公开(公告)号：WO1984002008A1

公开(公告)日：1984-05-24

申请号：PCT/FR1983000221

申请日：1983-11-08

Applicant: CEBAL ,  VANY, Gérard

Inventor： CEBAL

IPC: G02B13/10

CPC classification number: G02B13/10 ,  G03B27/68

Abstract: Device for printing blanks intended to be stamped, said device allowing to obtain on the blanks a predeformed image which, after stamping, will restitute the original image, and comprising a light source (2), a toric prism (4) and a photographic apparatus (8) having a common optical axis (12). The angle of the toric prism is smaller than 42.05 and, preferably, equal to or smaller than 35 , and the face (11) of the prism facing the photographic apparatus (8) is cut so as to act as a linearity correction lens. The face (11) of the lens-forming prism is defined in a parametric coordinate system xt and yt centered on the intersection point of the optical axis (12) and of a reference plane parallel to the face (11) of the prism defined by the following equations: the parameters C1, C2, C3 and C4 being defined from the inner diameter PHI o and the height H of the toric prism (4), the slippage A of the plate to be reproduced at the edge (13) of the prism, the focal distance F of the lens of the photographic apparatus (8) and the refraction index n of the material forming the prism (4) and of the apex angle (45 - alpha ) of said prism.

Abstract translation: 用于打印要冲压的坯料的装置，所述装置允许在坯件上获得预成形图像，其在冲压之后将恢复原始图像，并且包括光源（2），复曲面棱镜（4）和照相设备 （8）具有共同的光轴（12）。 复曲面棱镜的角度小于42.05℃，优选地等于或小于35℃，并且面向照相设备（8）的棱镜的面（11）被切割成以 线性校正透镜。 透镜形成棱镜的表面（11）被定义在以光轴（12）和与棱镜的面（11）平行的参考平面的交点为中心的参数坐标系xt和yt中， 以下等式：从内径PHI o和复曲面棱镜（4）的高度H定义的参数C1，C2，C3和C4，在边缘（13）处再现的板的滑动A ），摄影装置（8）的透镜的焦距F和形成棱镜（4）的材料的折射率n以及所述棱镜的顶角（45-α）。

公开(公告)号：WO2009154965A3

公开(公告)日：2010-02-25

申请号：PCT/US2009045239

申请日：2009-05-27

Applicant: RES FOUNDATION OF THE STATE UN ,  RUAN JUNRU

Inventor： RUAN JUNRU

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03B27/68 ,  B82Y10/00 ,  B82Y40/00 ,  G01B11/06 ,  G01B11/26 ,  G03F9/7026 ,  G03F9/7088 ,  H01J37/3174

Abstract: Method and apparatus are provided for automated determination and adjustment of height and tilt of a substrate surface within a lithography system. The method includes: directing a beam of light onto the substrate surface, which reflects off the substrate surface as a reflected beam; optically splitting the reflected beam into a first reflected beam portion and a second reflected beam portion; impinging the first reflected beam portion onto a first detector plane of a first optical detector to generate intensity data, and impinging the second reflected beam portion onto a second detector plane of a second optical detector to generate intensity data, and utilizing the generated data in determining height and tilt of the substrate surface relative to a nominal writing plane of the lithography system. Responsive to the determination, focus or tilt of the system's writing beam, or position of the substrate surface within the system, is adjusted.

Abstract translation: 提供了用于自动确定和调整光刻系统内的基板表面的高度和倾斜的方法和装置。 该方法包括：将光束引导到衬底表面上，反射离开衬底表面作为反射光束; 将反射光束光学分解成第一反射光束部分和第二反射光束部分; 将第一反射光束部分入射到第一光学检测器的第一检测器平面上以产生强度数据，并将第二反射光束部分入射到第二光学检测器的第二检测器平面上以产生强度数据，并且利用所生成的数据来确定 基板表面相对于光刻系统的标称写入平面的高度和倾斜度。 调整系统书写光束的确定，聚焦或倾斜或基板表面在系统内的位置。

公开(公告)号：WO2002101443A2

公开(公告)日：2002-12-19

申请号：PCT/CA2002/000870

申请日：2002-06-12

Applicant: SILICON OPTIX INC. ,  KARUTA, Bonaventure ,  LEE, Louie

Inventor： KARUTA, Bonaventure ,  LEE, Louie

IPC: G02B27/00

CPC classification number: G06T5/006 ,  G02B27/0025 ,  G03B27/68 ,  G06T3/00 ,  G06T2207/20021 ,  H04N5/74 ,  H04N9/3185 ,  H04N9/3194

Abstract: A system and method for correcting distortion in projected images caused by the projection of an input image by a projector lens onto a projection screen having a surface that is not orthogonal to the projection axis of the projector. Projection parameters including the focal length of the projector lens and the angles that represent the pan, tilt and roll angle of the projector are obtained. Then the projected area and the best viewable rectangular area that fits within said projected area is determined. The distortion is then characterized by using a distortion transformation which corresponds to the transformation that exists between the vertices of the best viewable rectangular area and the corresponding vertices of the projected area. Finally, the distortion transformation is inverted and applied to input image to obtain a distortion free projected image.

