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发明授权
CN107148597B 度量方法、目标和衬底 有权

度量方法、目标和衬底
摘要：
衍射测量目标，其具有至少第一子目标和至少第二子目标，以及其中(1)第一和第二子目标每个包括一对周期性结构并且第一子目标具有与第二子目标不同的设计，不同的设计包括第一子目标周期性结构具有与第二子目标周期性结构不同的节距、特征宽度、间隔宽度和/或分割，或者(2)第一和第二子目标分别包括第一层中的第一和第二周期性结构，以及第三周期性结构在第一层下方的第二层中至少部分地位于第一周期性结构下方并且在第二层中没有周期性结构在第二周期性结构下方，以及第四周期性结构在第二层下方的第三层中至少部分地位于第二周期性结构下方。设计该测量目标的方法包括在子目标的外围处定位辅助特征，辅助特征配置为减小子目标外围处的测得强度峰值。
摘要（英）：

A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer.

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