可溶于溶液中的有机溶剂或多种溶剂,可包含氨基醇,可包含至少一种表面活性剂和腐蚀抑制剂。 该溶液应具有小于约12的碱性pH值。该溶液用于通过将其上具有这种材料的物体浸泡在这种溶液中,优选在室温下来除去附着的有机材料。

    METHOD FOR TREATING MAGNESIUM-BASED METAL FORMED ARTICLE AND TREATING SOLUTION THEREFOR
    9.
    发明申请
    METHOD FOR TREATING MAGNESIUM-BASED METAL FORMED ARTICLE AND TREATING SOLUTION THEREFOR 审中-公开
    用于处理基于金属的金属制品及其处理溶液的方法

    公开(公告)号:WO00050666A1

    公开(公告)日:2000-08-31

    申请号:PCT/JP2000/000920

    申请日:2000-02-18

    IPC分类号: C23F1/40 C23G1/22 C23C22/60

    CPC分类号: C23G1/22 C23F1/40

    摘要: A method for treating a magnesium-based metal formed article characterized as comprising immersing the magnesium-based metal formed article in a treating solution containing sodium metasilicate, sodium carbonate, sodium phosphate and sodium hydroxide as main components to thereby perform cleaning and etching. The method enables performing the cleaning and etching of the metal at the same time and is free from the generation of hazardous substances during treating. It results in the increase of the adhesiveness of the metal with a coating film and thus in the improvement of the resistance of the metal to corrosion and rust to carry out the degreasing, cleaning and etching at the same time.

    摘要翻译: 一种用于处理镁基金属成型制品的方法,其特征在于将镁基金属成型制品浸入含有偏硅酸钠,碳酸钠,磷酸钠和氢氧化钠的处理溶液中作为主要组分,从而进行清洗和蚀刻。 该方法能够同时进行金属的清洗和蚀刻,并且在处理期间不产生有害物质。 这导致金属与涂膜的粘合性增加,从而提高了金属对腐蚀和锈蚀的抵抗力,同时进行脱脂,清洁和蚀刻。

    ALKALINE WATER-BASED SOLUTION FOR CLEANING METALLIZED MICROELECTRONIC WORKPIECES AND METHODS OF USING SAME
    10.
    发明申请
    ALKALINE WATER-BASED SOLUTION FOR CLEANING METALLIZED MICROELECTRONIC WORKPIECES AND METHODS OF USING SAME 审中-公开
    用于清洁金属微电子工件的碱性水基溶液及其使用方法

    公开(公告)号:WO99065839A1

    公开(公告)日:1999-12-23

    申请号:PCT/US1999/013662

    申请日:1999-06-18

    摘要: A method for use in the manufacture of a microelectronic device is set forth. The method includes (10) a first step in which a workpiece including exposed aluminum metallized surfaces and residues is provided. The workpiece, including the exposed aluminum metallized surfaces, is then treated with an alkaline, water-based solution containing one or more components that form an aluminosilicate on the exposed aluminum metallized surfaces. The solution (20) reacts with the residues and assists in removing them from the workpiece. Preferably, the solution is comprised of DI water, and ammonium hydroxide based component, such as TMAH, silicic acid, and aluminum hydroxide.

    摘要翻译: 阐述了一种用于制造微电子器件的方法。 该方法包括(10)第一步骤,其中提供包括暴露的铝金属化表面和残留物的工件。 包括暴露的铝金属化表面的工件然后用含有在暴露的铝金属化表面上形成铝硅酸盐的一种或多种组分的碱性水基溶液处理。 溶液(20)与残留物反应并有助于将其从工件中去除。 优选地,溶液由去离子水和基于氢氧化铵的组分如TMAH,硅酸和氢氧化铝组成。