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发明公开
CN107850858A 工艺敏感计量系统及方法 有权

工艺敏感计量系统及方法
摘要：
本发明揭示一种光刻系统，其包含照明源及一组投影光学器件。所述照明源将照明光束从离轴照明极点引导到图案掩模。所述图案掩模包含一组图案元件，所述组图案元件产生包含来自所述照明极点的照明的一组衍射光束。由所述组投影光学器件接收的所述组衍射光束中的至少两个衍射光束非对称地分布于所述组投影光学器件的光瞳面中。所述组衍射光束中的所述至少两个衍射光束非对称地入射于样本上以形成对应于所述组图案元件的图像的一组制造元件。样本上的所述组制造元件包含沿所述组投影光学器件的光学轴的样本的位置的一或多个指示符。
摘要（英）：

A lithography system includes an illumination source and a set of projection optics. The illumination source directs a beam of illumination from an off-axis illumination pole to a pattern mask. The pattern mask includes a set of pattern elements to generate a set of diffracted beams including illumination from the illumination pole. At least two diffracted beams of the set of diffracted beams received by the set of projection optics are asymmetrically distributed in a pupil plane of the set of projection optics. The at least two diffracted beams of the set of diffracted beams are asymmetrically incident on the sample to form a set of fabricated elements corresponding to an image of the set of pattern elements. The set of fabricated elements on the sample includes one or more indicators ofa location of the sample along an optical axis of the set of projection optics.

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