The invention provides a substrate treatment device capable of replacing a changeable treatment container interior member in the treatment container during a short time. The substrate treatment device (1) comprises a chamber (2) for storing the substrate (G), a changeable loading plate (3b) arranged on a substrate material (3a) of a loading table (3) in the chamber (2), a high-frequency power supply (17) for applying plasma treatment to he substrate (G) in the chamber (2), and a spray head (20) for guiding treatment gas to the chamber (2), wherein the loading plate (3b) is mounted on the substrate material (3a) by electrostatic absorption.