利索-全球专利检索

  1. 登录
  2. 注册
发明授权
CN101634814B 一种原始对中装置和系统 有权 转让

一种原始对中装置和系统
摘要：
本发明公开了一种原始对中装置和原始对中系统，其中，所述原始对中装置的上表面开有第一圆槽孔，用于容置晶圆片，所述第一圆槽孔的深度低于晶圆片的厚度；所述装置上表面还具有直径大于第一圆槽孔且与第一圆槽孔同心的标记线，所述装置上的标记线与光刻板上的标记线在原始对中时重合。本发明的原始对中装置和系统在容置晶圆片的第一圆槽孔外和光刻板上都设置有标记线，通过将第一圆槽孔外的标记线与光刻板上的标记线对准，实现晶圆片和光刻板上图案的良好原始对中，改善原始对中同心度。
摘要（英）：

The invention discloses a primary aligning device and a primary aligning system, wherein the upper surface of the primary aligning device is provided with a first circular slotted hole for holding a wafer, and the depth of the first circular slotted hole is smaller than the thickness of the wafer. The upper surface of the device is also provided with a marked line which has larger diameter than the first circular slotted hole, wherein the marked line is concentric with the first circular slotted hole and is superposed with a marked line on a photolith board in primary aligning. With the structure that the marked lines are respectively arranged outside the first circular slotted hole for holding the wafer and on the photolith board, the primary aligning device and the primary aligning system realize the favorable primary aligning of the wafer and a pattern on the photolith board by aligning the marked line outside the first circular slotted hole and the marked line on the photolith board and improve the concentricity of primary aligning.

公开/授权文献
0/0