Abstract translation: 一种用于校正由投影仪透镜将输入图像投影到具有不与投影仪的投影轴正交的表面的投影屏幕上的投影图像中的失真的系统和方法。 获得投影参数，包括投影镜头的焦距和投影机的平移，倾斜和滚动角度的角度。 然后确定投影区域和适合于所述投影区域内的最佳可视矩形区域。 然后通过使用对应于存在于最佳可视矩形区域的顶点与投影区域的对应顶点之间的变换的失真变换来表征失真。 最后，将失真变换反转并应用于输入图像，以获得无失真的投影图像。

公开(公告)号：WO1986002465A1

公开(公告)日：1986-04-24

申请号：PCT/CH1985000152

申请日：1985-10-09

Applicant: VOGT, Philippe

IPC: G03B19/10

CPC classification number: G03B27/68 ,  G03B19/10

Abstract: The photographic camera comprises a plurality of electronic measure sensors. The first of those sensors (37, 38) provided for the angle ( omega ) wherein the base (10) of the apparatus is inclined with respect to the horizontal during focusing. A second sensor (42, 43) relates to the displacement ( DELTA s) which must be given to the image plate support (13, 17) along the base, when two objects placed at different distances from the objective (12) must be represented in focus. A third sensor is provided for the distance (d) producing the image of the two objects perpendicularly to the inclination axis of the apparatus base. An electronic circuit (30) is also part of the camera. The signal produced at the output (48) is elaborated from output signals from the measure sensors. Said signal corresponds to the angle ( delta ) according to which the image plane (13) must be pivoted for an accurate focusing on the two objects (14, 16). The camera enables to determine the pivoting angle ( delta ) during the displacement ( DELTA s) perpendicular to the image plane (13), along the base (10), independently of the inclination angle ( omega ) of the base with respect to the horizontal (11).

Abstract translation: 照相机包括多个电子测量传感器。 这些传感器（37,38）中的第一个为角度（ω）提供，其中设备的基座（10）在聚焦期间相对于水平面倾斜。 第二传感器（42,43）涉及当与物镜（12）不同距离放置的两个物体必须被表示时，沿着底座必须给予图像板支撑件（13,17）的位移（DELTA） 焦点。 提供第三传感器用于产生垂直于装置底座的倾斜轴线的两个物体的图像的距离（d）。 电子电路（30）也是相机的一部分。 在输出（48）处产生的信号从测量传感器的输出信号中详细阐述。 所述信号对应于角度（delta），根据该角度，图像平面（13）必须被枢转以准确地聚焦在两个物体（14,16）上。 摄像机能够确定沿基座（10）垂直于垂直于图像平面（13）的位移（DELTA）期间的旋转角度（delta），独立于底座相对于水平面的倾斜角（Ω） （11）。

公开(公告)号：WO1981002346A1

公开(公告)日：1981-08-20

申请号：PCT/AU1981000018

申请日：1981-02-18

Applicant: KURPERSHOEK H

IPC: G03B27/68

CPC classification number: G03B27/68 ,  G03B27/64 ,  G03F7/2002

Abstract: A method of preparing a flexographic printing plate to compensate for the distortion imposed on the images on the plate when it is fitted to a printing roll incorporating the steps of producing an intermediate positive or negative with an intermediate image which has a predetermined percentage distortion in one direction, and using the intermediate positive or negative to produce the final printing plate incorporating the final image to be printed, where the same percentage distortion is applied to the intermediate image, but in the inverse direction. The percentage distortion is dependent on the number of teeth (and thereby the diameter) of the printing roller on which the plate is to be used. The invention also provides a suitable camera (10) for producing the plates using this two stage method. The camera (10) has a fixed focal length lens (30) selectively movable along its focal axis (39) to apply a predetermined percentage distortion to an image on a copy or transparency mounted on a copyboard (14) and transmitted onto a photographic film mounted on a vacuum board (45) movable in predetermined steps along two mutually perpendicular horizontal axes.

