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发明公开
CN110739203A 用于处理基板的方法 审中-实审

用于处理基板的方法
摘要：
一种基板处理方法包括：通过将显影流体涂覆到经过曝光工艺和后烘工艺的基板而对所述基板执行显影工艺；将冲洗流体涂覆到经过所述显影工艺的所述基板；以及将涂覆有所述冲洗流体的所述基板移动到高压腔室且通过使用超临界流体处理所述基板。
摘要（英）：

A substrate treating method includes the steps of: performing a developing process on a substrate subjected to an exposing process and a post-bake process by applying a developing fluid to the substrate, applying a rinsing fluid to the substrate subjected to the developing process, and moving, to a high-pressure chamber, the substrate having the rinsing fluid applied thereto and treating the substrate by using a supercritical fluid.

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