Abstract translation: 一种制备柔性版印刷板的方法，用于补偿当装配到印刷辊上时对板上的图像施加的扭曲，该打印辊结合了产生具有预定百分比失真的中间图像的中间正或负的步骤 方向，并且使用中间正或负来产生包含要打印的最终图像的最终印版，其中相同的百分比失真应用于中间图像，但是沿相反方向。 百分比变形取决于使用板的印刷辊的齿数（从而由直径决定）。 本发明还提供了一种用于使用这种两级方法制造板的合适的照相机（10）。 照相机（10）具有可选择性地沿其焦轴（39）移动的固定焦距透镜（30），以对安装在电子白板（14）上的复印件或透明物上的图像施加预定百分比的失真并传输到照相胶卷 安装在可沿两个相互垂直的水平轴以预定步骤移动的真空板（45）上。

公开(公告)号：WO2011161243A1

公开(公告)日：2011-12-29

申请号：PCT/EP2011/060626

申请日：2011-06-24

Applicant: CARL ZEISS SMS GMBH ,  CARL ZEISS SMT GMBH ,  BUDACH, Michael ,  BRET, Tristan ,  EDINGER, Klaus ,  HOFMANN, Thorsten ,  FELDMANN, Heiko ,  RUOFF, Johannes

Inventor： BUDACH, Michael ,  BRET, Tristan ,  EDINGER, Klaus ,  HOFMANN, Thorsten ,  FELDMANN, Heiko ,  RUOFF, Johannes

IPC: G03F1/14 ,  G03F1/00 ,  G03F7/20

CPC classification number: G01N21/95 ,  B82Y10/00 ,  B82Y40/00 ,  C23C14/48 ,  G03B27/68 ,  G03F1/24 ,  G03F1/72 ,  G03F1/74 ,  G03F1/84 ,  G03F7/705 ,  G03F7/7065 ,  G06F17/5009 ,  G06T7/0002 ,  G21K5/00

Abstract: The invention relates to a method for analyzing a defect of a photolithographic mask for an extreme ultraviolet (EUV) wavelength range (EUV mask) comprising the steps of: (a) generating at least one focus stack relating to the defect using an EUV mask inspection tool, (b) determining a surface configuration of the EUV mask at a position of the defect, (c) providing model structures having the determined surface configuration which have different phase errors and generating the respective focus stacks, and (d) determining a three dimensional error structure of the EUV mask defect by comparing the at least one generated focus stack of the defect and the generated focus stacks of the model structures.

Abstract translation: 本发明涉及一种用于分析用于极紫外（EUV）波长范围（EUV掩模）的光刻掩模的缺陷的方法，包括以下步骤：（a）使用EUV掩模检查产生与缺陷有关的至少一个焦点叠层 工具，（b）在缺陷的位置确定EUV掩模的表面结构，（c）提供具有确定的表面配置的模型结构，其具有不同的相位误差并产生相应的焦点堆叠，以及（d）确定三维 通过比较所述缺陷的至少一个生成的焦点堆栈和所产生的模型结构的焦点堆栈，来确定EUV掩模缺陷的三维误差结构。

公开(公告)号：WO2009154965A2

公开(公告)日：2009-12-23

申请号：PCT/US2009/045239

申请日：2009-05-27

Applicant: THE RESEARCH FOUNDATION OF THE STATE UNIVERSITY OF NEW YORK ,  RUAN, Junru

Inventor： RUAN, Junru

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03B27/68 ,  B82Y10/00 ,  B82Y40/00 ,  G01B11/06 ,  G01B11/26 ,  G03F9/7026 ,  G03F9/7088 ,  H01J37/3174

Abstract: Method and apparatus are provided for automated determination and adjustment of height and tilt of a substrate surface within a lithography system. The method includes: directing a beam of light onto the substrate surface, which reflects off the substrate surface as a reflected beam; optically splitting the reflected beam into a first reflected beam portion and a second reflected beam portion; impinging the first reflected beam portion onto a first detector plane of a first optical detector to generate intensity data, and impinging the second reflected beam portion onto a second detector plane of a second optical detector to generate intensity data, and utilizing the generated data in determining height and tilt of the substrate surface relative to a nominal writing plane of the lithography system. Responsive to the determination, focus or tilt of the system's writing beam, or position of the substrate surface within the system, is adjusted.

Abstract translation: 提供了用于自动确定和调整光刻系统内的基板表面的高度和倾斜的方法和装置。 该方法包括：将光束引导到衬底表面上，反射离开衬底表面作为反射光束; 将反射光束光学分解成第一反射光束部分和第二反射光束部分; 将第一反射光束部分入射到第一光学检测器的第一检测器平面上以产生强度数据，并将第二反射光束部分入射到第二光学检测器的第二检测器平面上以产生强度数据，并且利用所生成的数据来确定 基板表面相对于光刻系统的标称写入平面的高度和倾斜度。 调整系统书写光束的确定，聚焦或倾斜或基板表面在系统内的位置。

公开(公告)号：WO2008082983A1

公开(公告)日：2008-07-10

申请号：PCT/US2007/088103

申请日：2007-12-19

Applicant: TEXAS INSTRUMENTS INCORPORATED ,  COLLINS, Sean, Michael ,  HALL, David, C. ,  JESSEN, Scott, W.

Inventor： COLLINS, Sean, Michael ,  HALL, David, C. ,  JESSEN, Scott, W.

IPC: G03F9/00

CPC classification number: G03B27/68 ,  G03F7/2028

Abstract: An embodiment relates generally to an apparatus for reducing defects. The apparatus includes a spindle (115) adapted to hold a wafer (110); and at least two light sources (105 A, 105B) configured to direct light to a top-side and a back-side of the wafer.

Abstract translation: 实施例一般涉及用于减少缺陷的装置。 该装置包括适于保持晶片（110）的主轴（115）; 以及配置成将光引导到晶片的顶侧和背面的至少两个光源（105A，105B）。

公开(公告)号：WO2007098453A2

公开(公告)日：2007-08-30

申请号：PCT/US2007062449

申请日：2007-02-20

Applicant: LITEL INSTR INC ,  SMITH ADLAI H ,  HUNTER ROBERT O JR

Inventor： SMITH ADLAI H ,  HUNTER ROBERT O JR

IPC: G03F7/20

CPC classification number: G03F9/7023 ,  G03B27/68 ,  G03F7/70083 ,  G03F7/70191 ,  G03F7/705 ,  G03F7/70633 ,  G03F7/70641

Abstract: An apparatus and method for the simultaneous determination of focus and source boresighting error for photolithographic steppers and scanners is described. A reticle containing custom arrays of box-in-box test structures specifically designed for performing source or exit pupil division using an aperture plate is exposed onto a resist coated wafer several times. The resulting exposure patterns are measured with a conventional overlay tool. The overlay data is processed with a slope-shift algorithm for the simultaneous determination of both focus and source telecentricity as a function of field position. Additionally, methods for ameliorating metrology induced effects and methods for producing precision Bossung curves are also described. This Abstract is provided for the sole purpose of complying with the Abstract requirement rules, it shall not be used to interpret or to limit the scope or the meaning of the claims.

Abstract translation: 描述了用于光刻步进机和扫描仪同时确定焦距和光源瞄准误差的装置和方法。 包含专门设计用于使用孔板执行光源或出射光瞳划分的盒装盒测试结构的定制阵列的掩模版被暴露在抗蚀剂涂覆的晶片上多次。 所得到的曝光图案用传统的覆盖工具测量。 覆盖数据用斜率移位算法处理，用于同时确定作为场位置的函数的焦点和源远心。 此外，还描述了用于改善计量学诱导效应的方法和用于产生精确Bossung曲线的方法。 本摘要仅用于遵守抽象要求规则，不得用于解释或限制权利要求的范围或含义。

公开(公告)号：WO02101443A3

公开(公告)日：2003-07-10

申请号：PCT/CA0200870

申请日：2002-06-12

Applicant: SILICON OPTIX INC ,  KARUTA BONAVENTURE ,  LEE LOUIE

Inventor： KARUTA BONAVENTURE ,  LEE LOUIE

IPC: G02B27/00 ,  G03B27/68 ,  G06T3/00 ,  G06T11/80 ,  H04N5/74 ,  H04N9/31 ,  H04N17/00 ,  G06T5/00

CPC classification number: G06T5/006 ,  G02B27/0025 ,  G03B27/68 ,  G06T3/00 ,  G06T2207/20021 ,  H04N5/74 ,  H04N9/3185 ,  H04N9/3194

Abstract: A system and method for correcting distortion in projected images caused by the projection of an input image by a projector lens onto a projection screen having a surface that is not orthogonal to the projection axis of the projector. Projection parameters including the focal length of the projector lens and the angles that represent the pan, tilt and roll angle of the projector are obtained. Then the projected area and the best viewable rectangular area that fits within said projected area is determined. The distortion is then characterized by using a distortion transformation which corresponds to the transformation that exists between the vertices of the best viewable rectangular area and the corresponding vertices of the projected area. Finally, the distortion transformation is inverted and applied to input image to obtain a distortion free projected image.

Abstract translation: 一种用于校正由投影仪透镜将输入图像投影到具有不与投影仪的投影轴正交的表面的投影屏幕上的投影图像中的失真的系统和方法。 获得投影参数，包括投影镜头的焦距和投影机的平移，倾斜和滚动角度的角度。 然后确定投影区域和适合于所述投影区域内的最佳可视矩形区域。 然后通过使用对应于存在于最佳可视矩形区域的顶点与投影区域的对应顶点之间的变换的失真变换来表征失真。 最后，将失真变换反转并应用于输入图像，以获得无失真的投影图像。